Polymer thin films:
Gespeichert in:
Format: | Elektronisch E-Book |
---|---|
Sprache: | English |
Veröffentlicht: |
Singapore
World Scientific
©2008
|
Schriftenreihe: | Series in soft condensed matter
v. 1 |
Schlagworte: | |
Online-Zugang: | FAW01 FAW02 Volltext |
Beschreibung: | Includes bibliographical references and index Block copolymer thin films / J.-Y. Wang, S. Park and T.P. Russell -- Equilibration of block copolymer films on chemically patterned surfaces / G.S.W. Craig, H. Kang and P.F. Nealey -- Structure formation and evolution in confined cylinder-forming block copolymers / G.J.A. Sevink and J.G.E.M. Fraaije -- Block copolymer lithography for magnetic device fabrication / J.Y. Cheng and C.A. Ross -- Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura [and others] -- Wrinkling polymers for surface structure control and functionality / E.P. Chan and A.J. Crosby -- Crystallization in polymer thin films: morphology and growth / R.M. Van Horn and S.Z.D. Cheng -- Friction at soft polymer surface / M.K. Chaudhury, K. Vorvolakos and D. Malotky -- Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K.R. Shull -- Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- Anomalous dynamics of polymer films / O.K.C. Tsui Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference |
Beschreibung: | 1 Online-Ressource (x, 301 pages) |
ISBN: | 9789812818829 9812818820 |
Internformat
MARC
LEADER | 00000nmm a2200000zcb4500 | ||
---|---|---|---|
001 | BV043142646 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 151126s2008 |||| o||u| ||||||eng d | ||
020 | |a 9789812818829 |c electronic bk. |9 978-981-281-882-9 | ||
020 | |a 9812818820 |c electronic bk. |9 981-281-882-0 | ||
035 | |a (OCoLC)608624678 | ||
035 | |a (DE-599)BVBBV043142646 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-1046 |a DE-1047 | ||
082 | 0 | |a 621.3815/2 |2 22 | |
084 | |a UV 7000 |0 (DE-625)146913: |2 rvk | ||
245 | 1 | 0 | |a Polymer thin films |c editors, Ophelia K.C. Tsui, Thomas P. Russell |
264 | 1 | |a Singapore |b World Scientific |c ©2008 | |
300 | |a 1 Online-Ressource (x, 301 pages) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a Series in soft condensed matter |v v. 1 | |
500 | |a Includes bibliographical references and index | ||
500 | |a Block copolymer thin films / J.-Y. Wang, S. Park and T.P. Russell -- Equilibration of block copolymer films on chemically patterned surfaces / G.S.W. Craig, H. Kang and P.F. Nealey -- Structure formation and evolution in confined cylinder-forming block copolymers / G.J.A. Sevink and J.G.E.M. Fraaije -- Block copolymer lithography for magnetic device fabrication / J.Y. Cheng and C.A. Ross -- Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura [and others] -- Wrinkling polymers for surface structure control and functionality / E.P. Chan and A.J. Crosby -- Crystallization in polymer thin films: morphology and growth / R.M. Van Horn and S.Z.D. Cheng -- Friction at soft polymer surface / M.K. Chaudhury, K. Vorvolakos and D. Malotky -- Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K.R. Shull -- Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- Anomalous dynamics of polymer films / O.K.C. Tsui | ||
500 | |a Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference | ||
650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
650 | 7 | |a Block copolymers |2 fast | |
650 | 7 | |a Nanostructured materials |2 fast | |
650 | 7 | |a Polymers |2 fast | |
650 | 7 | |a Thin films |2 fast | |
650 | 4 | |a Thin films | |
650 | 4 | |a Polymers | |
650 | 4 | |a Block copolymers | |
650 | 4 | |a Nanostructured materials | |
650 | 0 | 7 | |a Kolloidchemie |0 (DE-588)4134420-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Makromolekulare Chemie |0 (DE-588)4168684-6 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Kolloidchemie |0 (DE-588)4134420-0 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
689 | 1 | 0 | |a Makromolekulare Chemie |0 (DE-588)4168684-6 |D s |
689 | 1 | |8 2\p |5 DE-604 | |
700 | 1 | |a Tsui, Ophelia Kwan Chui |e Sonstige |4 oth | |
700 | 1 | |a Russell, Thomas P. |e Sonstige |4 oth | |
776 | 0 | 8 | |i Erscheint auch als |n Druckausgabe |z 978-981-281-881-2 |
776 | 0 | 8 | |i Erscheint auch als |n Druckausgabe |z 981-281-881-2 |
856 | 4 | 0 | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191 |x Aggregator |3 Volltext |
912 | |a ZDB-4-EBA | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-028566837 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext |
Datensatz im Suchindex
_version_ | 1804175593588129792 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV043142646 |
classification_rvk | UV 7000 |
collection | ZDB-4-EBA |
ctrlnum | (OCoLC)608624678 (DE-599)BVBBV043142646 |
dewey-full | 621.3815/2 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/2 |
dewey-search | 621.3815/2 |
dewey-sort | 3621.3815 12 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>04392nmm a2200637zcb4500</leader><controlfield tag="001">BV043142646</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">151126s2008 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9789812818829</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-981-281-882-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9812818820</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">981-281-882-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)608624678</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043142646</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">22</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UV 7000</subfield><subfield code="0">(DE-625)146913:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Polymer thin films</subfield><subfield code="c">editors, Ophelia K.C. Tsui, Thomas P. Russell</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Singapore</subfield><subfield code="b">World Scientific</subfield><subfield code="c">©2008</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (x, 301 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Series in soft condensed matter</subfield><subfield code="v">v. 1</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Block copolymer thin films / J.-Y. Wang, S. Park and T.P. Russell -- Equilibration of block copolymer films on chemically patterned surfaces / G.S.W. Craig, H. Kang and P.F. Nealey -- Structure formation and evolution in confined cylinder-forming block copolymers / G.J.A. Sevink and J.G.E.M. Fraaije -- Block copolymer lithography for magnetic device fabrication / J.Y. Cheng and C.A. Ross -- Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura [and others] -- Wrinkling polymers for surface structure control and functionality / E.P. Chan and A.J. Crosby -- Crystallization in polymer thin films: morphology and growth / R.M. Van Horn and S.Z.D. Cheng -- Friction at soft polymer surface / M.K. Chaudhury, K. Vorvolakos and D. Malotky -- Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K.R. Shull -- Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- Anomalous dynamics of polymer films / O.K.C. Tsui</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Solid State</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Block copolymers</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Nanostructured materials</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Polymers</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin films</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymers</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Block copolymers</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanostructured materials</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Kolloidchemie</subfield><subfield code="0">(DE-588)4134420-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Makromolekulare Chemie</subfield><subfield code="0">(DE-588)4168684-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Kolloidchemie</subfield><subfield code="0">(DE-588)4134420-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Makromolekulare Chemie</subfield><subfield code="0">(DE-588)4168684-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Tsui, Ophelia Kwan Chui</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Russell, Thomas P.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druckausgabe</subfield><subfield code="z">978-981-281-881-2</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druckausgabe</subfield><subfield code="z">981-281-881-2</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028566837</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
id | DE-604.BV043142646 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T07:18:45Z |
institution | BVB |
isbn | 9789812818829 9812818820 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028566837 |
oclc_num | 608624678 |
open_access_boolean | |
owner | DE-1046 DE-1047 |
owner_facet | DE-1046 DE-1047 |
physical | 1 Online-Ressource (x, 301 pages) |
psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
publishDate | 2008 |
publishDateSearch | 2008 |
publishDateSort | 2008 |
publisher | World Scientific |
record_format | marc |
series2 | Series in soft condensed matter |
spelling | Polymer thin films editors, Ophelia K.C. Tsui, Thomas P. Russell Singapore World Scientific ©2008 1 Online-Ressource (x, 301 pages) txt rdacontent c rdamedia cr rdacarrier Series in soft condensed matter v. 1 Includes bibliographical references and index Block copolymer thin films / J.-Y. Wang, S. Park and T.P. Russell -- Equilibration of block copolymer films on chemically patterned surfaces / G.S.W. Craig, H. Kang and P.F. Nealey -- Structure formation and evolution in confined cylinder-forming block copolymers / G.J.A. Sevink and J.G.E.M. Fraaije -- Block copolymer lithography for magnetic device fabrication / J.Y. Cheng and C.A. Ross -- Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura [and others] -- Wrinkling polymers for surface structure control and functionality / E.P. Chan and A.J. Crosby -- Crystallization in polymer thin films: morphology and growth / R.M. Van Horn and S.Z.D. Cheng -- Friction at soft polymer surface / M.K. Chaudhury, K. Vorvolakos and D. Malotky -- Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K.R. Shull -- Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- Anomalous dynamics of polymer films / O.K.C. Tsui Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Block copolymers fast Nanostructured materials fast Polymers fast Thin films fast Thin films Polymers Block copolymers Nanostructured materials Kolloidchemie (DE-588)4134420-0 gnd rswk-swf Makromolekulare Chemie (DE-588)4168684-6 gnd rswk-swf Kolloidchemie (DE-588)4134420-0 s 1\p DE-604 Makromolekulare Chemie (DE-588)4168684-6 s 2\p DE-604 Tsui, Ophelia Kwan Chui Sonstige oth Russell, Thomas P. Sonstige oth Erscheint auch als Druckausgabe 978-981-281-881-2 Erscheint auch als Druckausgabe 981-281-881-2 http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191 Aggregator Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Polymer thin films TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Block copolymers fast Nanostructured materials fast Polymers fast Thin films fast Thin films Polymers Block copolymers Nanostructured materials Kolloidchemie (DE-588)4134420-0 gnd Makromolekulare Chemie (DE-588)4168684-6 gnd |
subject_GND | (DE-588)4134420-0 (DE-588)4168684-6 |
title | Polymer thin films |
title_auth | Polymer thin films |
title_exact_search | Polymer thin films |
title_full | Polymer thin films editors, Ophelia K.C. Tsui, Thomas P. Russell |
title_fullStr | Polymer thin films editors, Ophelia K.C. Tsui, Thomas P. Russell |
title_full_unstemmed | Polymer thin films editors, Ophelia K.C. Tsui, Thomas P. Russell |
title_short | Polymer thin films |
title_sort | polymer thin films |
topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Block copolymers fast Nanostructured materials fast Polymers fast Thin films fast Thin films Polymers Block copolymers Nanostructured materials Kolloidchemie (DE-588)4134420-0 gnd Makromolekulare Chemie (DE-588)4168684-6 gnd |
topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Block copolymers Nanostructured materials Polymers Thin films Kolloidchemie Makromolekulare Chemie |
url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=305191 |
work_keys_str_mv | AT tsuiopheliakwanchui polymerthinfilms AT russellthomasp polymerthinfilms |