Electron beam lithography of molecular glass resist films prepared by physical vapor deposition:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | English |
| Veröffentlicht: |
2014
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| Schlagworte: | |
| Online-Zugang: | Volltext Volltext Volltext |
| Beschreibung: | 179 S. Ill., graph. Darst. |
| Format: | Langzeitarchivierung gewährleistet, LZA |
Internformat
MARC
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| 245 | 1 | 0 | |a Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |c von Tristan Kolb |
| 264 | 1 | |c 2014 | |
| 300 | |a 179 S. |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
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| any_adam_object | |
| author | Kolb, Tristan |
| author_facet | Kolb, Tristan |
| author_role | aut |
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| building | Verbundindex |
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| ctrlnum | (OCoLC)910364743 (DE-599)BVBBV042543965 |
| dewey-full | 791 |
| dewey-hundreds | 700 - The arts |
| dewey-ones | 791 - Public performances |
| dewey-raw | 791 |
| dewey-search | 791 |
| dewey-sort | 3791 |
| dewey-tens | 790 - Recreational and performing arts |
| discipline | Informatik |
| format | Thesis Book |
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| id | DE-604.BV042543965 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T01:24:33Z |
| institution | BVB |
| language | English |
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| physical | 179 S. Ill., graph. Darst. |
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| spelling | Kolb, Tristan Verfasser aut Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb 2014 179 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Bayreuth, Univ., Diss., 2014 Langzeitarchivierung gewährleistet, LZA PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Mikroprozessor (DE-588)4039232-6 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Mikroprozessor (DE-588)4039232-6 s Elektronenstrahllithografie (DE-588)4151897-4 s PVD-Verfahren (DE-588)4115673-0 s DE-604 Erscheint auch als Online-Ausgabe urn:nbn:de:bvb:703-epub-1953-5 https://epub.uni-bayreuth.de/1953/ Verlag kostenfrei Volltext https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5 Resolving-System kostenfrei Volltext http://d-nb.info/1070580961/34 Langzeitarchivierung Nationalbibliothek kostenfrei Volltext |
| spellingShingle | Kolb, Tristan Electron beam lithography of molecular glass resist films prepared by physical vapor deposition PVD-Verfahren (DE-588)4115673-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroprozessor (DE-588)4039232-6 gnd |
| subject_GND | (DE-588)4115673-0 (DE-588)4151897-4 (DE-588)4039232-6 (DE-588)4113937-9 |
| title | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_auth | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_exact_search | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_full | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_fullStr | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_full_unstemmed | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition von Tristan Kolb |
| title_short | Electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| title_sort | electron beam lithography of molecular glass resist films prepared by physical vapor deposition |
| topic | PVD-Verfahren (DE-588)4115673-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroprozessor (DE-588)4039232-6 gnd |
| topic_facet | PVD-Verfahren Elektronenstrahllithografie Mikroprozessor Hochschulschrift |
| url | https://epub.uni-bayreuth.de/1953/ https://nbn-resolving.org/urn:nbn:de:bvb:703-epub-1953-5 http://d-nb.info/1070580961/34 |
| work_keys_str_mv | AT kolbtristan electronbeamlithographyofmolecularglassresistfilmspreparedbyphysicalvapordeposition |