Electron beam lithography of molecular glass resist films prepared by physical vapor deposition:
Saved in:
| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2014
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| Subjects: | |
| Online Access: | Volltext Volltext Volltext |
| Physical Description: | 179 S. Ill., graph. Darst. |
| Format: | Langzeitarchivierung gewährleistet, LZA |
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MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV042543965 | ||
| 003 | DE-604 | ||
| 005 | 20150528 | ||
| 007 | t | ||
| 008 | 150506s2014 ad|| m||| 00||| eng d | ||
| 035 | |a (OCoLC)910364743 | ||
| 035 | |a (DE-599)BVBBV042543965 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-384 |a DE-473 |a DE-703 |a DE-1051 |a DE-824 |a DE-29 |a DE-12 |a DE-91 |a DE-19 |a DE-1049 |a DE-92 |a DE-739 |a DE-898 |a DE-355 |a DE-706 |a DE-20 |a DE-1102 | ||
| 082 | 0 | |a 791 | |
| 084 | |a ST 170 |0 (DE-625)143602: |2 rvk | ||
| 100 | 1 | |a Kolb, Tristan |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |c von Tristan Kolb |
| 264 | 1 | |c 2014 | |
| 300 | |a 179 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 502 | |a Bayreuth, Univ., Diss., 2014 | ||
| 538 | |a Langzeitarchivierung gewährleistet, LZA | ||
| 650 | 0 | 7 | |a PVD-Verfahren |0 (DE-588)4115673-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroprozessor |0 (DE-588)4039232-6 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Mikroprozessor |0 (DE-588)4039232-6 |D s |
| 689 | 0 | 1 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 0 | 2 | |a PVD-Verfahren |0 (DE-588)4115673-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe |o urn:nbn:de:bvb:703-epub-1953-5 |
| 856 | 4 | 1 | |u https://epub.uni-bayreuth.de/1953/ |x Verlag |z kostenfrei |3 Volltext |
| 856 | 4 | 0 | |u https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5 |x Resolving-System |z kostenfrei |3 Volltext |
| 856 | 4 | 0 | |u http://d-nb.info/1070580961/34 |x Langzeitarchivierung Nationalbibliothek |z kostenfrei |3 Volltext |
| 912 | |a ebook | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027977974 | ||
Record in the Search Index
| _version_ | 1804153309173383168 |
|---|---|
| any_adam_object | |
| author | Kolb, Tristan |
| author_facet | Kolb, Tristan |
| author_role | aut |
| author_sort | Kolb, Tristan |
| author_variant | t k tk |
| building | Verbundindex |
| bvnumber | BV042543965 |
| classification_rvk | ST 170 |
| collection | ebook |
| ctrlnum | (OCoLC)910364743 (DE-599)BVBBV042543965 |
| dewey-full | 791 |
| dewey-hundreds | 700 - The arts |
| dewey-ones | 791 - Public performances |
| dewey-raw | 791 |
| dewey-search | 791 |
| dewey-sort | 3791 |
| dewey-tens | 790 - Recreational and performing arts |
| discipline | Informatik |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01867nam a2200445 c 4500</leader><controlfield tag="001">BV042543965</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20150528 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">150506s2014 ad|| m||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)910364743</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042543965</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-384</subfield><subfield code="a">DE-473</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-1051</subfield><subfield code="a">DE-824</subfield><subfield code="a">DE-29</subfield><subfield code="a">DE-12</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-1049</subfield><subfield code="a">DE-92</subfield><subfield code="a">DE-739</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-706</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-1102</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">791</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ST 170</subfield><subfield code="0">(DE-625)143602:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kolb, Tristan</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Electron beam lithography of molecular glass resist films prepared by physical vapor deposition</subfield><subfield code="c">von Tristan Kolb</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">179 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="a">Bayreuth, Univ., Diss., 2014</subfield></datafield><datafield tag="538" ind1=" " ind2=" "><subfield code="a">Langzeitarchivierung gewährleistet, LZA</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroprozessor</subfield><subfield code="0">(DE-588)4039232-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Mikroprozessor</subfield><subfield code="0">(DE-588)4039232-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Online-Ausgabe</subfield><subfield code="o">urn:nbn:de:bvb:703-epub-1953-5</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://epub.uni-bayreuth.de/1953/</subfield><subfield code="x">Verlag</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5</subfield><subfield code="x">Resolving-System</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://d-nb.info/1070580961/34</subfield><subfield code="x">Langzeitarchivierung Nationalbibliothek</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ebook</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027977974</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV042543965 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T01:24:33Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027977974 |
| oclc_num | 910364743 |
| open_access_boolean | 1 |
| owner | DE-384 DE-473 DE-BY-UBG DE-703 DE-1051 DE-824 DE-29 DE-12 DE-91 DE-BY-TUM DE-19 DE-BY-UBM DE-1049 DE-92 DE-739 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-706 DE-20 DE-1102 |
| owner_facet | DE-384 DE-473 DE-BY-UBG DE-703 DE-1051 DE-824 DE-29 DE-12 DE-91 DE-BY-TUM DE-19 DE-BY-UBM DE-1049 DE-92 DE-739 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-706 DE-20 DE-1102 |
| physical | 179 S. Ill., graph. Darst. |
| psigel | ebook |
| publishDate | 2014 |
| publishDateSearch | 2014 |
| publishDateSort | 2014 |
| record_format | marc |
| spelling | Kolb, Tristan Verfasser aut Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb 2014 179 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Bayreuth, Univ., Diss., 2014 Langzeitarchivierung gewährleistet, LZA PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Mikroprozessor (DE-588)4039232-6 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Mikroprozessor (DE-588)4039232-6 s Elektronenstrahllithografie (DE-588)4151897-4 s PVD-Verfahren (DE-588)4115673-0 s DE-604 Erscheint auch als Online-Ausgabe urn:nbn:de:bvb:703-epub-1953-5 https://epub.uni-bayreuth.de/1953/ Verlag kostenfrei Volltext https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5 Resolving-System kostenfrei Volltext http://d-nb.info/1070580961/34 Langzeitarchivierung Nationalbibliothek kostenfrei Volltext |
| spellingShingle | Kolb, Tristan Electron beam lithography of molecular glass resist films prepared by physical vapor deposition PVD-Verfahren (DE-588)4115673-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroprozessor (DE-588)4039232-6 gnd |
| subject_GND | (DE-588)4115673-0 (DE-588)4151897-4 (DE-588)4039232-6 (DE-588)4113937-9 |
| title | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_auth | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_exact_search | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_full | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_fullStr | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_full_unstemmed | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_short | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_sort | electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| topic | PVD-Verfahren (DE-588)4115673-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroprozessor (DE-588)4039232-6 gnd |
| topic_facet | PVD-Verfahren Elektronenstrahllithografie Mikroprozessor Hochschulschrift |
| url | https://epub.uni-bayreuth.de/1953/ https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5 http://d-nb.info/1070580961/34 |
| work_keys_str_mv | AT kolbtristan electronbeamlithographyofmolecularglassresistfilmspreparedbyphysicalvapordeposition |