Advanced processes for 193-nm immersion lithography:
This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as cours...
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| Main Authors: | , |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
[2009]
|
| Series: | SPIE Press monograph
PM189 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning |
| Physical Description: | 1 online resource (xix, 315 pages) illustrations |
| ISBN: | 9780819478436 |
| DOI: | 10.1117/3.820233 |
Staff View
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| id | DE-604.BV044221893 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:00Z |
| institution | BVB |
| isbn | 9780819478436 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029627825 |
| oclc_num | 812328394 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xix, 315 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE Press monograph |
| spelling | Wei, Yayi Verfasser aut Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard Bellingham, Wash. SPIE [2009] 1 online resource (xix, 315 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM189 This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning Immersion lithography Semiconductors / Etching Integrated circuits / Design and construction Brainard, Robert L. Verfasser aut Society of Photo-optical Instrumentation Engineers Sonstige oth Erscheint auch als Druck-Ausgabe 978-0-8194-7557-2 https://doi.org/10.1117/3.820233 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Wei, Yayi Brainard, Robert L. Advanced processes for 193-nm immersion lithography Immersion lithography Semiconductors / Etching Integrated circuits / Design and construction |
| title | Advanced processes for 193-nm immersion lithography |
| title_auth | Advanced processes for 193-nm immersion lithography |
| title_exact_search | Advanced processes for 193-nm immersion lithography |
| title_full | Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard |
| title_fullStr | Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard |
| title_full_unstemmed | Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard |
| title_short | Advanced processes for 193-nm immersion lithography |
| title_sort | advanced processes for 193 nm immersion lithography |
| topic | Immersion lithography Semiconductors / Etching Integrated circuits / Design and construction |
| topic_facet | Immersion lithography Semiconductors / Etching Integrated circuits / Design and construction |
| url | https://doi.org/10.1117/3.820233 |
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