Plasma processing and processing science:
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
Washington, D.C.
National Academy Press
1995
|
Schriftenreihe: | NRL strategic series
|
Schlagworte: | |
Beschreibung: | Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 |
Beschreibung: | x, 35 p |
ISBN: | 0309575168 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV044108030 | ||
003 | DE-604 | ||
005 | 20180516 | ||
007 | cr|uuu---uuuuu | ||
008 | 170217s1995 |||| o||u| ||||||eng d | ||
020 | |a 0309575168 |9 0-309-57516-8 | ||
035 | |a (ZDB-30-PAD)EBC3377403 | ||
035 | |a (ZDB-89-EBL)EBL3377403 | ||
035 | |a (OCoLC)58567010 | ||
035 | |a (DE-599)BVBBV044108030 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
082 | 0 | |a 621.044 |2 22 | |
245 | 1 | 0 | |a Plasma processing and processing science |c Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
264 | 1 | |a Washington, D.C. |b National Academy Press |c 1995 | |
300 | |a x, 35 p | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a NRL strategic series | |
500 | |a Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 | ||
650 | 4 | |a Plasma engineering | |
650 | 4 | |a Semiconductors |x Etching | |
650 | 4 | |a Plasma etching | |
700 | 1 | |a Chen, Francis F. |d 1929- |e Sonstige |0 (DE-588)17201932X |4 oth | |
710 | 2 | |a National Research Council (U.S.)XXbPanel on Plasma Processing |e Sonstige |4 oth | |
710 | 2 | |a National Research Council (U.S.)XXbNaval Studies Board |e Sonstige |4 oth | |
710 | 2 | |a National Research Council (U.S.)XXbCommission on Physical Sciences, Mathematics, and Applications |e Sonstige |4 oth | |
912 | |a ZDB-30-PAD | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-029514875 |
Datensatz im Suchindex
_version_ | 1804177173629632512 |
---|---|
any_adam_object | |
author_GND | (DE-588)17201932X |
building | Verbundindex |
bvnumber | BV044108030 |
collection | ZDB-30-PAD |
ctrlnum | (ZDB-30-PAD)EBC3377403 (ZDB-89-EBL)EBL3377403 (OCoLC)58567010 (DE-599)BVBBV044108030 |
dewey-full | 621.044 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.044 |
dewey-search | 621.044 |
dewey-sort | 3621.044 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Werkstoffwissenschaften / Fertigungstechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01633nmm a2200385zc 4500</leader><controlfield tag="001">BV044108030</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180516 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170217s1995 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0309575168</subfield><subfield code="9">0-309-57516-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-30-PAD)EBC3377403</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-89-EBL)EBL3377403</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)58567010</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044108030</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.044</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma processing and processing science</subfield><subfield code="c">Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, D.C.</subfield><subfield code="b">National Academy Press</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">x, 35 p</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">NRL strategic series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chen, Francis F.</subfield><subfield code="d">1929-</subfield><subfield code="e">Sonstige</subfield><subfield code="0">(DE-588)17201932X</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)XXbPanel on Plasma Processing</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)XXbNaval Studies Board</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)XXbCommission on Physical Sciences, Mathematics, and Applications</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-30-PAD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029514875</subfield></datafield></record></collection> |
id | DE-604.BV044108030 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T07:43:52Z |
institution | BVB |
isbn | 0309575168 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029514875 |
oclc_num | 58567010 |
open_access_boolean | |
physical | x, 35 p |
psigel | ZDB-30-PAD |
publishDate | 1995 |
publishDateSearch | 1995 |
publishDateSort | 1995 |
publisher | National Academy Press |
record_format | marc |
series2 | NRL strategic series |
spelling | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council Washington, D.C. National Academy Press 1995 x, 35 p txt rdacontent c rdamedia cr rdacarrier NRL strategic series Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 Plasma engineering Semiconductors Etching Plasma etching Chen, Francis F. 1929- Sonstige (DE-588)17201932X oth National Research Council (U.S.)XXbPanel on Plasma Processing Sonstige oth National Research Council (U.S.)XXbNaval Studies Board Sonstige oth National Research Council (U.S.)XXbCommission on Physical Sciences, Mathematics, and Applications Sonstige oth |
spellingShingle | Plasma processing and processing science Plasma engineering Semiconductors Etching Plasma etching |
title | Plasma processing and processing science |
title_auth | Plasma processing and processing science |
title_exact_search | Plasma processing and processing science |
title_full | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
title_fullStr | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
title_full_unstemmed | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
title_short | Plasma processing and processing science |
title_sort | plasma processing and processing science |
topic | Plasma engineering Semiconductors Etching Plasma etching |
topic_facet | Plasma engineering Semiconductors Etching Plasma etching |
work_keys_str_mv | AT chenfrancisf plasmaprocessingandprocessingscience AT nationalresearchcouncilusxxbpanelonplasmaprocessing plasmaprocessingandprocessingscience AT nationalresearchcouncilusxxbnavalstudiesboard plasmaprocessingandprocessingscience AT nationalresearchcouncilusxxbcommissiononphysicalsciencesmathematicsandapplications plasmaprocessingandprocessingscience |