SIMOX:
Gespeichert in:
Bibliographische Detailangaben
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: London Institution of Electrical Engineers ©2004
Schriftenreihe:EMIS processing series no. 4
Schlagworte:
Online-Zugang:FAW01
FAW02
Volltext
Beschreibung:Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002
Includes bibliographical references and index
Introduction - M.J. Anc -- - Overview of SIMOX technology: historical perspective - K. Izumi -- - Fundamental processes in SIMOX layer formation: ion implantation and oxide growth - P.L.F. Hemment -- - SIMOX/SOI processes: flexibility based on thermodynamic considerations - A. Ogura -- - Electrical and optical characterisation of SIMOX substrates - H. Hovel -- - SIMOX material technology from R & D to advanced products - D.K. Sadana
This volume on SIMOX includes an historical perspective of SIMOX developments, fundamental formation mechanisms and emerging techniques, along with SOI material characterisation methods and results, technological processes from RandD to advanced applications and a brief overview of VLSI circuit applications
Beschreibung:1 Online-Ressource (xvi, 143 pages)
ISBN:086341334X
184919064X
9780863413346
9781849190640

Es ist kein Print-Exemplar vorhanden.

Fernleihe Bestellen Achtung: Nicht im THWS-Bestand! Volltext öffnen