Advanced nano deposition methods:
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| Format: | Elektronisch E-Book |
| Sprache: | English |
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Weinheim
Wiley-VCH Verlag GmbH & Co. KGaA
[2016]
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| Online-Zugang: | FRO01 UBG01 UER01 Volltext Inhaltsverzeichnis |
| Beschreibung: | 1 online resource |
| ISBN: | 9783527696406 9783527696451 9783527696475 9783527696468 |
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| 245 | 1 | 0 | |a Advanced nano deposition methods |c edited by Yuan Lin and Xin Chen |
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| 650 | 7 | |a Nanostructured materials |2 fast | |
| 650 | 4 | |a Nanostructured materials | |
| 700 | 1 | |a Lin, Yuan |0 (DE-588)1120042127 |4 edt | |
| 700 | 1 | |a Chen, Xin |0 (DE-588)1033698318 |4 edt | |
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Datensatz im Suchindex
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| adam_text | CONTENTS
LIST OF CONTRIBUTORS XIII
1 PULSED LASER DEPOSITION FOR COMPLEX OXIDE THIN FILM AND
NANOSTRUCTURE 1
CHUNRUI MA AND CHONGLIN CHEN
1.1 INTRODUCTION 1
1.2 PULSED LASER DEPOSITION SYSTEM SETUP 2
1.3 ADVANTAGES AND DISADVANTAGES OF PULSED LASER DEPOSITION 3
1.4 THE THERMODYNAMICS AND KINETICS OF PULSED LASER DEPOSITION 3
1.4.1 LASER-MATERIAL INTERACTIONS 4
1.4.2 DYNAMICS OF THE PLASMA 5
1.4.3 NUCLEATION AND GROWTH OF THE FILM ON THE SUBSTRATE SURFACE 5
1.5 MONITORING OF GROWTH KINETICS 8
1.5.1 INTRODUCTION AND RHEED STUDIES 8
1.5.2 GROWTH KINETICS STUDIES BY SURFACE X-RAY DIFFRACTION 9
1.6 FUNDAMENTAL PARAMETERS IN THIN FILM GROWTH 10
1.6.1 SUBSTRATE TEMPERATURE 10
1.6.2 BACKGROUND GAS PRESSURE 10
1.6.3 LASER FLUENCE AND ABLATION AREA 11
1.6.4 TARGET - SUBSTRATE DISTANCE 11
1.6.5 POST-ANNEALING 12
1.6.6 LATTICE MISFIT 12
1.7 PULSED LASER DEPOSITION FOR COMPLEX OXIDE THIN FILM
GROWTH 13
1.7.1 PULSED LASER DEPOSITION FOR SUPERCONDUCTOR THIN FILM 14
1.7.2 PULSED LASER DEPOSITION FOR FERROELECTRIC THIN FILMS 14
1.7.3 PULSED LASER DEPOSITION FOR FERROMAGNETIC THIN FILM IS
1.7.4 PULSED LASER DEPOSITION FOR MULTIFERROICS THIN FILM 15
1.7.5 INTERFACE STRAIN ENGINEERING THE COMPLEX OXIDE THIN FILM 16
1.7.5.1 THICKNESS EFFECT 16
1.7.5.2 SUBSTRATE EFFECT 17
1.7.5.3 POST-ANNEALING 21
1.8 PULSED LASER DEPOSITION FOR NANOSTRUCTURE GROWTH 23
1.8.1 SELF-ASSEMBLED NANOSCALE STRUCTURES 23
1.8.2 GEOMETRICALLY ORDERED ARRAYS 23
1.9 VARIATION OF PULSED LASER DEPOSITION 24
1.10 CONCLUSION 24
REFERENCES 25
2 ELECTRON BEAM EVAPORATION DEPOSITION 33
ZHONGPING WANG ANDZENGMING ZHANG
2.1 INTRODUCTION 33
2.2 ELECTRON BEAM EVAPORATION SYSTEM 35
2.2.1 HEATING PRINCIPLE AND CHARACTERS OF ELECTRON BEAMS 35
2.2.1.1 HEATING PRINCIPLE OF ELECTRON BEAMS 35
2.2.1.2 CHARACTERS OF ELECTRON BEAMS
36
2.2.2 EQUIPMENTS OF ELECTRON BEAM SOURCE 37
2.2.2.1 FILAMENT AND ELECTRON EMISSION 37
2.2.2.2 ELECTRON BEAM CONTROL 38
2.2.2.S POWER SUPPLY, CRUCIBLES, AND FEED SYSTEMS 39
2.2.2.4 SOURCE MATERIALS 40
2.2.3 APPLICATION OF ELECTRON BEAM EVAPORATION 43
2.2.3.1 COOLING OF ELECTRON BEAM GUN 43
2.2.3.2 EVAPORATION OF SOURCE MATERIALS BY ELECTRON BEAM 43
2.2.3.3 VACUUM DEPOSITION PROCESS OF ELECTRON BEAM EVAPORATION 44
2.2.3.4 ATTENTION AND WARNING FOR ELECTRON BEAM EVAPORATION 45
2.3 CHARACTERIZATION OF THIN FILM 45
2.3.1 SURFACE MORPHOLOGY BY AFM
46
2.3.2 THICKNESS MEASUREMENT BY SPECTROSCOPIC ELLIPSOMETRY 47
2.4 SUMMARY 53
ACKNOWLEDGMENTS 53
REFERENCES 53
3 NANOSTRUCTURES AND THIN FILMS DEPOSITED WITH SPUTTERING 59
WEIQING YANG
3.1 INTRODUCTION 59
3.2 NANOSTRUCTURES WITH SPUTTERING 60
3.2.1 OXIDE NANOSTRUCTURES 61
3.2.1.1 NEEDLE-SHAPED M O03 NANOWIRES 61
3.2.1.2 BI2OS NANOWIRES 64
3.2.2 NITRIDE NANOSTRUCTURES 65
3.2.2.1 GRAPHITIC-C3N4 NANOCONE ARRAY 65
3.2.2.2 INAIN NANORODS 68
3.3 THIN FILMS DEPOSITED WITH SPUTTERING 71
3.3.1 METAL ALLOY THIN FILMS 73
3.3.1.1 LANI5 ALLOY THIN FILMS 73
3.3.1.2 N I-M N -IN ALLOY THIN FILMS 74
3.3.2 COMPOSITE METAL OXIDE THIN FILMS 75
3.3.2.1
3.4
4
4.1
4.2
4.2.1
4.2.2
4.2.2.1
4.2.2.2
4.2.2.S
4.3
4.3.1
4.3.2
4.4
4.5
5
5.1
5.2
5.2.1
5.2.2
5.2.3
5.3
5.3.1
5.3.2
5.4
5.4.1
5.4.2
5.5
BIFE03/BATI03 BILAYER THIN FILMS 75
SUMMARY 76
ACKNOWLEDGMENTS 77
REFERENCES 77
NANOSTRUCTURES AND QUANTUM DOTS DEVELOPMENT WITH MOLECULAR
BEAM EPITAXY 81
WEN HUANG
INTRODUCTION 81
TECHNOLOGY OF MBE 82
THE PHYSICS OF MBE 83
MBE GROWTH MECHANISMS 86
TWO-DIMENSIONAL (2D) MBE GROWTH MECHANISM 87
THREE-DIMENSIONAL (3D) MBE GROWTH MECHANISM 88
STRANSKIE - KRASTANOW 3D GROWTH MECHANISM 90
NANOHETEROSTRUCTURES FABRICATED BY MOLECULAR BEAM
EPITAXY 91
SEMICONDUCTING OXIDE HETEROSTRUCTURES GROWN BY LASER MOLECULAR
BEAM EPITAXY 91
STRAIN-INDUCED MAGNETIC ANISOTROPY IN HIGHLY EPITAXIAL
HETEROSTRUCTURE BY LMBE 96
QUANTUM DOTS DEVELOPMENT WITH MOLECULAR BEAM
EPITAXY
101
SUMMARY 103
ACKNOWLEDGMENTS 104
REFERENCES 104
CARBON NANOMATERIALS AND 2D LAYERED MATERIALS DEVELOPMENT WITH
CHEMICAL VAPOR DEPOSITION
105
TAISONG PAN
INTRODUCTION 105
CARBON NANOTUBE SYNTHESIS BY CHEMICAL VAPOR DEPOSITION 106
OVERVIEW OF CVD PROCESS OF CARBON NANOTUBE GROWTH 106
CONTROL OF CARBON NANOTUBE STRUCTURE 108
THE ALIGNMENT OF CARBON NANOTUBE ARRAY 110
GRAPHENE SYNTHESIS BY CHEMICAL VAPOR DEPOSITION 112
OVERVIEW OF CVD PROCESS OF GRAPHENE SYNTHESIS 112
CONTROL OF GRAPHENE QUALITY 113
METAL DICHALCOGENIDE SYNTHESIS BY CHEMICAL VAPOR
DEPOSITION 115
OVERVIEW OF CVD PROCESS OF METAL DICHALCOGENIDES 115
GROWTH CONTROL OF METAL DICHALCOGENIDES IN CHEMICAL VAPOR
DEPOSITION
118
SUMMARY 119
REFERENCES 120
6
6.1
6.2
6
.
2.1
6
.
2.2
6.2.3
6.3
6.3.1
6.3.2
6.3.3
6.4
7
7.1
7.2
7.2.1
7.2.2
7.2.2.1
7.3
7.3.1
7.3.2
7.3.2.1
73.2.2
7.3.23
7.3.2.4
7.4
8
8.1
8.2
8
.
2.1
8
.
2.2
8.2.3
NANOSTRUCTURES DEVELOPMENT WITH ATOMIC LAYER DEPOSITION 123
HULIN ZHANG
INTRODUCTION 123
REACTION MECHANISMS 125
THERMAL ALD 125
CATALYTIC ALD 127
METAL ALD 129
NANOSTRUCTURES BASED ON ALD 131
NANOLAMINATES AND NANOFILMS 132
NANOSTRUCTURES AS TEMPLATES 132
NANOSTRUCTURED MODIFICATION 135
SUMMARY 136
ACKNOWLEDGMENTS 137
REFERENCES 138
NANOMATERIAL DEVELOPMENT WITH LIQUID-PHASE EPITAXY 141
WEIQING YANG
INTRODUCTION 141
HYDROTHERMAL METHOD 142
DEVELOPMENT OF HYDROTHERMAL METHOD 142
MICROWAVE-ASSISTED HYDROTHERMAL METHOD 143
MICROWAVE-ASSISTED PREPARATION OF NANOSTRUCTURES IN AQUEOUS
SOLUTION 144
NANOSTRUCTURES FABRICATED USING LPE 147
CORE-SHELL STRUCTURES 147
THE EPITAXIAL PREPARATION METHODS OF CORE-SHELL STRUCTURES 148
GENERAL NANOCHEMICAL APPROACHES TO PREPARE EPITAXIAL CORE-SHELL
UCNPS WITH A SINGLE SHELL LAYER 150
LAYER-BY-LAYER APPROACH TO PREPARE CORE-MULTISHELL UCNPS WITH
MONOLAYER THICKNESS PRECISION
153
MESOPOROUS SILICA COATING 153
COUPLING OF UCNPS WITH PLASMONICS USING CORE-SHELL
ARCHITECTURE 154
SUMMARY 156
ACKNOWLEDGMENTS 156
REFERENCES 156
NANOSTRUCTURAL THIN FILM DEVELOPMENT WITH CHEMICAL SOLUTION
DEPOSITION 159
YANDA JI AND YUAN LIN
INTRODUCTION 159
PRECURSOR SOLUTION PREPARATION 159
CHEMICAL STRATEGIES FOR PRECURSOR SOLUTIONS 160
SOL-GEL METHOD 160
METAL-ORGANIC DEPOSITION 161
8.2.4
8.3
8.4
8.5
8.5.1
8.5.2
8.6
8
.
6.1
8
.
6.2
8.6.3
8.7
9
9.1
9.2
9.2.1
9.2.2
9.2.3
9.3
9.3.1
9.3.2
9.3.3
9.3.4
9.4
10
10.1
10.2
10.3
10.4
10.5
10.6
10.7
POLYMER-ASSISTED DEPOSITION 161
COATING 162
THERMAL TREATMENT 163
CONTROL OF THE MICROSTRUCTURES IN THIN FILMS PREPARED BY CSD
TECHNIQUES 164
THERMODYNAMICS FOR CSD-DELIVERED THIN FILMS 164
EPITAXIAL THIN FILM GROWTH 166
EXAMPLES OF NANOSTRUCTURAL THIN FILMS PREPARED BY CSD
TECHNIQUES 167
SOL-GEL-DELIVERED NANOSTRUCTURED MATERIALS 167
MOD OF NANOSTRUCTURED MATERIALS 168
PAD-DELIVERED NANOSTRUCTURED MATERIALS 168
SUMMARY 174
REFERENCES 175
NANOMATERIAL DEVELOPMENT USING
IN SITU
LIQUID CELL TRANSMISSION
ELECTRON MICROSCOPY 179
XIN CHEN, WANG FAN ZHOU, DEBIAOXIE, AND HONG HANG CAO
INTRODUCTION 179
THE TECHNOLOGICAL DEVELOPMENT OF IN SITU LIQUID CELL TEM 179
THE ADVENT OF THE MODERN
IN SITU LIQUID CELL 180
RECENT TECHNOLOGICAL DEVELOPMENT OF LIQUID CELLS 180
COMMERCIAL LIQUID CELLS 183
NANOMATERIAL DEVELOPMENT USING
IN SITU LIQUID CELL TEM
TECHNOLOGY 185
NANOMATERIAL GROWTH INDUCED BY ELECTRICAL BIAS 185
NANOMATERIAL GROWTH INDUCED BY IRRADIATION 187
NANOMATERIAL FORMATION INDUCED BY HEATING 189
FURTHER NANOMATERIAL DEVELOPMENT RESULTS FROM
IN SITU LIQUID CELL
TEM 190
SUMMARY AND OUTLOOK 191
ACKNOWLEDGMENTS 191
REFERENCES 192
DIRECT-WRITING NANOLITHOGRAPHY 195
MIN GAO
INTRODUCTION 195
ELECTRON BEAM LITHOGRAPHY 195
FOCUSED ION BEAM LITHOGRAPHY 198
GAS-ASSISTED ELECTRON AND ION BEAM LITHOGRAPHY 200
SPM LITHOGRAPHY 201
DIP-PEN LITHOGRAPHY 205
SUMMARY 206
ACKNOWLEDGMENTS 207
REFERENCES 207
11 3D PRINTING OF NANOSTRUCTURES 209
MIN GAO
11.1 INTRODUCTION 209
11.2 3D PRINTING PROCESSES 209
11.3 TYPES OF 3D PRINTING 2I0
11.3.1 STEREOLITHOGRAPHY 2I0
11.3.2 FUSED DEPOSITION MODELING 211
11.3.3 SELECTIVE DEPOSITION LAMINATION 212
11.3.4 SELECTIVE LASER SINTERING 213
11.3.5 3D INKJET PRINTING 214
11.3.6 MULTIJET MODELING 214
11.4 3D DIRECT LASER WRITING BY MULTIPHOTON POLYMERIZATION 214
11.5 3D PRINTING APPLICATIONS 217
11.5.1 MEDICAL APPLICATIONS 217
11.5.2 INDUSTRIAL MANUFACTURING 2I8
11.5.3 DAILY CONSUMPTION 219
11.5.4 LIMITATION OF 3D PRINTING APPLICATIONS 219
11.6 SUMMARY 219
ACKNOWLEDGMENTS 220
REFERENCES 220
12 NANOSTRUCTURED THIN FILM SOLID OXIDE FUEL CELLS 223
ALEX IGNATIEV, RABI EBRAHIM, MUKHTAR YELEUOV, DANIEL FISHER, XIN CHEN,
NAIJUAN WU, AND SEREKBOL TOKMOLDIN
12.1 INTRODUCTION 223
12.2 SOLID OXIDE FUEL CELLS 223
12.2.1 THIN FILM SOLID OXIDE FUEL CELL FABRICATION 225
12.2.2 THIN FILM SOLID OXIDE FUEL CELL TESTING 231
12.2.3 THIN FILM FUEL CELL STACK DEVELOPMENT AND TESTING 234
12.3 SUMMARY 237
ACKNOWLEDGMENTS 237
REFERENCES 237
13 NANOSTRUCTURED MAGNETIC THIN FILMS AND COATINGS 239
GORAN RASIC
13.1 INTRODUCTION 239
13.2 HIGH-FREQUENCY DEVICES 240
13.2.1 FERROMAGNETS 241
13.2.2 COERCIVITY 242
13.2.3 MAGNETIC LOSSES 243
13.2.4 NANOSCALE METHODS OF LOSS REDUCTION 244
13.2.5 MANUFACTURING CONSIDERATIONS 244
13.2.6 COERCIVITY REDUCTION IN SURFACE-PATTERNED MAGNETIC THIN
FILMS 245
13.3 MAGNETIC INFORMATION STORAGE DEVICES 251
13.3.1 SUPERPARAMAGNETIC LIMIT 252
13.3.2 SIGNAL-TO-NOISE RATIO 253
13.3.3 PRESENT-DAY SOLUTIONS 253
13.3.4 BIT PATTERNED MEDIA 254
13.3.5 MANUFACTURING CONSIDERATIONS 255
13.3.6 PATTERNED MEDIA FOR MAGNETIC DATA STORAGE 256
13.4 SUMMARY 261
ACKNOWLEDGMENTS 261
REFERENCES 262
14 PHASE CHANGE MATERIALS FOR MEMORY APPLICATION 267
LIANGCAI WU AND ZHITANG SONG
14.1 INTRODUCTION 267
14.2 GE2SB2TE5 AND ITS PROPERTIES* IMPROVEMENT 268
14.2.1 GE2SB2TE5 PHASE CHANGE MATERIAL 268
14.2.2 N-DOPED GE2SB2TE5 MATERIAL 270
14.2.3 C-DOPED GE2SB2TE5 MATERIAL 272
14.2.3.1 FILM PROPERTIES AND MICROSTRUCTURE CHARACTERISTICS 272
14.2.3.2 REVERSIBLE PHASE CHANGE CHARACTERISTICS OF C-DOPED
GE2SB2TE5 274
14.3 HIGH-SPEED AND LOWER-POWER TISBTE MATERIALS 277
14.3.1 FILM PROPERTIES AND MICROSTRUCTURE CHARACTERISTICS 277
14.3.1.1 TI-DOPED SB2TE MATERIALS 277
14.3.1.2 TI-DOPED SB2TE3 MATERIALS 278
14.3.2 REVERSIBLE PHASE CHANGE CHARACTERISTICS OF TST ALLOY 280
14.4 SUMMARY 283
ACKNOWLEDGMENTS 283
REFERENCES 283
15 NANOMATERIALS AND DEVICES ON FLEXIBLE SUBSTRATES 285
HULIN ZHANG
15.1 INTRODUCTION 285
15.2 NANOMATERIALS ON FLEXIBLE SUBSTRATES 286
15.2.1 NANOMATERIALS SYNTHESIZED DIRECTLY ON FLEXIBLE SUBSTRATES 286
15.2.2 NANOMATERIALS TRANSFERRED ON FLEXIBLE SUBSTRATES 290
15.3 DEVICES ON FLEXIBLE SUBSTRATES 292
15.3.1 PRINTING ELECTRONICS ON FLEXIBLE SUBSTRATES 293
15.3.2 BIOINTEGRATED ELECTRONICS ON FLEXIBLE SUBSTRATES 298
15.4 SUMMARY 300
ACKNOWLEDGMENTS 301
REFERENCES 301
INDEX
305
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| id | DE-604.BV043864985 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:37:07Z |
| institution | BVB |
| isbn | 9783527696406 9783527696451 9783527696475 9783527696468 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029274997 |
| oclc_num | 957683058 965785412 |
| open_access_boolean | |
| owner | DE-861 DE-29 |
| owner_facet | DE-861 DE-29 |
| physical | 1 online resource |
| psigel | ZDB-35-WIC UBG_PDA_WIC ZDB-35-WIC FRO_PDA_WIC ZDB-35-WIC UBG_PDA_WIC ZDB-35-WIC UER_PDA_WIC_Kauf |
| publishDate | 2016 |
| publishDateSearch | 2016 |
| publishDateSort | 2016 |
| publisher | Wiley-VCH Verlag GmbH & Co. KGaA |
| record_format | marc |
| spelling | Advanced nano deposition methods edited by Yuan Lin and Xin Chen Weinheim Wiley-VCH Verlag GmbH & Co. KGaA [2016] © 2016 1 online resource txt rdacontent c rdamedia cr rdacarrier TECHNOLOGY & ENGINEERING / Engineering (General) bisacsh TECHNOLOGY & ENGINEERING / Reference bisacsh Nanostructured materials fast Nanostructured materials Lin, Yuan (DE-588)1120042127 edt Chen, Xin (DE-588)1033698318 edt Erscheint auch als Druck-Ausgabe 978-3-527-34025-5 https://onlinelibrary.wiley.com/doi/book/10.1002/9783527696406 Verlag URL des Erstveröffentlichers Volltext DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=029274997&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Advanced nano deposition methods TECHNOLOGY & ENGINEERING / Engineering (General) bisacsh TECHNOLOGY & ENGINEERING / Reference bisacsh Nanostructured materials fast Nanostructured materials |
| title | Advanced nano deposition methods |
| title_auth | Advanced nano deposition methods |
| title_exact_search | Advanced nano deposition methods |
| title_full | Advanced nano deposition methods edited by Yuan Lin and Xin Chen |
| title_fullStr | Advanced nano deposition methods edited by Yuan Lin and Xin Chen |
| title_full_unstemmed | Advanced nano deposition methods edited by Yuan Lin and Xin Chen |
| title_short | Advanced nano deposition methods |
| title_sort | advanced nano deposition methods |
| topic | TECHNOLOGY & ENGINEERING / Engineering (General) bisacsh TECHNOLOGY & ENGINEERING / Reference bisacsh Nanostructured materials fast Nanostructured materials |
| topic_facet | TECHNOLOGY & ENGINEERING / Engineering (General) TECHNOLOGY & ENGINEERING / Reference Nanostructured materials |
| url | https://onlinelibrary.wiley.com/doi/book/10.1002/9783527696406 http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=029274997&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT linyuan advancednanodepositionmethods AT chenxin advancednanodepositionmethods |