Thin film chemical vapor deposition in electronics: equipment, methodology, and thin film growth experience
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York
Nova Publishers
[2014]
|
| Schriftenreihe: | Materials science and technologies series
|
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 |
| Beschreibung: | Print version record |
| Beschreibung: | 1 online resource |
| ISBN: | 9781633211865 163321186X 9781633211506 1633211509 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV043781690 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 160920s2014 |||| o||u| ||||||eng d | ||
| 020 | |a 9781633211865 |9 978-1-63321-186-5 | ||
| 020 | |a 163321186X |9 1-63321-186-X | ||
| 020 | |a 9781633211506 |9 978-1-63321-150-6 | ||
| 020 | |a 1633211509 |9 1-63321-150-9 | ||
| 035 | |a (ZDB-4-EBA)ocn883242321 | ||
| 035 | |a (ZDB-4-ENC)ocn883242321 | ||
| 035 | |a (OCoLC)883242321 | ||
| 035 | |a (DE-599)BVBBV043781690 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 |a DE-1047 | ||
| 082 | 0 | |a 621.3815 |2 23 | |
| 245 | 1 | 0 | |a Thin film chemical vapor deposition in electronics |b equipment, methodology, and thin film growth experience |c editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation) |
| 264 | 1 | |a New York |b Nova Publishers |c [2014] | |
| 300 | |a 1 online resource | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Materials science and technologies series | |
| 500 | |a Print version record | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Mechanical |2 bisacsh | |
| 650 | 7 | |a Chemical vapor deposition |2 fast | |
| 650 | 7 | |a Integrated circuits / Design and construction |2 fast | |
| 650 | 7 | |a Thin film devices |2 fast | |
| 650 | 4 | |a Thin film devices |a Integrated circuits |x Design and construction |a Chemical vapor deposition | |
| 700 | 1 | |a Vasilʹev, V. I͡U. |e Sonstige |4 oth | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |a Thin film chemical vapor deposition in electronics |
| 912 | |a ZDB-4-EBA |a ZDB-4-ENC | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029192750 | ||
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=801974 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=801974 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804176612403445760 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV043781690 |
| collection | ZDB-4-EBA ZDB-4-ENC |
| ctrlnum | (ZDB-4-EBA)ocn883242321 (ZDB-4-ENC)ocn883242321 (OCoLC)883242321 (DE-599)BVBBV043781690 |
| dewey-full | 621.3815 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815 |
| dewey-search | 621.3815 |
| dewey-sort | 3621.3815 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01982nmm a2200457zc 4500</leader><controlfield tag="001">BV043781690</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">160920s2014 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781633211865</subfield><subfield code="9">978-1-63321-186-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">163321186X</subfield><subfield code="9">1-63321-186-X</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781633211506</subfield><subfield code="9">978-1-63321-150-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1633211509</subfield><subfield code="9">1-63321-150-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-EBA)ocn883242321</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-ENC)ocn883242321</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)883242321</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043781690</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815</subfield><subfield code="2">23</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Thin film chemical vapor deposition in electronics</subfield><subfield code="b">equipment, methodology, and thin film growth experience</subfield><subfield code="c">editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation)</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Nova Publishers</subfield><subfield code="c">[2014]</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials science and technologies series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Print version record</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mechanical</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Chemical vapor deposition</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Integrated circuits / Design and construction</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin film devices</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin film devices</subfield><subfield code="a">Integrated circuits</subfield><subfield code="x">Design and construction</subfield><subfield code="a">Chemical vapor deposition</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Vasilʹev, V. I͡U.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="a">Thin film chemical vapor deposition in electronics</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield><subfield code="a">ZDB-4-ENC</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029192750</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=801974</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=801974</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV043781690 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:34:57Z |
| institution | BVB |
| isbn | 9781633211865 163321186X 9781633211506 1633211509 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029192750 |
| oclc_num | 883242321 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 1 online resource |
| psigel | ZDB-4-EBA ZDB-4-ENC ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 2014 |
| publishDateSearch | 2014 |
| publishDateSort | 2014 |
| publisher | Nova Publishers |
| record_format | marc |
| series2 | Materials science and technologies series |
| spelling | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation) New York Nova Publishers [2014] 1 online resource txt rdacontent c rdamedia cr rdacarrier Materials science and technologies series Print version record TECHNOLOGY & ENGINEERING / Mechanical bisacsh Chemical vapor deposition fast Integrated circuits / Design and construction fast Thin film devices fast Thin film devices Integrated circuits Design and construction Chemical vapor deposition Vasilʹev, V. I͡U. Sonstige oth Erscheint auch als Druck-Ausgabe Thin film chemical vapor deposition in electronics |
| spellingShingle | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience TECHNOLOGY & ENGINEERING / Mechanical bisacsh Chemical vapor deposition fast Integrated circuits / Design and construction fast Thin film devices fast Thin film devices Integrated circuits Design and construction Chemical vapor deposition |
| title | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience |
| title_auth | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience |
| title_exact_search | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience |
| title_full | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation) |
| title_fullStr | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation) |
| title_full_unstemmed | Thin film chemical vapor deposition in electronics equipment, methodology, and thin film growth experience editor, Vladislav Yu Vasilyev (Novosibirsk State Technical University, Russian Federation) |
| title_short | Thin film chemical vapor deposition in electronics |
| title_sort | thin film chemical vapor deposition in electronics equipment methodology and thin film growth experience |
| title_sub | equipment, methodology, and thin film growth experience |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Chemical vapor deposition fast Integrated circuits / Design and construction fast Thin film devices fast Thin film devices Integrated circuits Design and construction Chemical vapor deposition |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Chemical vapor deposition Integrated circuits / Design and construction Thin film devices Thin film devices Integrated circuits Design and construction Chemical vapor deposition |
| work_keys_str_mv | AT vasilʹevviu thinfilmchemicalvapordepositioninelectronicsequipmentmethodologyandthinfilmgrowthexperience |