Lithography: main techniques
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
London
ISTE
2011
|
Schlagworte: | |
Beschreibung: | Adapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier Includes bibliographical references and index "Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"-- |
Beschreibung: | xxv, 377 p. |
ISBN: | 9781118621233 |
Internformat
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245 | 1 | 0 | |a Lithography |b main techniques |c edited by Stefan Landis |
264 | 1 | |a London |b ISTE |c 2011 | |
300 | |a xxv, 377 p. | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a Adapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier | ||
500 | |a Includes bibliographical references and index | ||
500 | |a "Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"-- | ||
650 | 4 | |a Microlithography | |
700 | 1 | |a Landis, Stefan |e Sonstige |4 oth | |
776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 978-1-84821-202-2 |
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Datensatz im Suchindex
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dewey-full | 621.3815/31 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/31 |
dewey-search | 621.3815/31 |
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dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
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id | DE-604.BV044174047 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T07:45:47Z |
institution | BVB |
isbn | 9781118621233 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029580892 |
oclc_num | 830161630 |
open_access_boolean | |
physical | xxv, 377 p. |
psigel | ZDB-30-PAD |
publishDate | 2011 |
publishDateSearch | 2011 |
publishDateSort | 2011 |
publisher | ISTE |
record_format | marc |
spelling | Lithography main techniques edited by Stefan Landis London ISTE 2011 xxv, 377 p. txt rdacontent c rdamedia cr rdacarrier Adapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier Includes bibliographical references and index "Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"-- Microlithography Landis, Stefan Sonstige oth Erscheint auch als Druck-Ausgabe, Hardcover 978-1-84821-202-2 Erscheint auch als Druck-Ausgabe, Hardcover 1-84821-202-X |
spellingShingle | Lithography main techniques Microlithography |
title | Lithography main techniques |
title_auth | Lithography main techniques |
title_exact_search | Lithography main techniques |
title_full | Lithography main techniques edited by Stefan Landis |
title_fullStr | Lithography main techniques edited by Stefan Landis |
title_full_unstemmed | Lithography main techniques edited by Stefan Landis |
title_short | Lithography |
title_sort | lithography main techniques |
title_sub | main techniques |
topic | Microlithography |
topic_facet | Microlithography |
work_keys_str_mv | AT landisstefan lithographymaintechniques |