Ion Implantation: Equipment and Techniques: Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982
Gespeichert in:
Weitere Verfasser: | , |
---|---|
Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Berlin, Heidelberg
Springer Berlin Heidelberg
1983
|
Schriftenreihe: | Springer Series in Electrophysics
11 |
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | The Fourth International Conference on Ion Implantation: Equipment and Techniques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Boulder, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the latter series. Twelve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and applications of implantation to metals and semiconductors. A school on ion implantation was held in connection with the conference, and the lectures presented at this school were published as Vol. 10 of the Springer Series in Electrophysics under the title Ion Implantation Techniques (edited by H. Ryssel and H. Glawischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specialists in industry as well as research institutions. Especially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference |
Beschreibung: | 1 Online-Ressource (X, 558 p) |
ISBN: | 9783642691560 9783642691584 |
ISSN: | 0172-5734 |
DOI: | 10.1007/978-3-642-69156-0 |
Internformat
MARC
LEADER | 00000nmm a2200000zcb4500 | ||
---|---|---|---|
001 | BV042413411 | ||
003 | DE-604 | ||
005 | 20171030 | ||
007 | cr|uuu---uuuuu | ||
008 | 150316s1983 |||| o||u| ||||||eng d | ||
020 | |a 9783642691560 |c Online |9 978-3-642-69156-0 | ||
020 | |a 9783642691584 |c Print |9 978-3-642-69158-4 | ||
024 | 7 | |a 10.1007/978-3-642-69156-0 |2 doi | |
035 | |a (OCoLC)863800962 | ||
035 | |a (DE-599)BVBBV042413411 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-91 |a DE-83 | ||
082 | 0 | |a 548 |2 23 | |
084 | |a PHY 000 |2 stub | ||
084 | |a ELT 293f |2 stub | ||
245 | 1 | 0 | |a Ion Implantation: Equipment and Techniques |b Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 |c edited by Heiner Ryssel, Hans Glawischnig |
264 | 1 | |a Berlin, Heidelberg |b Springer Berlin Heidelberg |c 1983 | |
300 | |a 1 Online-Ressource (X, 558 p) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 1 | |a Springer Series in Electrophysics |v 11 |x 0172-5734 | |
500 | |a The Fourth International Conference on Ion Implantation: Equipment and Techniques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Boulder, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the latter series. Twelve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and applications of implantation to metals and semiconductors. A school on ion implantation was held in connection with the conference, and the lectures presented at this school were published as Vol. 10 of the Springer Series in Electrophysics under the title Ion Implantation Techniques (edited by H. Ryssel and H. Glawischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specialists in industry as well as research institutions. Especially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference | ||
650 | 4 | |a Physics | |
650 | 4 | |a Crystallography | |
650 | 4 | |a Optics, Optoelectronics, Plasmonics and Optical Devices | |
650 | 0 | 7 | |a Ionenimplantation |0 (DE-588)4027606-5 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1982 |z Berchtesgaden |2 gnd-content | |
689 | 0 | 0 | |a Ionenimplantation |0 (DE-588)4027606-5 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Ryssel, Heiner |d 1941- |0 (DE-588)108187802 |4 edt | |
700 | 1 | |a Glawischnig, Hans |4 edt | |
830 | 0 | |a Springer Series in Electrophysics |v 11 |w (DE-604)BV000000013 |9 11 | |
856 | 4 | 0 | |u https://doi.org/10.1007/978-3-642-69156-0 |x Verlag |3 Volltext |
912 | |a ZDB-2-PHA |a ZDB-2-BAE | ||
940 | 1 | |q ZDB-2-PHA_Archive | |
999 | |a oai:aleph.bib-bvb.de:BVB01-027848904 |
Datensatz im Suchindex
_version_ | 1804153077631025152 |
---|---|
any_adam_object | |
author2 | Ryssel, Heiner 1941- Glawischnig, Hans |
author2_role | edt edt |
author2_variant | h r hr h g hg |
author_GND | (DE-588)108187802 |
author_facet | Ryssel, Heiner 1941- Glawischnig, Hans |
building | Verbundindex |
bvnumber | BV042413411 |
classification_tum | PHY 000 ELT 293f |
collection | ZDB-2-PHA ZDB-2-BAE |
ctrlnum | (OCoLC)863800962 (DE-599)BVBBV042413411 |
dewey-full | 548 |
dewey-hundreds | 500 - Natural sciences and mathematics |
dewey-ones | 548 - Crystallography |
dewey-raw | 548 |
dewey-search | 548 |
dewey-sort | 3548 |
dewey-tens | 540 - Chemistry and allied sciences |
discipline | Chemie / Pharmazie Physik Elektrotechnik |
doi_str_mv | 10.1007/978-3-642-69156-0 |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03438nmm a2200481zcb4500</leader><controlfield tag="001">BV042413411</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20171030 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s1983 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783642691560</subfield><subfield code="c">Online</subfield><subfield code="9">978-3-642-69156-0</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783642691584</subfield><subfield code="c">Print</subfield><subfield code="9">978-3-642-69158-4</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-3-642-69156-0</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863800962</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042413411</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">548</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 293f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Ion Implantation: Equipment and Techniques</subfield><subfield code="b">Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982</subfield><subfield code="c">edited by Heiner Ryssel, Hans Glawischnig</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Berlin, Heidelberg</subfield><subfield code="b">Springer Berlin Heidelberg</subfield><subfield code="c">1983</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (X, 558 p)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Springer Series in Electrophysics</subfield><subfield code="v">11</subfield><subfield code="x">0172-5734</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">The Fourth International Conference on Ion Implantation: Equipment and Techniques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Boulder, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the latter series. Twelve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and applications of implantation to metals and semiconductors. A school on ion implantation was held in connection with the conference, and the lectures presented at this school were published as Vol. 10 of the Springer Series in Electrophysics under the title Ion Implantation Techniques (edited by H. Ryssel and H. Glawischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specialists in industry as well as research institutions. Especially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Crystallography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optics, Optoelectronics, Plasmonics and Optical Devices</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ionenimplantation</subfield><subfield code="0">(DE-588)4027606-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1982</subfield><subfield code="z">Berchtesgaden</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Ionenimplantation</subfield><subfield code="0">(DE-588)4027606-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ryssel, Heiner</subfield><subfield code="d">1941-</subfield><subfield code="0">(DE-588)108187802</subfield><subfield code="4">edt</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Glawischnig, Hans</subfield><subfield code="4">edt</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Springer Series in Electrophysics</subfield><subfield code="v">11</subfield><subfield code="w">(DE-604)BV000000013</subfield><subfield code="9">11</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-3-642-69156-0</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027848904</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1982 Berchtesgaden gnd-content |
genre_facet | Konferenzschrift 1982 Berchtesgaden |
id | DE-604.BV042413411 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:20:52Z |
institution | BVB |
isbn | 9783642691560 9783642691584 |
issn | 0172-5734 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027848904 |
oclc_num | 863800962 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-83 |
owner_facet | DE-91 DE-BY-TUM DE-83 |
physical | 1 Online-Ressource (X, 558 p) |
psigel | ZDB-2-PHA ZDB-2-BAE ZDB-2-PHA_Archive |
publishDate | 1983 |
publishDateSearch | 1983 |
publishDateSort | 1983 |
publisher | Springer Berlin Heidelberg |
record_format | marc |
series | Springer Series in Electrophysics |
series2 | Springer Series in Electrophysics |
spelling | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 edited by Heiner Ryssel, Hans Glawischnig Berlin, Heidelberg Springer Berlin Heidelberg 1983 1 Online-Ressource (X, 558 p) txt rdacontent c rdamedia cr rdacarrier Springer Series in Electrophysics 11 0172-5734 The Fourth International Conference on Ion Implantation: Equipment and Techniques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Boulder, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the latter series. Twelve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and applications of implantation to metals and semiconductors. A school on ion implantation was held in connection with the conference, and the lectures presented at this school were published as Vol. 10 of the Springer Series in Electrophysics under the title Ion Implantation Techniques (edited by H. Ryssel and H. Glawischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specialists in industry as well as research institutions. Especially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference Physics Crystallography Optics, Optoelectronics, Plasmonics and Optical Devices Ionenimplantation (DE-588)4027606-5 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1982 Berchtesgaden gnd-content Ionenimplantation (DE-588)4027606-5 s DE-604 Ryssel, Heiner 1941- (DE-588)108187802 edt Glawischnig, Hans edt Springer Series in Electrophysics 11 (DE-604)BV000000013 11 https://doi.org/10.1007/978-3-642-69156-0 Verlag Volltext |
spellingShingle | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 Springer Series in Electrophysics Physics Crystallography Optics, Optoelectronics, Plasmonics and Optical Devices Ionenimplantation (DE-588)4027606-5 gnd |
subject_GND | (DE-588)4027606-5 (DE-588)1071861417 |
title | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 |
title_auth | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 |
title_exact_search | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 |
title_full | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 edited by Heiner Ryssel, Hans Glawischnig |
title_fullStr | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 edited by Heiner Ryssel, Hans Glawischnig |
title_full_unstemmed | Ion Implantation: Equipment and Techniques Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 edited by Heiner Ryssel, Hans Glawischnig |
title_short | Ion Implantation: Equipment and Techniques |
title_sort | ion implantation equipment and techniques proceedings of the fourth international conference berchtesgaden fed rep of germany september 13 17 1982 |
title_sub | Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982 |
topic | Physics Crystallography Optics, Optoelectronics, Plasmonics and Optical Devices Ionenimplantation (DE-588)4027606-5 gnd |
topic_facet | Physics Crystallography Optics, Optoelectronics, Plasmonics and Optical Devices Ionenimplantation Konferenzschrift 1982 Berchtesgaden |
url | https://doi.org/10.1007/978-3-642-69156-0 |
volume_link | (DE-604)BV000000013 |
work_keys_str_mv | AT rysselheiner ionimplantationequipmentandtechniquesproceedingsofthefourthinternationalconferenceberchtesgadenfedrepofgermanyseptember13171982 AT glawischnighans ionimplantationequipmentandtechniquesproceedingsofthefourthinternationalconferenceberchtesgadenfedrepofgermanyseptember13171982 |