Verfügbarkeit: Lithography process control

Lithography process control:

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...

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Bibliographische Detailangaben
1. Verfasser:	Levinson, Harry J. (VerfasserIn)
Format:	Elektronisch E-Book
Sprache:	English
Veröffentlicht:	Bellingham, Wash. SPIE [1999]
Schriftenreihe:	SPIE tutorial texts TT28
Schlagworte:	Semiconductors / Etching Microlithography / Quality control Lithografie > Halbleitertechnologie Statistische Prozesslenkung
Online-Zugang:	FHD01 URL des Erstveröffentlichers
Zusammenfassung:	This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines
Beschreibung:	1 online resource (x, 190 pages) illustrations
ISBN:	9780819478559
DOI:	10.1117/3.322162

Internformat

MARC


LEADER	00000nmm a2200000zcb4500
001	BV044222072
003	DE-604
005	00000000000000.0
007	cr\|uuu---uuuuu
008	170313s1999 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d
020			\|a 9780819478559 \|9 978-0-8194-7855-9
024	7		\|a 10.1117/3.322162 \|2 doi
035			\|a (ZDB-50-SPI)9780819478559
035			\|a (OCoLC)812329306
035			\|a (DE-599)BVBBV044222072
040			\|a DE-604 \|b ger \|e rda
041	0		\|a eng
049			\|a DE-1050
082	0		\|a 621.3815/2
084			\|a ZN 4170 \|0 (DE-625)157366: \|2 rvk
100	1		\|a Levinson, Harry J. \|e Verfasser \|4 aut
245	1	0	\|a Lithography process control \|c Harry J. Levinson
264		1	\|a Bellingham, Wash. \|b SPIE \|c [1999]
300			\|a 1 online resource (x, 190 pages) \|b illustrations
336			\|b txt \|2 rdacontent
337			\|b c \|2 rdamedia
338			\|b cr \|2 rdacarrier
490	0		\|a SPIE tutorial texts \|v TT28
520			\|a This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines
650		4	\|a Semiconductors / Etching
650		4	\|a Microlithography / Quality control
650	0	7	\|a Lithografie \|g Halbleitertechnologie \|0 (DE-588)4191584-7 \|2 gnd \|9 rswk-swf
650	0	7	\|a Statistische Prozesslenkung \|0 (DE-588)4249675-5 \|2 gnd \|9 rswk-swf
689	0	0	\|a Lithografie \|g Halbleitertechnologie \|0 (DE-588)4191584-7 \|D s
689	0	1	\|a Statistische Prozesslenkung \|0 (DE-588)4249675-5 \|D s
689	0		\|8 1\p \|5 DE-604
776	0	8	\|i Erscheint auch als \|n Druck-Ausgabe \|z 978-0-8194-3052-6
856	4	0	\|u https://doi.org/10.1117/3.322162 \|x Verlag \|z URL des Erstveröffentlichers \|3 Volltext
912			\|a ZDB-50-SPI
999			\|a oai:aleph.bib-bvb.de:BVB01-029627999
883	1		\|8 1\p \|a cgwrk \|d 20201028 \|q DE-101 \|u https://d-nb.info/provenance/plan#cgwrk
966	e		\|u https://doi.org/10.1117/3.322162 \|l FHD01 \|p ZDB-50-SPI \|x Verlag \|3 Volltext

Datensatz im Suchindex

_version_	1804177370533330944
any_adam_object
author	Levinson, Harry J.
author_facet	Levinson, Harry J.
author_role	aut
author_sort	Levinson, Harry J.
author_variant	h j l hj hjl
building	Verbundindex
bvnumber	BV044222072
classification_rvk	ZN 4170
collection	ZDB-50-SPI
ctrlnum	(ZDB-50-SPI)9780819478559 (OCoLC)812329306 (DE-599)BVBBV044222072
dewey-full	621.3815/2
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.3815/2
dewey-search	621.3815/2
dewey-sort	3621.3815 12
dewey-tens	620 - Engineering and allied operations
discipline	Elektrotechnik / Elektronik / Nachrichtentechnik
doi_str_mv	10.1117/3.322162
format	Electronic eBook
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02229nmm a2200469zcb4500</leader><controlfield tag="001">BV044222072</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr\|uuu---uuuuu</controlfield><controlfield tag="008">170313s1999 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819478559</subfield><subfield code="9">978-0-8194-7855-9</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.322162</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819478559</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812329306</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044222072</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Levinson, Harry J.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Lithography process control</subfield><subfield code="c">Harry J. Levinson</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">[1999]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (x, 190 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE tutorial texts</subfield><subfield code="v">TT28</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors / Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography / Quality control</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Statistische Prozesslenkung</subfield><subfield code="0">(DE-588)4249675-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Statistische Prozesslenkung</subfield><subfield code="0">(DE-588)4249675-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-3052-6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.322162</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029627999</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.322162</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection>
id	DE-604.BV044222072
illustrated	Illustrated
indexdate	2024-07-10T07:47:00Z
institution	BVB
isbn	9780819478559
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-029627999
oclc_num	812329306
open_access_boolean
owner	DE-1050
owner_facet	DE-1050
physical	1 online resource (x, 190 pages) illustrations
psigel	ZDB-50-SPI
publishDate	1999
publishDateSearch	1999
publishDateSort	1999
publisher	SPIE
record_format	marc
series2	SPIE tutorial texts
spelling	Levinson, Harry J. Verfasser aut Lithography process control Harry J. Levinson Bellingham, Wash. SPIE [1999] 1 online resource (x, 190 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE tutorial texts TT28 This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Statistische Prozesslenkung (DE-588)4249675-5 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Statistische Prozesslenkung (DE-588)4249675-5 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-3052-6 https://doi.org/10.1117/3.322162 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Levinson, Harry J. Lithography process control Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd
subject_GND	(DE-588)4191584-7 (DE-588)4249675-5
title	Lithography process control
title_auth	Lithography process control
title_exact_search	Lithography process control
title_full	Lithography process control Harry J. Levinson
title_fullStr	Lithography process control Harry J. Levinson
title_full_unstemmed	Lithography process control Harry J. Levinson
title_short	Lithography process control
title_sort	lithography process control
topic	Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd
topic_facet	Semiconductors / Etching Microlithography / Quality control Lithografie Halbleitertechnologie Statistische Prozesslenkung
url	https://doi.org/10.1117/3.322162
work_keys_str_mv	AT levinsonharryj lithographyprocesscontrol

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