Nano-lithography:
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
London
Wiley
2013
|
Schriftenreihe: | ISTE
|
Schlagworte: | |
Online-Zugang: | DE-M347 DE-861 DE-473 Volltext |
Beschreibung: | 3.4.2. Comparison with competing advanced lithography techniques Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics Includes bibliographical references and index |
Beschreibung: | 1 Online-Ressource (353 pages) |
ISBN: | 9781118622582 1118622588 9781118621622 111862162X |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV043395624 | ||
003 | DE-604 | ||
005 | 20241106 | ||
007 | cr|uuu---uuuuu | ||
008 | 160222s2013 |||| o||u| ||||||eng d | ||
020 | |a 9781118622582 |c electronic bk. |9 978-1-118-62258-2 | ||
020 | |a 1118622588 |c electronic bk. |9 1-118-62258-8 | ||
020 | |a 9781118621622 |c electronic bk. |9 978-1-118-62162-2 | ||
020 | |a 111862162X |c electronic bk. |9 1-118-62162-X | ||
024 | 7 | |a 10.1002/9781118622582 |2 doi | |
035 | |a (ZDB-35-WIC)ocn830161625 | ||
035 | |a (OCoLC)830161625 | ||
035 | |a (DE-599)BVBBV043395624 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-861 |a DE-M347 | ||
082 | 0 | |a 621.381531 | |
245 | 1 | 0 | |a Nano-lithography |c edited by Stefan Landis |
264 | 1 | |a London |b Wiley |c 2013 | |
300 | |a 1 Online-Ressource (353 pages) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a ISTE | |
500 | |a 3.4.2. Comparison with competing advanced lithography techniques | ||
500 | |a Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics | ||
500 | |a Includes bibliographical references and index | ||
650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Circuits / General |2 bisacsh | |
650 | 7 | |a Nanolithography |2 fast | |
650 | 4 | |a Nanolithography | |
653 | |a Electronic books | ||
700 | 1 | |a Landis, Stefan |e Sonstige |4 oth | |
856 | 4 | 0 | |u https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
912 | |a ZDB-30-PQE |a ZDB-35-WIC | ||
940 | 1 | |q UBG_PDA_WIC | |
943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-028814208 | |
966 | e | |u https://ebookcentral.proquest.com/lib/hm-bib/detail.action?docID=1143631 |l DE-M347 |p ZDB-30-PQE |q FHM_Einzelkauf |x Aggregator |3 Volltext | |
966 | e | |u https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582 |l DE-861 |p ZDB-35-WIC |q FRO_PDA_WIC |x Verlag |3 Volltext | |
966 | e | |u https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582 |l DE-473 |p ZDB-35-WIC |q UBG_PDA_WIC |x Verlag |3 Volltext |
Datensatz im Suchindex
_version_ | 1814970740127039488 |
---|---|
adam_text | |
any_adam_object | |
building | Verbundindex |
bvnumber | BV043395624 |
collection | ZDB-30-PQE ZDB-35-WIC |
ctrlnum | (ZDB-35-WIC)ocn830161625 (OCoLC)830161625 (DE-599)BVBBV043395624 |
dewey-full | 621.381531 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.381531 |
dewey-search | 621.381531 |
dewey-sort | 3621.381531 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00000nmm a2200000zc 4500</leader><controlfield tag="001">BV043395624</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20241106</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">160222s2013 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781118622582</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-1-118-62258-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1118622588</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">1-118-62258-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781118621622</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-1-118-62162-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">111862162X</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">1-118-62162-X</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1002/9781118622582</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-35-WIC)ocn830161625</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)830161625</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043395624</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-861</subfield><subfield code="a">DE-M347</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381531</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Nano-lithography</subfield><subfield code="c">edited by Stefan Landis</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">London</subfield><subfield code="b">Wiley</subfield><subfield code="c">2013</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (353 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">ISTE</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">3.4.2. Comparison with competing advanced lithography techniques</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Circuits / General</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Nanolithography</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanolithography</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Electronic books</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Landis, Stefan</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-30-PQE</subfield><subfield code="a">ZDB-35-WIC</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">UBG_PDA_WIC</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028814208</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://ebookcentral.proquest.com/lib/hm-bib/detail.action?docID=1143631</subfield><subfield code="l">DE-M347</subfield><subfield code="p">ZDB-30-PQE</subfield><subfield code="q">FHM_Einzelkauf</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582</subfield><subfield code="l">DE-861</subfield><subfield code="p">ZDB-35-WIC</subfield><subfield code="q">FRO_PDA_WIC</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582</subfield><subfield code="l">DE-473</subfield><subfield code="p">ZDB-35-WIC</subfield><subfield code="q">UBG_PDA_WIC</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
id | DE-604.BV043395624 |
illustrated | Not Illustrated |
indexdate | 2024-11-06T11:02:59Z |
institution | BVB |
isbn | 9781118622582 1118622588 9781118621622 111862162X |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028814208 |
oclc_num | 830161625 |
open_access_boolean | |
owner | DE-861 DE-M347 |
owner_facet | DE-861 DE-M347 |
physical | 1 Online-Ressource (353 pages) |
psigel | ZDB-30-PQE ZDB-35-WIC UBG_PDA_WIC ZDB-30-PQE FHM_Einzelkauf ZDB-35-WIC FRO_PDA_WIC ZDB-35-WIC UBG_PDA_WIC |
publishDate | 2013 |
publishDateSearch | 2013 |
publishDateSort | 2013 |
publisher | Wiley |
record_format | marc |
series2 | ISTE |
spelling | Nano-lithography edited by Stefan Landis London Wiley 2013 1 Online-Ressource (353 pages) txt rdacontent c rdamedia cr rdacarrier ISTE 3.4.2. Comparison with competing advanced lithography techniques Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics Includes bibliographical references and index TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Nanolithography fast Nanolithography Electronic books Landis, Stefan Sonstige oth https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582 Verlag URL des Erstveröffentlichers Volltext |
spellingShingle | Nano-lithography TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Nanolithography fast Nanolithography |
title | Nano-lithography |
title_auth | Nano-lithography |
title_exact_search | Nano-lithography |
title_full | Nano-lithography edited by Stefan Landis |
title_fullStr | Nano-lithography edited by Stefan Landis |
title_full_unstemmed | Nano-lithography edited by Stefan Landis |
title_short | Nano-lithography |
title_sort | nano lithography |
topic | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Nanolithography fast Nanolithography |
topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General Nanolithography |
url | https://onlinelibrary.wiley.com/doi/book/10.1002/9781118622582 |
work_keys_str_mv | AT landisstefan nanolithography |