Lithography process control:
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
[1999]
|
| Series: | SPIE tutorial texts
TT28 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines |
| Physical Description: | 1 online resource (x, 190 pages) illustrations |
| ISBN: | 9780819478559 |
| DOI: | 10.1117/3.322162 |
Staff View
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044222072 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170313s1999 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819478559 |9 978-0-8194-7855-9 | ||
| 024 | 7 | |a 10.1117/3.322162 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819478559 | ||
| 035 | |a (OCoLC)812329306 | ||
| 035 | |a (DE-599)BVBBV044222072 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/2 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Levinson, Harry J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Lithography process control |c Harry J. Levinson |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c [1999] | |
| 300 | |a 1 online resource (x, 190 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE tutorial texts |v TT28 | |
| 520 | |a This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines | ||
| 650 | 4 | |a Semiconductors / Etching | |
| 650 | 4 | |a Microlithography / Quality control | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Statistische Prozesslenkung |0 (DE-588)4249675-5 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Statistische Prozesslenkung |0 (DE-588)4249675-5 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-3052-6 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.322162 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029627999 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1117/3.322162 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Record in the Search Index
| _version_ | 1804177370533330944 |
|---|---|
| any_adam_object | |
| author | Levinson, Harry J. |
| author_facet | Levinson, Harry J. |
| author_role | aut |
| author_sort | Levinson, Harry J. |
| author_variant | h j l hj hjl |
| building | Verbundindex |
| bvnumber | BV044222072 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819478559 (OCoLC)812329306 (DE-599)BVBBV044222072 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.322162 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02229nmm a2200469zcb4500</leader><controlfield tag="001">BV044222072</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170313s1999 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819478559</subfield><subfield code="9">978-0-8194-7855-9</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.322162</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819478559</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812329306</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044222072</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Levinson, Harry J.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Lithography process control</subfield><subfield code="c">Harry J. Levinson</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">[1999]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (x, 190 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE tutorial texts</subfield><subfield code="v">TT28</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors / Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography / Quality control</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Statistische Prozesslenkung</subfield><subfield code="0">(DE-588)4249675-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Statistische Prozesslenkung</subfield><subfield code="0">(DE-588)4249675-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-3052-6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.322162</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029627999</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.322162</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044222072 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:00Z |
| institution | BVB |
| isbn | 9780819478559 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029627999 |
| oclc_num | 812329306 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (x, 190 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE tutorial texts |
| spelling | Levinson, Harry J. Verfasser aut Lithography process control Harry J. Levinson Bellingham, Wash. SPIE [1999] 1 online resource (x, 190 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE tutorial texts TT28 This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Statistische Prozesslenkung (DE-588)4249675-5 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Statistische Prozesslenkung (DE-588)4249675-5 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-3052-6 https://doi.org/10.1117/3.322162 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Levinson, Harry J. Lithography process control Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4249675-5 |
| title | Lithography process control |
| title_auth | Lithography process control |
| title_exact_search | Lithography process control |
| title_full | Lithography process control Harry J. Levinson |
| title_fullStr | Lithography process control Harry J. Levinson |
| title_full_unstemmed | Lithography process control Harry J. Levinson |
| title_short | Lithography process control |
| title_sort | lithography process control |
| topic | Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd |
| topic_facet | Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie Statistische Prozesslenkung |
| url | https://doi.org/10.1117/3.322162 |
| work_keys_str_mv | AT levinsonharryj lithographyprocesscontrol |