Atomic layer deposition: principles, characteristics, and nanotechnology applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Salem, Massachusetts
Scrivener Publishing, LLC
[2013]
|
| Ausgabe: | 2nd Edition |
| Schlagworte: | |
| Online-Zugang: | FRO01 UBG01 Volltext |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource |
| ISBN: | 9781118747384 1118747380 9781118747421 1118747429 9781118747346 1118747348 9781118747407 1118747402 9781299619128 1299619126 |
Internformat
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| 100 | 1 | |a Kääriäinen, Tommi |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Atomic layer deposition |b principles, characteristics, and nanotechnology applications |c Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman |
| 250 | |a 2nd Edition | ||
| 264 | 1 | |a Salem, Massachusetts |b Scrivener Publishing, LLC |c [2013] | |
| 300 | |a 1 Online-Ressource | ||
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| 650 | 7 | |a SCIENCE / Nanoscience |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS |2 bisacsh | |
| 650 | 7 | |a Nanotechnologie |2 gnd | |
| 650 | 7 | |a Atomlagenabscheidung |2 gnd | |
| 650 | 7 | |a Chemical vapor deposition |2 fast | |
| 650 | 7 | |a Epitaxy |2 fast | |
| 650 | 7 | |a Microelectronics |2 fast | |
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| 650 | 4 | |a Epitaxy | |
| 650 | 4 | |a Microelectronics | |
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| 700 | 1 | |a Kääriäinen, Marja-Leena |e Sonstige |4 oth | |
| 700 | 1 | |a Sherman, Arthur |e Sonstige |4 oth | |
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Datensatz im Suchindex
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| author | Kääriäinen, Tommi |
| author_facet | Kääriäinen, Tommi |
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| author_sort | Kääriäinen, Tommi |
| author_variant | t k tk |
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| dewey-full | 620/.5 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620/.5 |
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| dewey-sort | 3620 15 |
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| edition | 2nd Edition |
| format | Electronic eBook |
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| id | DE-604.BV043395788 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:24:50Z |
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| language | English |
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| publisher | Scrivener Publishing, LLC |
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| spelling | Kääriäinen, Tommi Verfasser aut Atomic layer deposition principles, characteristics, and nanotechnology applications Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman 2nd Edition Salem, Massachusetts Scrivener Publishing, LLC [2013] 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index SCIENCE / Nanoscience bisacsh TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS bisacsh Nanotechnologie gnd Atomlagenabscheidung gnd Chemical vapor deposition fast Epitaxy fast Microelectronics fast Nanotechnology fast Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Cameron, David Sonstige oth Kääriäinen, Marja-Leena Sonstige oth Sherman, Arthur Sonstige oth Erscheint auch als Druck-Ausgabe, Hardcover 978-1-118-06277-7 Erscheint auch als Druck-Ausgabe, Hardcover 1-118-06277-9 https://onlinelibrary.wiley.com/doi/book/10.1002/9781118747407 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Kääriäinen, Tommi Atomic layer deposition principles, characteristics, and nanotechnology applications SCIENCE / Nanoscience bisacsh TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS bisacsh Nanotechnologie gnd Atomlagenabscheidung gnd Chemical vapor deposition fast Epitaxy fast Microelectronics fast Nanotechnology fast Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| title | Atomic layer deposition principles, characteristics, and nanotechnology applications |
| title_auth | Atomic layer deposition principles, characteristics, and nanotechnology applications |
| title_exact_search | Atomic layer deposition principles, characteristics, and nanotechnology applications |
| title_full | Atomic layer deposition principles, characteristics, and nanotechnology applications Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman |
| title_fullStr | Atomic layer deposition principles, characteristics, and nanotechnology applications Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman |
| title_full_unstemmed | Atomic layer deposition principles, characteristics, and nanotechnology applications Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman |
| title_short | Atomic layer deposition |
| title_sort | atomic layer deposition principles characteristics and nanotechnology applications |
| title_sub | principles, characteristics, and nanotechnology applications |
| topic | SCIENCE / Nanoscience bisacsh TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS bisacsh Nanotechnologie gnd Atomlagenabscheidung gnd Chemical vapor deposition fast Epitaxy fast Microelectronics fast Nanotechnology fast Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| topic_facet | SCIENCE / Nanoscience TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS Nanotechnologie Atomlagenabscheidung Chemical vapor deposition Epitaxy Microelectronics Nanotechnology |
| url | https://onlinelibrary.wiley.com/doi/book/10.1002/9781118747407 |
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