Gas Source Molecular Beam Epitaxy: Growth and Properties of Phosphorus Containing III-V Heterostructures
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Bibliographische Detailangaben
1. Verfasser: Panish, Morton B. (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Berlin, Heidelberg Springer Berlin Heidelberg 1993
Schriftenreihe:Springer Series in Materials Science 26
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Beschreibung:The need for precision epitaxy of III-V compounds was clearly illustrated by the demonstration of the first heterostructure devices - heterostructure lasers - in the late 60's. The early studies of molecular beam epitaxy of GaAs by A.Y. Cho and lR. Arthur during the same period initiated intensive research, by many workers, on epitaxy methods that have made possible an ever increasing inventory of new solid-state devices based on the use of multilayered epitaxial structures. In addition to studies of a variety of heterostructure lasers, the GaAsl AIGaAs work rapidly expanded to include quantum well structures for both physics and device purposes, demonstration of modulation doping, the quantum Hall effect and the fractional quantum Hall effect, new transistors, and new optoelectronic devices. In the mid 1970's it became clear that the GaInAs(P)/InP system was going to be a major player in fiberoptic communication systems because of the wavelength compatibility between light sources in that system and the fused silica glass fibers
Beschreibung:1 Online-Ressource (XIV, 428p. 306 illus)
ISBN:9783642781278
9783642781292
ISSN:0933-033X
DOI:10.1007/978-3-642-78127-8

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