Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It cov...
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| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Somerset
John Wiley & Sons, Incorporated
2013
|
| Edition: | 2nd ed |
| Subjects: | |
| Summary: | Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials |
| Item Description: | Description based on publisher supplied metadata and other sources |
| Physical Description: | 1 online resource (229 pages) |
| ISBN: | 9781118747384 9781118062777 |
Staff View
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV044050249 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170217s2013 |||| o||u| ||||||eng d | ||
| 020 | |a 9781118747384 |9 978-1-118-74738-4 | ||
| 020 | |a 9781118062777 |c Print |9 978-1-118-06277-7 | ||
| 035 | |a (ZDB-30-PAD)EBC1192829 | ||
| 035 | |a (ZDB-89-EBL)EBL1192829 | ||
| 035 | |a (ZDB-38-EBR)ebr10715316 | ||
| 035 | |a (OCoLC)849246192 | ||
| 035 | |a (DE-599)BVBBV044050249 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 082 | 0 | |a 620.5 | |
| 100 | 1 | |a K??ri?inen, Tommi |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Atomic Layer Deposition |b Principles, Characteristics, and Nanotechnology Applicatons |
| 250 | |a 2nd ed | ||
| 264 | 1 | |a Somerset |b John Wiley & Sons, Incorporated |c 2013 | |
| 264 | 4 | |c © 2013 | |
| 300 | |a 1 online resource (229 pages) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a Description based on publisher supplied metadata and other sources | ||
| 520 | |a Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials | ||
| 650 | 4 | |a Chemical vapor deposition | |
| 650 | 4 | |a Epitaxy | |
| 650 | 4 | |a Microelectronics | |
| 650 | 4 | |a Nanotechnology | |
| 700 | 1 | |a Cameron, David |e Sonstige |4 oth | |
| 700 | 1 | |a K??ri?inen, Marja-Leena |e Sonstige |4 oth | |
| 700 | 1 | |a Sherman, Arthur |e Sonstige |4 oth | |
| 700 | 1 | |a Kriinen, Marja-Leena |e Sonstige |4 oth | |
| 700 | 1 | |a Kääriäinen, Tommi |e Sonstige |4 oth | |
| 700 | 1 | |a Kääriäinen, Marja-Leena |e Sonstige |4 oth | |
| 700 | 1 | |a Kriinen, Tommi |e Sonstige |4 oth | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |a K??ri?inen, Tommi |t Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons |
| 912 | |a ZDB-30-PAD |a ZDB-38-ESG | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029457094 | ||
Record in the Search Index
| _version_ | 1804177067556732928 |
|---|---|
| any_adam_object | |
| author | K??ri?inen, Tommi |
| author_facet | K??ri?inen, Tommi |
| author_role | aut |
| author_sort | K??ri?inen, Tommi |
| author_variant | t k tk |
| building | Verbundindex |
| bvnumber | BV044050249 |
| collection | ZDB-30-PAD ZDB-38-ESG |
| ctrlnum | (ZDB-30-PAD)EBC1192829 (ZDB-89-EBL)EBL1192829 (ZDB-38-EBR)ebr10715316 (OCoLC)849246192 (DE-599)BVBBV044050249 |
| dewey-full | 620.5 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.5 |
| dewey-search | 620.5 |
| dewey-sort | 3620.5 |
| dewey-tens | 620 - Engineering and allied operations |
| edition | 2nd ed |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02351nmm a2200505zc 4500</leader><controlfield tag="001">BV044050249</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170217s2013 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781118747384</subfield><subfield code="9">978-1-118-74738-4</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781118062777</subfield><subfield code="c">Print</subfield><subfield code="9">978-1-118-06277-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-30-PAD)EBC1192829</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-89-EBL)EBL1192829</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-38-EBR)ebr10715316</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)849246192</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044050249</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620.5</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">K??ri?inen, Tommi</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Atomic Layer Deposition</subfield><subfield code="b">Principles, Characteristics, and Nanotechnology Applicatons</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2nd ed</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Somerset</subfield><subfield code="b">John Wiley & Sons, Incorporated</subfield><subfield code="c">2013</subfield></datafield><datafield tag="264" ind1=" " ind2="4"><subfield code="c">© 2013</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (229 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Description based on publisher supplied metadata and other sources</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical vapor deposition</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Epitaxy</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanotechnology</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Cameron, David</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">K??ri?inen, Marja-Leena</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Sherman, Arthur</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kriinen, Marja-Leena</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kääriäinen, Tommi</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kääriäinen, Marja-Leena</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kriinen, Tommi</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="a">K??ri?inen, Tommi</subfield><subfield code="t">Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-30-PAD</subfield><subfield code="a">ZDB-38-ESG</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029457094</subfield></datafield></record></collection> |
| id | DE-604.BV044050249 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:42:11Z |
| institution | BVB |
| isbn | 9781118747384 9781118062777 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029457094 |
| oclc_num | 849246192 |
| open_access_boolean | |
| physical | 1 online resource (229 pages) |
| psigel | ZDB-30-PAD ZDB-38-ESG |
| publishDate | 2013 |
| publishDateSearch | 2013 |
| publishDateSort | 2013 |
| publisher | John Wiley & Sons, Incorporated |
| record_format | marc |
| spelling | K??ri?inen, Tommi Verfasser aut Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons 2nd ed Somerset John Wiley & Sons, Incorporated 2013 © 2013 1 online resource (229 pages) txt rdacontent c rdamedia cr rdacarrier Description based on publisher supplied metadata and other sources Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Cameron, David Sonstige oth K??ri?inen, Marja-Leena Sonstige oth Sherman, Arthur Sonstige oth Kriinen, Marja-Leena Sonstige oth Kääriäinen, Tommi Sonstige oth Kääriäinen, Marja-Leena Sonstige oth Kriinen, Tommi Sonstige oth Erscheint auch als Druck-Ausgabe K??ri?inen, Tommi Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons |
| spellingShingle | K??ri?inen, Tommi Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| title | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_auth | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_exact_search | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_full | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_fullStr | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_full_unstemmed | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_short | Atomic Layer Deposition |
| title_sort | atomic layer deposition principles characteristics and nanotechnology applicatons |
| title_sub | Principles, Characteristics, and Nanotechnology Applicatons |
| topic | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| topic_facet | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| work_keys_str_mv | AT kriinentommi atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons AT camerondavid atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons AT kriinenmarjaleena atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons AT shermanarthur atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons AT kaariainentommi atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons AT kaariainenmarjaleena atomiclayerdepositionprinciplescharacteristicsandnanotechnologyapplicatons |