Ion-solid interactions: fundamentals and applications
Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated...
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Cambridge
Cambridge University Press
1996
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| Schriftenreihe: | Cambridge solid state science series
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| Schlagworte: | |
| Online-Zugang: | BSB01 FHN01 Volltext |
| Zusammenfassung: | Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis |
| Beschreibung: | Title from publisher's bibliographic system (viewed on 05 Oct 2015) |
| Beschreibung: | 1 online resource (xxvi, 540 pages) |
| ISBN: | 9780511565007 |
| DOI: | 10.1017/CBO9780511565007 |
Internformat
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| 505 | 8 | 0 | |g Ch. 1 |t General features and fundamental concepts |g Ch. 2 |t Interatomic potentials |g Ch. 3 |t Dynamics of binary elastic collisions |g Ch. 4 |t Cross-section |g Ch. 5 |t Ion stopping |g Ch. 6 |t Ion range and range distribution |g Ch. 7 |t Radiation damage and spikes |g Ch. 8 |t Ion-solid simulations and diffusion |g Ch. 9 |t Sputtering |g Ch. 10 |t Order-disorder and ion implantation metallurgy |g Ch. 11 |t Ion beam mixing |g Ch. 12 |t Phase transformations |g Ch. 13 |t Ion beam assisted deposition |g Ch. 14 |t Applications of ion beam processing techniques |t Appendix A: Crystallography |t Appendix B: Table of the elements |t Appendix C: Density of states |t Appendix D: Derivation of the Thomas-Fermi differential equation |t Appendix E: Center-of-mass and laboratory scattering angles |t Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states |t Appendix G: Implantation metallurgy |t udy of equilibrium alloys |
| 520 | |a Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis | ||
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Datensatz im Suchindex
| _version_ | 1804176885103460352 |
|---|---|
| any_adam_object | |
| author | Nastasi, Michael 1950- |
| author_GND | (DE-588)1059463164 (DE-588)121494349 (DE-588)1158310048 |
| author_facet | Nastasi, Michael 1950- |
| author_role | aut |
| author_sort | Nastasi, Michael 1950- |
| author_variant | m n mn |
| building | Verbundindex |
| bvnumber | BV043942386 |
| classification_rvk | UP 9300 UP 9350 |
| collection | ZDB-20-CBO |
| contents | General features and fundamental concepts Interatomic potentials Dynamics of binary elastic collisions Cross-section Ion stopping Ion range and range distribution Radiation damage and spikes Ion-solid simulations and diffusion Sputtering Order-disorder and ion implantation metallurgy Ion beam mixing Phase transformations Ion beam assisted deposition Applications of ion beam processing techniques Appendix A: Crystallography Appendix B: Table of the elements Appendix C: Density of states Appendix D: Derivation of the Thomas-Fermi differential equation Appendix E: Center-of-mass and laboratory scattering angles Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states Appendix G: Implantation metallurgy udy of equilibrium alloys |
| ctrlnum | (ZDB-20-CBO)CR9780511565007 (OCoLC)849921894 (DE-599)BVBBV043942386 |
| dewey-full | 530.4/16 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 530 - Physics |
| dewey-raw | 530.4/16 |
| dewey-search | 530.4/16 |
| dewey-sort | 3530.4 216 |
| dewey-tens | 530 - Physics |
| discipline | Physik |
| doi_str_mv | 10.1017/CBO9780511565007 |
| format | Electronic eBook |
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| id | DE-604.BV043942386 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:39:17Z |
| institution | BVB |
| isbn | 9780511565007 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029351356 |
| oclc_num | 849921894 |
| open_access_boolean | |
| owner | DE-12 DE-92 |
| owner_facet | DE-12 DE-92 |
| physical | 1 online resource (xxvi, 540 pages) |
| psigel | ZDB-20-CBO ZDB-20-CBO BSB_PDA_CBO ZDB-20-CBO FHN_PDA_CBO |
| publishDate | 1996 |
| publishDateSearch | 1996 |
| publishDateSort | 1996 |
| publisher | Cambridge University Press |
| record_format | marc |
| series2 | Cambridge solid state science series |
| spelling | Nastasi, Michael 1950- Verfasser (DE-588)1059463164 aut Ion-solid interactions fundamentals and applications Michael Nastasi, James W. Mayer, and James K. Hirvonen Cambridge Cambridge University Press 1996 1 online resource (xxvi, 540 pages) txt rdacontent c rdamedia cr rdacarrier Cambridge solid state science series Title from publisher's bibliographic system (viewed on 05 Oct 2015) Ch. 1 General features and fundamental concepts Ch. 2 Interatomic potentials Ch. 3 Dynamics of binary elastic collisions Ch. 4 Cross-section Ch. 5 Ion stopping Ch. 6 Ion range and range distribution Ch. 7 Radiation damage and spikes Ch. 8 Ion-solid simulations and diffusion Ch. 9 Sputtering Ch. 10 Order-disorder and ion implantation metallurgy Ch. 11 Ion beam mixing Ch. 12 Phase transformations Ch. 13 Ion beam assisted deposition Ch. 14 Applications of ion beam processing techniques Appendix A: Crystallography Appendix B: Table of the elements Appendix C: Density of states Appendix D: Derivation of the Thomas-Fermi differential equation Appendix E: Center-of-mass and laboratory scattering angles Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states Appendix G: Implantation metallurgy udy of equilibrium alloys Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological and chemical properties of metal, intermetallic and ceramic materials without altering their bulk properties. Ion–solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion–solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering and material science issues associated with metastable phase synthesis Solids / Effect of radiation on Ion bombardment Ion implantation / Industrial applications Festkörper (DE-588)4016918-2 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 gnd rswk-swf Ionenstrahlbearbeitung (DE-588)4277034-8 gnd rswk-swf Ion (DE-588)4027597-8 gnd rswk-swf Ion (DE-588)4027597-8 s Festkörper (DE-588)4016918-2 s 1\p DE-604 Ionenimplantation (DE-588)4027606-5 s 2\p DE-604 Ionenstrahlbearbeitung (DE-588)4277034-8 s 3\p DE-604 Mayer, James W. 1930-2013 Sonstige (DE-588)121494349 oth Hirvonen, James K. Sonstige (DE-588)1158310048 oth Erscheint auch als Druckausgabe 978-0-521-37376-0 Erscheint auch als Druckausgabe 978-0-521-61606-5 https://doi.org/10.1017/CBO9780511565007 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Nastasi, Michael 1950- Ion-solid interactions fundamentals and applications General features and fundamental concepts Interatomic potentials Dynamics of binary elastic collisions Cross-section Ion stopping Ion range and range distribution Radiation damage and spikes Ion-solid simulations and diffusion Sputtering Order-disorder and ion implantation metallurgy Ion beam mixing Phase transformations Ion beam assisted deposition Applications of ion beam processing techniques Appendix A: Crystallography Appendix B: Table of the elements Appendix C: Density of states Appendix D: Derivation of the Thomas-Fermi differential equation Appendix E: Center-of-mass and laboratory scattering angles Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states Appendix G: Implantation metallurgy udy of equilibrium alloys Solids / Effect of radiation on Ion bombardment Ion implantation / Industrial applications Festkörper (DE-588)4016918-2 gnd Ionenimplantation (DE-588)4027606-5 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd Ion (DE-588)4027597-8 gnd |
| subject_GND | (DE-588)4016918-2 (DE-588)4027606-5 (DE-588)4277034-8 (DE-588)4027597-8 |
| title | Ion-solid interactions fundamentals and applications |
| title_alt | General features and fundamental concepts Interatomic potentials Dynamics of binary elastic collisions Cross-section Ion stopping Ion range and range distribution Radiation damage and spikes Ion-solid simulations and diffusion Sputtering Order-disorder and ion implantation metallurgy Ion beam mixing Phase transformations Ion beam assisted deposition Applications of ion beam processing techniques Appendix A: Crystallography Appendix B: Table of the elements Appendix C: Density of states Appendix D: Derivation of the Thomas-Fermi differential equation Appendix E: Center-of-mass and laboratory scattering angles Appendix F: Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states Appendix G: Implantation metallurgy udy of equilibrium alloys |
| title_auth | Ion-solid interactions fundamentals and applications |
| title_exact_search | Ion-solid interactions fundamentals and applications |
| title_full | Ion-solid interactions fundamentals and applications Michael Nastasi, James W. Mayer, and James K. Hirvonen |
| title_fullStr | Ion-solid interactions fundamentals and applications Michael Nastasi, James W. Mayer, and James K. Hirvonen |
| title_full_unstemmed | Ion-solid interactions fundamentals and applications Michael Nastasi, James W. Mayer, and James K. Hirvonen |
| title_short | Ion-solid interactions |
| title_sort | ion solid interactions fundamentals and applications |
| title_sub | fundamentals and applications |
| topic | Solids / Effect of radiation on Ion bombardment Ion implantation / Industrial applications Festkörper (DE-588)4016918-2 gnd Ionenimplantation (DE-588)4027606-5 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd Ion (DE-588)4027597-8 gnd |
| topic_facet | Solids / Effect of radiation on Ion bombardment Ion implantation / Industrial applications Festkörper Ionenimplantation Ionenstrahlbearbeitung Ion |
| url | https://doi.org/10.1017/CBO9780511565007 |
| work_keys_str_mv | AT nastasimichael ionsolidinteractionsfundamentalsandapplications AT mayerjamesw ionsolidinteractionsfundamentalsandapplications AT hirvonenjamesk ionsolidinteractionsfundamentalsandapplications |