Chemical vapor deposition:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Materials Park, Ohio
ASM International
2001
|
| Schriftenreihe: | Surface engineering series
v. 2 |
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 Volltext |
| Beschreibung: | Includes bibliographical references Ch. 1 - Introduction to Chemical Vapor Deposition (CVD) - J. R. Creighton and P. Ho -- - Ch. 2 - Basic Principles of CVD Thermodynamics and Kinetics - A. K. Pattanaik and V. K. Sarin -- - Ch. 3 - Stresses and Mechanical Stability of CVD Thin Films - M. Ignat -- - Ch. 4 - Combustion Chemical Vapor Deposition (CCVD) - A. T. Hunt and Matthias Pohl -- - Ch. 5 - Polarized Electrochemical Vapor Deposition - Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- - Ch. 6 - Chemical Vapor Infiltration: Optimization of Processing Conditions - S. K. Griffiths and Robert H. Nilson -- - Ch. 7 - Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications - C. S. Hwang and H.-I. Yoo |
| Beschreibung: | 1 Online-Ressource (vii, 481 p.) |
| ISBN: | 087170692X 0871707314 161503224X 9780871706928 9780871707314 9781615032242 |
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| 245 | 1 | 0 | |a Chemical vapor deposition |c edited by Jong-Hee Park, T.S. Sudarshan |
| 264 | 1 | |a Materials Park, Ohio |b ASM International |c 2001 | |
| 300 | |a 1 Online-Ressource (vii, 481 p.) | ||
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| 490 | 0 | |a Surface engineering series |v v. 2 | |
| 500 | |a Includes bibliographical references | ||
| 500 | |a Ch. 1 - Introduction to Chemical Vapor Deposition (CVD) - J. R. Creighton and P. Ho -- - Ch. 2 - Basic Principles of CVD Thermodynamics and Kinetics - A. K. Pattanaik and V. K. Sarin -- - Ch. 3 - Stresses and Mechanical Stability of CVD Thin Films - M. Ignat -- - Ch. 4 - Combustion Chemical Vapor Deposition (CCVD) - A. T. Hunt and Matthias Pohl -- - Ch. 5 - Polarized Electrochemical Vapor Deposition - Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- - Ch. 6 - Chemical Vapor Infiltration: Optimization of Processing Conditions - S. K. Griffiths and Robert H. Nilson -- - Ch. 7 - Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications - C. S. Hwang and H.-I. Yoo | ||
| 650 | 4 | |a BUHAR KAPLAMA. | |
| 650 | 4 | |a ATEŞE DAYANIKLI KAPLAMA. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Technical & Manufacturing Industries & Trades |2 bisacsh | |
| 650 | 7 | |a Refractory coating |2 fast | |
| 650 | 7 | |a Vapor-plating |2 fast | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 4 | |a Refractory coating | |
| 700 | 1 | |a Park, Jong-Hee |e Sonstige |4 oth | |
| 700 | 1 | |a Sudarshan, T. S. |e Sonstige |4 oth | |
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| dewey-ones | 671 - Metalworking & primary metal products |
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| dewey-search | 671.7/35 |
| dewey-sort | 3671.7 235 |
| dewey-tens | 670 - Manufacturing |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| format | Electronic eBook |
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| id | DE-604.BV043070225 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:16:31Z |
| institution | BVB |
| isbn | 087170692X 0871707314 161503224X 9780871706928 9780871707314 9781615032242 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028494417 |
| oclc_num | 646817910 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 1 Online-Ressource (vii, 481 p.) |
| psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | ASM International |
| record_format | marc |
| series2 | Surface engineering series |
| spelling | Chemical vapor deposition edited by Jong-Hee Park, T.S. Sudarshan Materials Park, Ohio ASM International 2001 1 Online-Ressource (vii, 481 p.) txt rdacontent c rdamedia cr rdacarrier Surface engineering series v. 2 Includes bibliographical references Ch. 1 - Introduction to Chemical Vapor Deposition (CVD) - J. R. Creighton and P. Ho -- - Ch. 2 - Basic Principles of CVD Thermodynamics and Kinetics - A. K. Pattanaik and V. K. Sarin -- - Ch. 3 - Stresses and Mechanical Stability of CVD Thin Films - M. Ignat -- - Ch. 4 - Combustion Chemical Vapor Deposition (CCVD) - A. T. Hunt and Matthias Pohl -- - Ch. 5 - Polarized Electrochemical Vapor Deposition - Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey -- - Ch. 6 - Chemical Vapor Infiltration: Optimization of Processing Conditions - S. K. Griffiths and Robert H. Nilson -- - Ch. 7 - Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications - C. S. Hwang and H.-I. Yoo BUHAR KAPLAMA. ATEŞE DAYANIKLI KAPLAMA. TECHNOLOGY & ENGINEERING / Technical & Manufacturing Industries & Trades bisacsh Refractory coating fast Vapor-plating fast Vapor-plating Refractory coating Park, Jong-Hee Sonstige oth Sudarshan, T. S. Sonstige oth http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=395831 Aggregator Volltext |
| spellingShingle | Chemical vapor deposition BUHAR KAPLAMA. ATEŞE DAYANIKLI KAPLAMA. TECHNOLOGY & ENGINEERING / Technical & Manufacturing Industries & Trades bisacsh Refractory coating fast Vapor-plating fast Vapor-plating Refractory coating |
| title | Chemical vapor deposition |
| title_auth | Chemical vapor deposition |
| title_exact_search | Chemical vapor deposition |
| title_full | Chemical vapor deposition edited by Jong-Hee Park, T.S. Sudarshan |
| title_fullStr | Chemical vapor deposition edited by Jong-Hee Park, T.S. Sudarshan |
| title_full_unstemmed | Chemical vapor deposition edited by Jong-Hee Park, T.S. Sudarshan |
| title_short | Chemical vapor deposition |
| title_sort | chemical vapor deposition |
| topic | BUHAR KAPLAMA. ATEŞE DAYANIKLI KAPLAMA. TECHNOLOGY & ENGINEERING / Technical & Manufacturing Industries & Trades bisacsh Refractory coating fast Vapor-plating fast Vapor-plating Refractory coating |
| topic_facet | BUHAR KAPLAMA. ATEŞE DAYANIKLI KAPLAMA. TECHNOLOGY & ENGINEERING / Technical & Manufacturing Industries & Trades Refractory coating Vapor-plating |
| url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=395831 |
| work_keys_str_mv | AT parkjonghee chemicalvapordeposition AT sudarshants chemicalvapordeposition |