Soft x-rays and extreme ultraviolet radiation: principles and applications
Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Attwood, David T. (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Cambridge Cambridge University Press 2000
Schlagworte:
Online-Zugang:FAW01
FAW02
Volltext
Beschreibung:Includes bibliographical references and index
Ch. 1 - Introduction -- - Ch. 2 - Radiation and scattering at EUV and soft x-ray wavelengths -- - Ch. 3 - Wave propagation and refractive index at EUV and soft x-ray wavelengths -- - Ch. 4 - Multilayer interference coatings -- - Ch. 5 - Synchrotron radiation -- - Ch. 6 - Physics of hot dense plasmas -- - Ch. 7 - Extreme ultraviolet and soft x-ray lasers -- - Ch. 8 - Coherence at short wavelengths -- - Ch. 9 - Soft x-ray microscopy with diffractive optics -- - Ch. 10 - Extreme ultraviolet and x-ray lithography
"This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--BOOK JACKET.
Beschreibung:1 Online-Ressource (xvi, 470 p.)
ISBN:0521652146
1139164422
1139648934
9780521652148
9781139164429
9781139648936

Es ist kein Print-Exemplar vorhanden.

Fernleihe Bestellen Achtung: Nicht im THWS-Bestand! Volltext öffnen