APA (7th ed.) Citation

Wei, Y., & Brainard, R. L. (2009). Advanced processes for 193-nm immersion lithography. SPIE. https://doi.org/10.1117/3.820233

Chicago Style (17th ed.) Citation

Wei, Yayi, and Robert L. Brainard. Advanced Processes for 193-nm Immersion Lithography. Bellingham, Wash: SPIE, 2009. https://doi.org/10.1117/3.820233.

MLA (9th ed.) Citation

Wei, Yayi, and Robert L. Brainard. Advanced Processes for 193-nm Immersion Lithography. SPIE, 2009. https://doi.org/10.1117/3.820233.