Verfügbarkeit: Design for manufacturability with advanced lithography

Design for manufacturability with advanced lithography:

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Bibliographische Detailangaben
1. Verfasser:	Yu, Bei (VerfasserIn)
Format:	Elektronisch E-Book
Sprache:	English
Veröffentlicht:	Cham Springer International Publishing [2016]
Schlagworte:	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
Online-Zugang:	BTU01 FAB01 FAW01 FHA01 FHI01 FHN01 FHR01 FKE01 FRO01 FWS01 FWS02 UBY01 Volltext Inhaltsverzeichnis Abstract
Beschreibung:	1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)
ISBN:	9783319203850
DOI:	10.1007/978-3-319-20385-0

Internformat

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Datensatz im Suchindex

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adam_text	DESIGN FOR MANUFACTURABILITY WITH ADVANCED LITHOGRAPHY / YU, BEI : 2016 TABLE OF CONTENTS / INHALTSVERZEICHNIS INTRODUCTION LAYOUT DECOMPOSITION FOR TRIPLE PATTERNING LAYOUT DECOMPOSITION FOR OTHER PATTERNING TECHNIQUES STANDARD CELL COMPLIANCE AND PLACEMENT CO-OPTIMIZATION DESIGN FOR MANUFACTURABILITY WITH E-BEAM LITHOGRAPHY CONCLUSIONS AND FUTURE WORKS.- DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT. DESIGN FOR MANUFACTURABILITY WITH ADVANCED LITHOGRAPHY / YU, BEI : 2016 ABSTRACT / INHALTSTEXT THIS BOOK INTRODUCES READERS TO THE MOST ADVANCED RESEARCH RESULTS ON DESIGN FOR MANUFACTURABILITY (DFM) WITH MULTIPLE PATTERNING LITHOGRAPHY (MPL) AND ELECTRON BEAM LITHOGRAPHY (EBL). THE AUTHORS DESCRIBE IN DETAIL A SET OF ALGORITHMS/METHODOLOGIES TO RESOLVE ISSUES IN MODERN DESIGN FOR MANUFACTURABILITY PROBLEMS WITH ADVANCED LITHOGRAPHY. UNLIKE BOOKS THAT DISCUSS DFM FROM THE PRODUCT LEVEL, OR PHYSICAL MANUFACTURING LEVEL, THIS BOOK DESCRIBES DFM SOLUTIONS FROM A CIRCUIT DESIGN LEVEL, SUCH THAT MOST OF THE CRITICAL PROBLEMS CAN BE FORMULATED AND SOLVED THROUGH COMBINATORIAL ALGORITHMS. ENABLES READERS TO TACKLE THE CHALLENGE OF LAYOUT DECOMPOSITIONS FOR DIFFERENT PATTERNING TECHNIQUES; PRESENTS A COHERENT FRAMEWORK, INCLUDING STANDARD CELL COMPLIANCE AND DETAILED PLACEMENT, TO ENABLE TRIPLE PATTERNING LITHOGRAPHY (TPL) FRIENDLY DESIGN; INCLUDES COVERAGE OF THE DESIGN FOR MANUFACTURABILITY WITH E-BEAM LITHOGRAPHY DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
any_adam_object	1
author	Yu, Bei
author_facet	Yu, Bei
author_role	aut
author_sort	Yu, Bei
author_variant	b y by
building	Verbundindex
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collection	ZDB-2-ENG
ctrlnum	(OCoLC)930012373 (DE-599)BVBBV043210999
dewey-full	621.3815
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.3815
dewey-search	621.3815
dewey-sort	3621.3815
dewey-tens	620 - Engineering and allied operations
discipline	Elektrotechnik / Elektronik / Nachrichtentechnik
doi_str_mv	10.1007/978-3-319-20385-0
format	Electronic eBook
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illustrated	Not Illustrated
indexdate	2024-08-01T12:11:55Z
institution	BVB
isbn	9783319203850
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-028634141
oclc_num	930012373
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physical	1 Online Ressource (XI, 164 p. 100 illus., 91 illus. in color)
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publishDate	2016
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publisher	Springer International Publishing
record_format	marc
spellingShingle	Yu, Bei Design for manufacturability with advanced lithography Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
title	Design for manufacturability with advanced lithography
title_auth	Design for manufacturability with advanced lithography
title_exact_search	Design for manufacturability with advanced lithography
title_full	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_fullStr	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_full_unstemmed	Design for manufacturability with advanced lithography Bei Yu, David Z. Pan
title_short	Design for manufacturability with advanced lithography
title_sort	design for manufacturability with advanced lithography
topic	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
topic_facet	Engineering Microprocessors Electronics Microelectronics Electronic circuits Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation Ingenieurwissenschaften
url	https://doi.org/10.1007/978-3-319-20385-0 http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028634141&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA
work_keys_str_mv	AT yubei designformanufacturabilitywithadvancedlithography AT pandavidz designformanufacturabilitywithadvancedlithography

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