Ion Implantation and Activation - Volume 1:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Sharjah
Bentham Science Publishers
2013
|
| Schriftenreihe: | Ion Implantation and Activation
|
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 |
| Beschreibung: | Cover; Title; EUL; Contents; Foreword; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Chapter 09; Chapter 10; Chapter 11; Index Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling |
| Beschreibung: | 464 pages |
| ISBN: | 9781608057818 160805781X |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV043777395 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 160920s2013 |||| o||u| ||||||eng d | ||
| 020 | |a 9781608057818 |9 978-1-60805-781-8 | ||
| 020 | |a 160805781X |9 1-60805-781-X | ||
| 035 | |a (ZDB-4-EBA)ocn862612482 | ||
| 035 | |a (ZDB-4-ENC)ocn862612482 | ||
| 035 | |a (OCoLC)862612482 | ||
| 035 | |a (DE-599)BVBBV043777395 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 |a DE-1047 | ||
| 082 | 0 | |a 622.08 | |
| 100 | 1 | |a Suzuki, Kunihiro |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Ion Implantation and Activation - Volume 1 |
| 264 | 1 | |a Sharjah |b Bentham Science Publishers |c 2013 | |
| 300 | |a 464 pages | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Ion Implantation and Activation | |
| 500 | |a Cover; Title; EUL; Contents; Foreword; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Chapter 09; Chapter 10; Chapter 11; Index | ||
| 500 | |a Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Mining |2 bisacsh | |
| 650 | 4 | |a Ion implantation |x Computer simulation | |
| 650 | 4 | |a Semiconductors |x Deisign and construction |x Computer simulation | |
| 912 | |a ZDB-4-EBA |a ZDB-4-ENC | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029188455 | ||
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=657295 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=657295 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804176604939681792 |
|---|---|
| any_adam_object | |
| author | Suzuki, Kunihiro |
| author_facet | Suzuki, Kunihiro |
| author_role | aut |
| author_sort | Suzuki, Kunihiro |
| author_variant | k s ks |
| building | Verbundindex |
| bvnumber | BV043777395 |
| collection | ZDB-4-EBA ZDB-4-ENC |
| ctrlnum | (ZDB-4-EBA)ocn862612482 (ZDB-4-ENC)ocn862612482 (OCoLC)862612482 (DE-599)BVBBV043777395 |
| dewey-full | 622.08 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 622 - Mining and related operations |
| dewey-raw | 622.08 |
| dewey-search | 622.08 |
| dewey-sort | 3622.08 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Bergbau / Hüttenwesen |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02196nmm a2200409zc 4500</leader><controlfield tag="001">BV043777395</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">160920s2013 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781608057818</subfield><subfield code="9">978-1-60805-781-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">160805781X</subfield><subfield code="9">1-60805-781-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-EBA)ocn862612482</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-4-ENC)ocn862612482</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)862612482</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043777395</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">622.08</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Suzuki, Kunihiro</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Ion Implantation and Activation - Volume 1</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Sharjah</subfield><subfield code="b">Bentham Science Publishers</subfield><subfield code="c">2013</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">464 pages</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Ion Implantation and Activation</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Cover; Title; EUL; Contents; Foreword; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Chapter 09; Chapter 10; Chapter 11; Index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mining</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion implantation</subfield><subfield code="x">Computer simulation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Deisign and construction</subfield><subfield code="x">Computer simulation</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield><subfield code="a">ZDB-4-ENC</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029188455</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=657295</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=657295</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV043777395 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:34:50Z |
| institution | BVB |
| isbn | 9781608057818 160805781X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029188455 |
| oclc_num | 862612482 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 464 pages |
| psigel | ZDB-4-EBA ZDB-4-ENC ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 2013 |
| publishDateSearch | 2013 |
| publishDateSort | 2013 |
| publisher | Bentham Science Publishers |
| record_format | marc |
| series2 | Ion Implantation and Activation |
| spelling | Suzuki, Kunihiro Verfasser aut Ion Implantation and Activation - Volume 1 Sharjah Bentham Science Publishers 2013 464 pages txt rdacontent c rdamedia cr rdacarrier Ion Implantation and Activation Cover; Title; EUL; Contents; Foreword; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Chapter 09; Chapter 10; Chapter 11; Index Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling TECHNOLOGY & ENGINEERING / Mining bisacsh Ion implantation Computer simulation Semiconductors Deisign and construction Computer simulation |
| spellingShingle | Suzuki, Kunihiro Ion Implantation and Activation - Volume 1 TECHNOLOGY & ENGINEERING / Mining bisacsh Ion implantation Computer simulation Semiconductors Deisign and construction Computer simulation |
| title | Ion Implantation and Activation - Volume 1 |
| title_auth | Ion Implantation and Activation - Volume 1 |
| title_exact_search | Ion Implantation and Activation - Volume 1 |
| title_full | Ion Implantation and Activation - Volume 1 |
| title_fullStr | Ion Implantation and Activation - Volume 1 |
| title_full_unstemmed | Ion Implantation and Activation - Volume 1 |
| title_short | Ion Implantation and Activation - Volume 1 |
| title_sort | ion implantation and activation volume 1 |
| topic | TECHNOLOGY & ENGINEERING / Mining bisacsh Ion implantation Computer simulation Semiconductors Deisign and construction Computer simulation |
| topic_facet | TECHNOLOGY & ENGINEERING / Mining Ion implantation Computer simulation Semiconductors Deisign and construction Computer simulation |
| work_keys_str_mv | AT suzukikunihiro ionimplantationandactivationvolume1 |