Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It cov...
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Somerset
John Wiley & Sons, Incorporated
2013
|
| Ausgabe: | 2nd ed |
| Schlagworte: | |
| Zusammenfassung: | Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials |
| Beschreibung: | Description based on publisher supplied metadata and other sources |
| Beschreibung: | 1 online resource (229 pages) |
| ISBN: | 9781118747384 9781118062777 |
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| 520 | |a Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials | ||
| 650 | 4 | |a Chemical vapor deposition | |
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| 700 | 1 | |a K??ri?inen, Marja-Leena |e Sonstige |4 oth | |
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| 700 | 1 | |a Kääriäinen, Tommi |e Sonstige |4 oth | |
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| dewey-full | 620.5 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.5 |
| dewey-search | 620.5 |
| dewey-sort | 3620.5 |
| dewey-tens | 620 - Engineering and allied operations |
| edition | 2nd ed |
| format | Electronic eBook |
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| id | DE-604.BV044050249 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:42:11Z |
| institution | BVB |
| isbn | 9781118747384 9781118062777 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029457094 |
| oclc_num | 849246192 |
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| physical | 1 online resource (229 pages) |
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| publisher | John Wiley & Sons, Incorporated |
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| spelling | K??ri?inen, Tommi Verfasser aut Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons 2nd ed Somerset John Wiley & Sons, Incorporated 2013 © 2013 1 online resource (229 pages) txt rdacontent c rdamedia cr rdacarrier Description based on publisher supplied metadata and other sources Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Cameron, David Sonstige oth K??ri?inen, Marja-Leena Sonstige oth Sherman, Arthur Sonstige oth Kriinen, Marja-Leena Sonstige oth Kääriäinen, Tommi Sonstige oth Kääriäinen, Marja-Leena Sonstige oth Kriinen, Tommi Sonstige oth Erscheint auch als Druck-Ausgabe K??ri?inen, Tommi Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons |
| spellingShingle | K??ri?inen, Tommi Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| title | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_auth | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_exact_search | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_full | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_fullStr | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_full_unstemmed | Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applicatons |
| title_short | Atomic Layer Deposition |
| title_sort | atomic layer deposition principles characteristics and nanotechnology applicatons |
| title_sub | Principles, Characteristics, and Nanotechnology Applicatons |
| topic | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| topic_facet | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
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