Ion Tracks and Microtechnology: Principles and Applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Wiesbaden
Vieweg+Teubner Verlag
1990
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | The penetration of heavy charged particles through matter has been the subject of investigations since the early days of Bohr's atomic model. Much later it was found that the resulting traces have dimensions close to the atomic scale and can be revealed in the form of fme patterns. Quite recently, this characteristic attracts applications in micro electronics and -mechanics, biology and medicine, surface and membrane technology, magneto-optics and low temperature physics - applications which require a high subtlety of geometric control on a microscopic scale. Progress in advanced technologies depends crucially on the refinement of the available tools. On the road into the submicron regime, customary lithographies using visible and ultraviolet light, x rays, and electrons are steadily nearing their physical limits. A central point in the search for better tools is the improvement of irradiation technology. Ions have a well-defined range of penetration, a high local confmement of the deposited energy and can be generated conveniently in great quantity. The generated dam age zones can be stored indefmitely in many insulators and be used to initiate a phase transformation process that changes, removes, or collects material along the latent tracks. Up to now the most common development process is track etching, which acts as a chemical amplifier that dissolves the damaged zone of the latent tracks preferentially and creates etch pits or channels that can be extremely fine, starting around 10 nm and in creasing .linearly with the etching time |
| Beschreibung: | 1 Online-Ressource (X, 274 S.) |
| ISBN: | 9783322831033 9783322831040 |
| DOI: | 10.1007/978-3-322-83103-3 |
Internformat
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| 500 | |a The penetration of heavy charged particles through matter has been the subject of investigations since the early days of Bohr's atomic model. Much later it was found that the resulting traces have dimensions close to the atomic scale and can be revealed in the form of fme patterns. Quite recently, this characteristic attracts applications in micro electronics and -mechanics, biology and medicine, surface and membrane technology, magneto-optics and low temperature physics - applications which require a high subtlety of geometric control on a microscopic scale. Progress in advanced technologies depends crucially on the refinement of the available tools. On the road into the submicron regime, customary lithographies using visible and ultraviolet light, x rays, and electrons are steadily nearing their physical limits. A central point in the search for better tools is the improvement of irradiation technology. Ions have a well-defined range of penetration, a high local confmement of the deposited energy and can be generated conveniently in great quantity. The generated dam age zones can be stored indefmitely in many insulators and be used to initiate a phase transformation process that changes, removes, or collects material along the latent tracks. Up to now the most common development process is track etching, which acts as a chemical amplifier that dissolves the damaged zone of the latent tracks preferentially and creates etch pits or channels that can be extremely fine, starting around 10 nm and in creasing .linearly with the etching time | ||
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Datensatz im Suchindex
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| any_adam_object | |
| author | Spohr, Reimar |
| author_facet | Spohr, Reimar |
| author_role | aut |
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| building | Verbundindex |
| bvnumber | BV042429030 |
| classification_tum | ELT 000 MAS 000 |
| collection | ZDB-2-ENG ZDB-2-BAD |
| ctrlnum | (OCoLC)863870825 (DE-599)BVBBV042429030 |
| dewey-full | 620 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620 |
| dewey-search | 620 |
| dewey-sort | 3620 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Maschinenbau |
| doi_str_mv | 10.1007/978-3-322-83103-3 |
| format | Electronic eBook |
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| isbn | 9783322831033 9783322831040 |
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| spelling | Spohr, Reimar Verfasser aut Ion Tracks and Microtechnology Principles and Applications von Reimar Spohr ; herausgegeben von Klaus Bethge Wiesbaden Vieweg+Teubner Verlag 1990 1 Online-Ressource (X, 274 S.) txt rdacontent c rdamedia cr rdacarrier The penetration of heavy charged particles through matter has been the subject of investigations since the early days of Bohr's atomic model. Much later it was found that the resulting traces have dimensions close to the atomic scale and can be revealed in the form of fme patterns. Quite recently, this characteristic attracts applications in micro electronics and -mechanics, biology and medicine, surface and membrane technology, magneto-optics and low temperature physics - applications which require a high subtlety of geometric control on a microscopic scale. Progress in advanced technologies depends crucially on the refinement of the available tools. On the road into the submicron regime, customary lithographies using visible and ultraviolet light, x rays, and electrons are steadily nearing their physical limits. A central point in the search for better tools is the improvement of irradiation technology. Ions have a well-defined range of penetration, a high local confmement of the deposited energy and can be generated conveniently in great quantity. The generated dam age zones can be stored indefmitely in many insulators and be used to initiate a phase transformation process that changes, removes, or collects material along the latent tracks. Up to now the most common development process is track etching, which acts as a chemical amplifier that dissolves the damaged zone of the latent tracks preferentially and creates etch pits or channels that can be extremely fine, starting around 10 nm and in creasing .linearly with the etching time Engineering Engineering, general Ingenieurwissenschaften Ionenspur (DE-588)4248351-7 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 gnd rswk-swf Spur (DE-588)4056591-9 gnd rswk-swf Ion (DE-588)4027597-8 gnd rswk-swf Ionenspur (DE-588)4248351-7 s Mikrosystemtechnik (DE-588)4221617-5 s 1\p DE-604 Ion (DE-588)4027597-8 s Spur (DE-588)4056591-9 s 2\p DE-604 Bethge, Klaus Sonstige oth https://doi.org/10.1007/978-3-322-83103-3 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Spohr, Reimar Ion Tracks and Microtechnology Principles and Applications Engineering Engineering, general Ingenieurwissenschaften Ionenspur (DE-588)4248351-7 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd Spur (DE-588)4056591-9 gnd Ion (DE-588)4027597-8 gnd |
| subject_GND | (DE-588)4248351-7 (DE-588)4221617-5 (DE-588)4056591-9 (DE-588)4027597-8 |
| title | Ion Tracks and Microtechnology Principles and Applications |
| title_auth | Ion Tracks and Microtechnology Principles and Applications |
| title_exact_search | Ion Tracks and Microtechnology Principles and Applications |
| title_full | Ion Tracks and Microtechnology Principles and Applications von Reimar Spohr ; herausgegeben von Klaus Bethge |
| title_fullStr | Ion Tracks and Microtechnology Principles and Applications von Reimar Spohr ; herausgegeben von Klaus Bethge |
| title_full_unstemmed | Ion Tracks and Microtechnology Principles and Applications von Reimar Spohr ; herausgegeben von Klaus Bethge |
| title_short | Ion Tracks and Microtechnology |
| title_sort | ion tracks and microtechnology principles and applications |
| title_sub | Principles and Applications |
| topic | Engineering Engineering, general Ingenieurwissenschaften Ionenspur (DE-588)4248351-7 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd Spur (DE-588)4056591-9 gnd Ion (DE-588)4027597-8 gnd |
| topic_facet | Engineering Engineering, general Ingenieurwissenschaften Ionenspur Mikrosystemtechnik Spur Ion |
| url | https://doi.org/10.1007/978-3-322-83103-3 |
| work_keys_str_mv | AT spohrreimar iontracksandmicrotechnologyprinciplesandapplications AT bethgeklaus iontracksandmicrotechnologyprinciplesandapplications |