Field guide to optical lithography:
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photore...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
2006
|
| Schriftenreihe: | SPIE field guides
6 |
| Schlagworte: | |
| Online-Zugang: | FHD01 URL des Erstveröffentlichers |
| Zusammenfassung: | The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry |
| Beschreibung: | 1 online resource (xii, 122 pages) illustrations |
| ISBN: | 9780819478214 |
| DOI: | 10.1117/3.665802 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044218364 | ||
| 003 | DE-604 | ||
| 005 | 20211111 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170309s2006 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819478214 |9 978-0-8194-7821-4 | ||
| 024 | 7 | |a 10.1117/3.665802 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819478214 | ||
| 035 | |a (OCoLC)732285046 | ||
| 035 | |a (DE-599)BVBBV044218364 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/31 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Mack, Chris A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Field guide to optical lithography |c Chris A. Mack |
| 246 | 1 | 3 | |a Optical lithography |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 2006 | |
| 300 | |a 1 online resource (xii, 122 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 1 | |a SPIE field guides |v FG06 | |
| 520 | |a The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry | ||
| 650 | 4 | |a Integrated circuits / Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-6207-7 |
| 830 | 0 | |a SPIE field guides |v 6 |w (DE-604)BV041885814 |9 6 | |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.665802 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029624403 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1117/3.665802 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804177364530233344 |
|---|---|
| any_adam_object | |
| author | Mack, Chris A. |
| author_facet | Mack, Chris A. |
| author_role | aut |
| author_sort | Mack, Chris A. |
| author_variant | c a m ca cam |
| building | Verbundindex |
| bvnumber | BV044218364 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819478214 (OCoLC)732285046 (DE-599)BVBBV044218364 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.665802 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02295nmm a2200469zcb4500</leader><controlfield tag="001">BV044218364</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20211111 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170309s2006 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819478214</subfield><subfield code="9">978-0-8194-7821-4</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.665802</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819478214</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)732285046</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044218364</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Mack, Chris A.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Field guide to optical lithography</subfield><subfield code="c">Chris A. Mack</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Optical lithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">2006</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xii, 122 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">SPIE field guides</subfield><subfield code="v">FG06</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits / Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-6207-7</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">SPIE field guides</subfield><subfield code="v">6</subfield><subfield code="w">(DE-604)BV041885814</subfield><subfield code="9">6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.665802</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029624403</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.665802</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044218364 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:46:54Z |
| institution | BVB |
| isbn | 9780819478214 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029624403 |
| oclc_num | 732285046 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xii, 122 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2006 |
| publishDateSearch | 2006 |
| publishDateSort | 2006 |
| publisher | SPIE |
| record_format | marc |
| series | SPIE field guides |
| series2 | SPIE field guides |
| spelling | Mack, Chris A. Verfasser aut Field guide to optical lithography Chris A. Mack Optical lithography Bellingham, Wash. SPIE 2006 1 online resource (xii, 122 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE field guides FG06 The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-6207-7 SPIE field guides 6 (DE-604)BV041885814 6 https://doi.org/10.1117/3.665802 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Mack, Chris A. Field guide to optical lithography SPIE field guides Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 |
| title | Field guide to optical lithography |
| title_alt | Optical lithography |
| title_auth | Field guide to optical lithography |
| title_exact_search | Field guide to optical lithography |
| title_full | Field guide to optical lithography Chris A. Mack |
| title_fullStr | Field guide to optical lithography Chris A. Mack |
| title_full_unstemmed | Field guide to optical lithography Chris A. Mack |
| title_short | Field guide to optical lithography |
| title_sort | field guide to optical lithography |
| topic | Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Integrated circuits / Design and construction Microlithography Fotolithografie Halbleitertechnologie |
| url | https://doi.org/10.1117/3.665802 |
| volume_link | (DE-604)BV041885814 |
| work_keys_str_mv | AT mackchrisa fieldguidetoopticallithography AT mackchrisa opticallithography |