Soft x-rays and extreme ultraviolet radiation: principles and applications
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Bibliographic Details
Main Author: Attwood, David T. (Author)
Format: Electronic eBook
Language:English
Published: Cambridge Cambridge University Press 2000
Subjects:
Online Access:FAW01
FAW02
Volltext
Item Description:Includes bibliographical references and index
Ch. 1 - Introduction -- - Ch. 2 - Radiation and scattering at EUV and soft x-ray wavelengths -- - Ch. 3 - Wave propagation and refractive index at EUV and soft x-ray wavelengths -- - Ch. 4 - Multilayer interference coatings -- - Ch. 5 - Synchrotron radiation -- - Ch. 6 - Physics of hot dense plasmas -- - Ch. 7 - Extreme ultraviolet and soft x-ray lasers -- - Ch. 8 - Coherence at short wavelengths -- - Ch. 9 - Soft x-ray microscopy with diffractive optics -- - Ch. 10 - Extreme ultraviolet and x-ray lithography
"This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--BOOK JACKET.
Physical Description:1 Online-Ressource (xvi, 470 p.)
ISBN:0521652146
1139164422
1139648934
9780521652148
9781139164429
9781139648936

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