Plasma processing and processing science:
Saved in:
| Format: | Electronic eBook |
|---|---|
| Language: | English |
| Published: |
Washington, D.C.
National Academy Press
1995
|
| Series: | NRL strategic series
|
| Subjects: | |
| Online Access: | FAW01 FAW02 Volltext |
| Item Description: | Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 |
| Physical Description: | 1 Online-Ressource (x, 35 pages) |
| ISBN: | 0309575168 9780309575164 |
Staff View
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV043147321 | ||
| 003 | DE-604 | ||
| 005 | 20180516 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 151126s1995 |||| o||u| ||||||eng d | ||
| 020 | |a 0309575168 |9 0-309-57516-8 | ||
| 020 | |a 9780309575164 |9 978-0-309-57516-4 | ||
| 035 | |a (OCoLC)58567010 | ||
| 035 | |a (DE-599)BVBBV043147321 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 |a DE-1047 | ||
| 082 | 0 | |a 621.044 |2 22 | |
| 245 | 1 | 0 | |a Plasma processing and processing science |c Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| 264 | 1 | |a Washington, D.C. |b National Academy Press |c 1995 | |
| 300 | |a 1 Online-Ressource (x, 35 pages) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a NRL strategic series | |
| 500 | |a Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Mechanical |2 bisacsh | |
| 650 | 7 | |a Plasma engineering |2 fast | |
| 650 | 7 | |a Plasma etching |2 fast | |
| 650 | 7 | |a Semiconductors / Etching |2 fast | |
| 650 | 4 | |a Plasma engineering | |
| 650 | 4 | |a Semiconductors |x Etching | |
| 650 | 4 | |a Plasma etching | |
| 700 | 1 | |a Chen, Francis F. |d 1929- |e Sonstige |0 (DE-588)17201932X |4 oth | |
| 710 | 2 | |a National Research Council (U.S.) |b Panel on Plasma Processing |e Sonstige |4 oth | |
| 710 | 2 | |a National Research Council (U.S.) |b Naval Studies Board |e Sonstige |4 oth | |
| 710 | 2 | |a National Research Council (U.S.) |b Commission on Physical Sciences, Mathematics, and Applications |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670 |x Aggregator |3 Volltext |
| 912 | |a ZDB-4-EBA | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-028571512 | ||
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
Record in the Search Index
| _version_ | 1804175602860687360 |
|---|---|
| any_adam_object | |
| author_GND | (DE-588)17201932X |
| building | Verbundindex |
| bvnumber | BV043147321 |
| collection | ZDB-4-EBA |
| ctrlnum | (OCoLC)58567010 (DE-599)BVBBV043147321 |
| dewey-full | 621.044 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.044 |
| dewey-search | 621.044 |
| dewey-sort | 3621.044 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02292nmm a2200469zc 4500</leader><controlfield tag="001">BV043147321</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180516 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">151126s1995 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0309575168</subfield><subfield code="9">0-309-57516-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780309575164</subfield><subfield code="9">978-0-309-57516-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)58567010</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043147321</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.044</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma processing and processing science</subfield><subfield code="c">Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, D.C.</subfield><subfield code="b">National Academy Press</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (x, 35 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">NRL strategic series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mechanical</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma engineering</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconductors / Etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chen, Francis F.</subfield><subfield code="d">1929-</subfield><subfield code="e">Sonstige</subfield><subfield code="0">(DE-588)17201932X</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)</subfield><subfield code="b">Panel on Plasma Processing</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)</subfield><subfield code="b">Naval Studies Board</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.)</subfield><subfield code="b">Commission on Physical Sciences, Mathematics, and Applications</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028571512</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV043147321 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:18:54Z |
| institution | BVB |
| isbn | 0309575168 9780309575164 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028571512 |
| oclc_num | 58567010 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 1 Online-Ressource (x, 35 pages) |
| psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | National Academy Press |
| record_format | marc |
| series2 | NRL strategic series |
| spelling | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council Washington, D.C. National Academy Press 1995 1 Online-Ressource (x, 35 pages) txt rdacontent c rdamedia cr rdacarrier NRL strategic series Committee chair: Francis F. Chen. - This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124 TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma engineering fast Plasma etching fast Semiconductors / Etching fast Plasma engineering Semiconductors Etching Plasma etching Chen, Francis F. 1929- Sonstige (DE-588)17201932X oth National Research Council (U.S.) Panel on Plasma Processing Sonstige oth National Research Council (U.S.) Naval Studies Board Sonstige oth National Research Council (U.S.) Commission on Physical Sciences, Mathematics, and Applications Sonstige oth http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670 Aggregator Volltext |
| spellingShingle | Plasma processing and processing science TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma engineering fast Plasma etching fast Semiconductors / Etching fast Plasma engineering Semiconductors Etching Plasma etching |
| title | Plasma processing and processing science |
| title_auth | Plasma processing and processing science |
| title_exact_search | Plasma processing and processing science |
| title_full | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| title_fullStr | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| title_full_unstemmed | Plasma processing and processing science Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| title_short | Plasma processing and processing science |
| title_sort | plasma processing and processing science |
| topic | TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma engineering fast Plasma etching fast Semiconductors / Etching fast Plasma engineering Semiconductors Etching Plasma etching |
| topic_facet | TECHNOLOGY & ENGINEERING / Mechanical Plasma engineering Plasma etching Semiconductors / Etching Semiconductors Etching |
| url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=123670 |
| work_keys_str_mv | AT chenfrancisf plasmaprocessingandprocessingscience AT nationalresearchcounciluspanelonplasmaprocessing plasmaprocessingandprocessingscience AT nationalresearchcouncilusnavalstudiesboard plasmaprocessingandprocessingscience AT nationalresearchcounciluscommissiononphysicalsciencesmathematicsandapplications plasmaprocessingandprocessingscience |