Holdings: Design for manufacturability with advanced lithography

Design for manufacturability with advanced lithography:

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Bibliographic Details
Main Author:	Yu, Bei (Author)
Format:	Electronic eBook
Language:	English
Published:	Cham Springer International Publishing [2016]
Subjects:	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
Online Access:	BTU01 FAB01 FAW01 FHA01 FHI01 FHN01 FHR01 FKE01 FRO01 FWS01 FWS02 UBY01 Volltext Inhaltsverzeichnis Abstract
Physical Description:	1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)
ISBN:	9783319203850
DOI:	10.1007/978-3-319-20385-0

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LEADER	00000nmm a2200000zc 4500
001	BV043210999
003	DE-604
005	20160815
007	cr\|uuu---uuuuu
008	151215s2016 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d
020			\|a 9783319203850 \|c Online \|9 978-3-319-20385-0
024	7		\|a 10.1007/978-3-319-20385-0 \|2 doi
035			\|a (OCoLC)930012373
035			\|a (DE-599)BVBBV043210999
040			\|a DE-604 \|b ger \|e rda
041	0		\|a eng
049			\|a DE-1043 \|a DE-Aug4 \|a DE-573 \|a DE-859 \|a DE-863 \|a DE-92 \|a DE-862 \|a DE-898 \|a DE-634 \|a DE-1046 \|a DE-861 \|a DE-706
082	0		\|a 621.3815 \|2 23
100	1		\|a Yu, Bei \|e Verfasser \|4 aut
245	1	0	\|a Design for manufacturability with advanced lithography \|c Bei Yu, David Z. Pan
264		1	\|a Cham \|b Springer International Publishing \|c [2016]
264		4	\|c © 2016
300			\|a 1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)
336			\|b txt \|2 rdacontent
337			\|b c \|2 rdamedia
338			\|b cr \|2 rdacarrier
650		4	\|a Engineering
650		4	\|a Microprocessors
650		4	\|a Electronics
650		4	\|a Microelectronics
650		4	\|a Electronic circuits
650		4	\|a Circuits and Systems
650		4	\|a Processor Architectures
650		4	\|a Electronics and Microelectronics, Instrumentation
650		4	\|a Ingenieurwissenschaften
700	1		\|a Pan, David Z. \|e Sonstige \|4 oth
776	0	8	\|i Erscheint auch als \|n Druckausgabe \|z 978-3-319-20384-3
856	4	0	\|u https://doi.org/10.1007/978-3-319-20385-0 \|x Verlag \|z URL des Erstveröffentlichers \|3 Volltext
856	4	2	\|m Springer Fremddatenuebernahme \|q application/pdf \|u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA \|3 Inhaltsverzeichnis
856	4	2	\|m Springer Fremddatenuebernahme \|q application/pdf \|u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA \|3 Abstract
912			\|a ZDB-2-ENG
940	1		\|q ZDB-2-ENG_2016
999			\|a oai:aleph.bib-bvb.de:BVB01-028634141
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l BTU01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FAB01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FAW01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FHA01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FHI01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FHN01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FHR01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FKE01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FRO01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FWS01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l FWS02 \|p ZDB-2-ENG \|x Verlag \|3 Volltext
966	e		\|u https://doi.org/10.1007/978-3-319-20385-0 \|l UBY01 \|p ZDB-2-ENG \|x Verlag \|3 Volltext

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DE-BY-FWS_katkey	590122
_version_	1824554489550471168
adam_text	DESIGN FOR MANUFACTURABILITY WITH ADVANCED LITHOGRAPHY / YU, BEI : 2016 TABLE OF CONTENTS / INHALTSVERZEICHNIS INTRODUCTION LAYOUT DECOMPOSITION FOR TRIPLE PATTERNING LAYOUT DECOMPOSITION FOR OTHER PATTERNING TECHNIQUES STANDARD CELL COMPLIANCE AND PLACEMENT CO-OPTIMIZATION DESIGN FOR MANUFACTURABILITY WITH E-BEAM LITHOGRAPHY CONCLUSIONS AND FUTURE WORKS.- DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT. DESIGN FOR MANUFACTURABILITY WITH ADVANCED LITHOGRAPHY / YU, BEI : 2016 ABSTRACT / INHALTSTEXT THIS BOOK INTRODUCES READERS TO THE MOST ADVANCED RESEARCH RESULTS ON DESIGN FOR MANUFACTURABILITY (DFM) WITH MULTIPLE PATTERNING LITHOGRAPHY (MPL) AND ELECTRON BEAM LITHOGRAPHY (EBL). THE AUTHORS DESCRIBE IN DETAIL A SET OF ALGORITHMS/METHODOLOGIES TO RESOLVE ISSUES IN MODERN DESIGN FOR MANUFACTURABILITY PROBLEMS WITH ADVANCED LITHOGRAPHY. UNLIKE BOOKS THAT DISCUSS DFM FROM THE PRODUCT LEVEL, OR PHYSICAL MANUFACTURING LEVEL, THIS BOOK DESCRIBES DFM SOLUTIONS FROM A CIRCUIT DESIGN LEVEL, SUCH THAT MOST OF THE CRITICAL PROBLEMS CAN BE FORMULATED AND SOLVED THROUGH COMBINATORIAL ALGORITHMS. ENABLES READERS TO TACKLE THE CHALLENGE OF LAYOUT DECOMPOSITIONS FOR DIFFERENT PATTERNING TECHNIQUES; PRESENTS A COHERENT FRAMEWORK, INCLUDING STANDARD CELL COMPLIANCE AND DETAILED PLACEMENT, TO ENABLE TRIPLE PATTERNING LITHOGRAPHY (TPL) FRIENDLY DESIGN; INCLUDES COVERAGE OF THE DESIGN FOR MANUFACTURABILITY WITH E-BEAM LITHOGRAPHY DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
any_adam_object	1
author	Yu, Bei
author_facet	Yu, Bei
author_role	aut
author_sort	Yu, Bei
author_variant	b y by
building	Verbundindex
bvnumber	BV043210999
collection	ZDB-2-ENG
ctrlnum	(OCoLC)930012373 (DE-599)BVBBV043210999
dewey-full	621.3815
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.3815
dewey-search	621.3815
dewey-sort	3621.3815
dewey-tens	620 - Engineering and allied operations
discipline	Elektrotechnik / Elektronik / Nachrichtentechnik
doi_str_mv	10.1007/978-3-319-20385-0
format	Electronic eBook
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03241nmm a2200625zc 4500</leader><controlfield tag="001">BV043210999</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20160815 </controlfield><controlfield tag="007">cr\|uuu---uuuuu</controlfield><controlfield tag="008">151215s2016 \|\|\|\| o\|\|u\| \|\|\|\|\|\|eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783319203850</subfield><subfield code="c">Online</subfield><subfield code="9">978-3-319-20385-0</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-3-319-20385-0</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)930012373</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043210999</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1043</subfield><subfield code="a">DE-Aug4</subfield><subfield code="a">DE-573</subfield><subfield code="a">DE-859</subfield><subfield code="a">DE-863</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-862</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-1046</subfield><subfield code="a">DE-861</subfield><subfield code="a">DE-706</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815</subfield><subfield code="2">23</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Yu, Bei</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Design for manufacturability with advanced lithography</subfield><subfield code="c">Bei Yu, David Z. Pan</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Cham</subfield><subfield code="b">Springer International Publishing</subfield><subfield code="c">[2016]</subfield></datafield><datafield tag="264" ind1=" " ind2="4"><subfield code="c">© 2016</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microprocessors</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronic circuits</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Circuits and Systems</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Processor Architectures</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics and Microelectronics, Instrumentation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ingenieurwissenschaften</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Pan, David Z.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druckausgabe</subfield><subfield code="z">978-3-319-20384-3</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Springer Fremddatenuebernahme</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Springer Fremddatenuebernahme</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Abstract</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-ENG</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-ENG_2016</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028634141</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">BTU01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FAB01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FHA01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FHI01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FHN01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FHR01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FKE01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FRO01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FWS01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">FWS02</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-319-20385-0</subfield><subfield code="l">UBY01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection>
id	DE-604.BV043210999
illustrated	Not Illustrated
indexdate	2025-02-20T06:52:35Z
institution	BVB
isbn	9783319203850
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-028634141
oclc_num	930012373
open_access_boolean
owner	DE-1043 DE-Aug4 DE-573 DE-859 DE-863 DE-BY-FWS DE-92 DE-862 DE-BY-FWS DE-898 DE-BY-UBR DE-634 DE-1046 DE-861 DE-706
owner_facet	DE-1043 DE-Aug4 DE-573 DE-859 DE-863 DE-BY-FWS DE-92 DE-862 DE-BY-FWS DE-898 DE-BY-UBR DE-634 DE-1046 DE-861 DE-706
physical	1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)
psigel	ZDB-2-ENG ZDB-2-ENG_2016
publishDate	2016
publishDateSearch	2016
publishDateSort	2016
publisher	Springer International Publishing
record_format	marc
spellingShingle	Yu, Bei Design for manufacturability with advanced lithography Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
title	Design for manufacturability with advanced lithography
title_auth	Design for manufacturability with advanced lithography
title_exact_search	Design for manufacturability with advanced lithography
title_full	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_fullStr	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_full_unstemmed	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_short	Design for manufacturability with advanced lithography
title_sort	design for manufacturability with advanced lithography
topic	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
topic_facet	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
url	https://doi.org/10.1007/978-3-319-20385-0 http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA
work_keys_str_mv	AT yubei designformanufacturabilitywithadvancedlithography AT pandavidz designformanufacturabilitywithadvancedlithography

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