Plasma deposition of amorphous silicon-based materials:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boston
Academic Press
c1995
|
| Schriftenreihe: | Plasma--materials interactions
|
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 Volltext |
| Beschreibung: | Includes bibliographical references and index Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced |
| Beschreibung: | 1 Online-Ressource (xi, 324 p.) |
| ISBN: | 0080539106 012137940X 1281054100 9780080539102 9780121379407 9781281054104 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV043151201 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 151126s1995 |||| o||u| ||||||eng d | ||
| 020 | |a 0080539106 |c electronic bk. |9 0-08-053910-6 | ||
| 020 | |a 012137940X |9 0-12-137940-X | ||
| 020 | |a 1281054100 |9 1-281-05410-0 | ||
| 020 | |a 9780080539102 |c electronic bk. |9 978-0-08-053910-2 | ||
| 020 | |a 9780121379407 |9 978-0-12-137940-7 | ||
| 020 | |a 9781281054104 |9 978-1-281-05410-4 | ||
| 035 | |a (OCoLC)175286921 | ||
| 035 | |a (DE-599)BVBBV043151201 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 |a DE-1047 | ||
| 082 | 0 | |a 621.3815/2 |2 22 | |
| 245 | 1 | 0 | |a Plasma deposition of amorphous silicon-based materials |c edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| 264 | 1 | |a Boston |b Academic Press |c c1995 | |
| 300 | |a 1 Online-Ressource (xi, 324 p.) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Plasma--materials interactions | |
| 500 | |a Includes bibliographical references and index | ||
| 500 | |a Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices | ||
| 500 | |a Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
| 650 | 7 | |a Amorphous semiconductors / Design and construction |2 fast | |
| 650 | 7 | |a Plasma-enhanced chemical vapor deposition |2 fast | |
| 650 | 7 | |a Silicon alloys |2 fast | |
| 650 | 4 | |a Amorphous semiconductors |x Design and construction | |
| 650 | 4 | |a Silicon alloys | |
| 650 | 4 | |a Plasma-enhanced chemical vapor deposition | |
| 650 | 0 | 7 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |2 gnd |9 rswk-swf |
| 655 | 7 | |8 1\p |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |D s |
| 689 | 0 | 1 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |D s |
| 689 | 0 | 2 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 0 | |8 2\p |5 DE-604 | |
| 700 | 1 | |a Bruno, Giovanni |e Sonstige |4 oth | |
| 700 | 1 | |a Capezzuto, Pio |e Sonstige |4 oth | |
| 700 | 1 | |a Madan, A. |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143 |x Aggregator |3 Volltext |
| 912 | |a ZDB-4-EBA | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-028575392 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804175611072086016 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV043151201 |
| collection | ZDB-4-EBA |
| ctrlnum | (OCoLC)175286921 (DE-599)BVBBV043151201 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>04079nmm a2200661zc 4500</leader><controlfield tag="001">BV043151201</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">151126s1995 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0080539106</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">0-08-053910-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">012137940X</subfield><subfield code="9">0-12-137940-X</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1281054100</subfield><subfield code="9">1-281-05410-0</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780080539102</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-0-08-053910-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780121379407</subfield><subfield code="9">978-0-12-137940-7</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781281054104</subfield><subfield code="9">978-1-281-05410-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)175286921</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043151201</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma deposition of amorphous silicon-based materials</subfield><subfield code="c">edited by Giovanni Bruno, Pio Capezzuto, Arun Madan</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston</subfield><subfield code="b">Academic Press</subfield><subfield code="c">c1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xi, 324 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Plasma--materials interactions</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Solid State</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Amorphous semiconductors / Design and construction</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma-enhanced chemical vapor deposition</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Silicon alloys</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Amorphous semiconductors</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Silicon alloys</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma-enhanced chemical vapor deposition</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Amorpher Halbleiter</subfield><subfield code="0">(DE-588)4001756-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Siliciumverbindungen</subfield><subfield code="0">(DE-588)4124194-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)4143413-4</subfield><subfield code="a">Aufsatzsammlung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Amorpher Halbleiter</subfield><subfield code="0">(DE-588)4001756-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Siliciumverbindungen</subfield><subfield code="0">(DE-588)4124194-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">PECVD-Verfahren</subfield><subfield code="0">(DE-588)4267316-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bruno, Giovanni</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Capezzuto, Pio</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Madan, A.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028575392</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| genre | 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV043151201 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:19:02Z |
| institution | BVB |
| isbn | 0080539106 012137940X 1281054100 9780080539102 9780121379407 9781281054104 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028575392 |
| oclc_num | 175286921 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 1 Online-Ressource (xi, 324 p.) |
| psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | Academic Press |
| record_format | marc |
| series2 | Plasma--materials interactions |
| spelling | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan Boston Academic Press c1995 1 Online-Ressource (xi, 324 p.) txt rdacontent c rdamedia cr rdacarrier Plasma--materials interactions Includes bibliographical references and index Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Siliciumverbindungen (DE-588)4124194-0 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Amorpher Halbleiter (DE-588)4001756-4 s Siliciumverbindungen (DE-588)4124194-0 s PECVD-Verfahren (DE-588)4267316-1 s 2\p DE-604 Bruno, Giovanni Sonstige oth Capezzuto, Pio Sonstige oth Madan, A. Sonstige oth http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143 Aggregator Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Plasma deposition of amorphous silicon-based materials TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Siliciumverbindungen (DE-588)4124194-0 gnd |
| subject_GND | (DE-588)4001756-4 (DE-588)4267316-1 (DE-588)4124194-0 (DE-588)4143413-4 |
| title | Plasma deposition of amorphous silicon-based materials |
| title_auth | Plasma deposition of amorphous silicon-based materials |
| title_exact_search | Plasma deposition of amorphous silicon-based materials |
| title_full | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_fullStr | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_full_unstemmed | Plasma deposition of amorphous silicon-based materials edited by Giovanni Bruno, Pio Capezzuto, Arun Madan |
| title_short | Plasma deposition of amorphous silicon-based materials |
| title_sort | plasma deposition of amorphous silicon based materials |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Amorphous semiconductors / Design and construction fast Plasma-enhanced chemical vapor deposition fast Silicon alloys fast Amorphous semiconductors Design and construction Silicon alloys Plasma-enhanced chemical vapor deposition Amorpher Halbleiter (DE-588)4001756-4 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Siliciumverbindungen (DE-588)4124194-0 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Amorphous semiconductors / Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Amorphous semiconductors Design and construction Amorpher Halbleiter PECVD-Verfahren Siliciumverbindungen Aufsatzsammlung |
| url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=207143 |
| work_keys_str_mv | AT brunogiovanni plasmadepositionofamorphoussiliconbasedmaterials AT capezzutopio plasmadepositionofamorphoussiliconbasedmaterials AT madana plasmadepositionofamorphoussiliconbasedmaterials |