Ultra clean processing of semiconductor surfaces XII: selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium
Gespeichert in:
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| Weitere Verfasser: | , , |
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Pfaffikon, Switzerland
TTP
2014
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| Schriftenreihe: | Diffusion and defect data
v. 219 |
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 |
| Beschreibung: | Online resource; title from PDF title page (ebrary, viewed October 16, 2014) |
| Beschreibung: | 1 online resource (331 pages) illustrations |
| ISBN: | 9783038266266 3038266264 9783038352426 |
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| 245 | 1 | 0 | |a Ultra clean processing of semiconductor surfaces XII |b selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |c edited by Paul Mertens, Marc Meuris and Marc Heyns |
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| 490 | 0 | |a Diffusion and defect data |v v. 219 | |
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| 505 | 8 | |a Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications,Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications,Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics,Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC,Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells Keyword: Ultra-cleaning, precision cleaning, wet cleaning, Semiconductor Surfaces, contamination control, surface impurities, surface defects, Integrated circuits, Micro-electronic structures, photovoltaic processing, proceedings UCPSS. | |
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Datensatz im Suchindex
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| contents | Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications,Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications,Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics,Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC,Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells Keyword: Ultra-cleaning, precision cleaning, wet cleaning, Semiconductor Surfaces, contamination control, surface impurities, surface defects, Integrated circuits, Micro-electronic structures, photovoltaic processing, proceedings UCPSS. |
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| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
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| spelling | International Symposium on Ultra Clean Processing of Semiconductor Surfaces < 2014, Brussels, Belgium> Verfasser aut Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium edited by Paul Mertens, Marc Meuris and Marc Heyns Pfaffikon, Switzerland TTP 2014 © 2014 1 online resource (331 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Diffusion and defect data v. 219 Online resource; title from PDF title page (ebrary, viewed October 16, 2014) Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications,Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications,Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics,Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC,Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells Keyword: Ultra-cleaning, precision cleaning, wet cleaning, Semiconductor Surfaces, contamination control, surface impurities, surface defects, Integrated circuits, Micro-electronic structures, photovoltaic processing, proceedings UCPSS. TECHNOLOGY & ENGINEERING / Mechanical bisacsh Semiconductors fast Semiconductors Congresses (DE-588)1071861417 Konferenzschrift gnd-content Mertens, Paul edt Meuris, Marc edt Heyns, Marc edt Erscheint auch als Druck-Ausgabe International Symposium on Ultra Clean Processing of Semiconductor Surfaces (12th : 2014 : Brussels, Belgium) Ultra clean processing of semiconductor surfaces XII : selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |
| spellingShingle | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications,Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications,Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics,Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC,Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells Keyword: Ultra-cleaning, precision cleaning, wet cleaning, Semiconductor Surfaces, contamination control, surface impurities, surface defects, Integrated circuits, Micro-electronic structures, photovoltaic processing, proceedings UCPSS. TECHNOLOGY & ENGINEERING / Mechanical bisacsh Semiconductors fast Semiconductors Congresses |
| subject_GND | (DE-588)1071861417 |
| title | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |
| title_auth | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |
| title_exact_search | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |
| title_full | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium edited by Paul Mertens, Marc Meuris and Marc Heyns |
| title_fullStr | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium edited by Paul Mertens, Marc Meuris and Marc Heyns |
| title_full_unstemmed | Ultra clean processing of semiconductor surfaces XII selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium edited by Paul Mertens, Marc Meuris and Marc Heyns |
| title_short | Ultra clean processing of semiconductor surfaces XII |
| title_sort | ultra clean processing of semiconductor surfaces xii selected peer reviewed papers from the 12th international symposium on ultra clean processing of semiconductor surfaces ucpss september 21 24 2014 brussels belgium |
| title_sub | selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Semiconductors fast Semiconductors Congresses |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Semiconductors Semiconductors Congresses Konferenzschrift |
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