Field guide to optical lithography:
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photore...
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
2006
|
| Series: | SPIE field guides
6 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry |
| Physical Description: | 1 online resource (xii, 122 pages) illustrations |
| ISBN: | 9780819478214 |
| DOI: | 10.1117/3.665802 |
Staff View
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| dewey-ones | 621 - Applied physics |
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| dewey-search | 621.3815/31 |
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.665802 |
| format | Electronic eBook |
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| id | DE-604.BV044218364 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:46:54Z |
| institution | BVB |
| isbn | 9780819478214 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029624403 |
| oclc_num | 732285046 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xii, 122 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2006 |
| publishDateSearch | 2006 |
| publishDateSort | 2006 |
| publisher | SPIE |
| record_format | marc |
| series | SPIE field guides |
| series2 | SPIE field guides |
| spelling | Mack, Chris A. Verfasser aut Field guide to optical lithography Chris A. Mack Optical lithography Bellingham, Wash. SPIE 2006 1 online resource (xii, 122 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE field guides FG06 The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-6207-7 SPIE field guides 6 (DE-604)BV041885814 6 https://doi.org/10.1117/3.665802 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Mack, Chris A. Field guide to optical lithography SPIE field guides Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 |
| title | Field guide to optical lithography |
| title_alt | Optical lithography |
| title_auth | Field guide to optical lithography |
| title_exact_search | Field guide to optical lithography |
| title_full | Field guide to optical lithography Chris A. Mack |
| title_fullStr | Field guide to optical lithography Chris A. Mack |
| title_full_unstemmed | Field guide to optical lithography Chris A. Mack |
| title_short | Field guide to optical lithography |
| title_sort | field guide to optical lithography |
| topic | Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie |
| url | https://doi.org/10.1117/3.665802 |
| volume_link | (DE-604)BV041885814 |
| work_keys_str_mv | AT mackchrisa fieldguidetoopticallithography AT mackchrisa opticallithography |