Ferroelectric Random Access Memories: Fundamentals and Applications
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Bibliographic Details
Main Author: Ishiwara, Hiroshi (Author)
Format: Electronic eBook
Language:English
Published: Berlin, Heidelberg Springer Berlin Heidelberg 2004
Series:Topics in Applied Physics 93
Subjects:
Online Access:Volltext
Item Description:In fabrication of FeRAMs, various academic and technological backgrounds are necessary, which include ferroelectric materials, thin film formation, device physics, circuit design, and so on.This book covers from fundamentals to applications of ferroelectric random access memories (FeRAMs). The book consists of 5 parts; (1) ferroelectric thin films, (2) deposition and characterization methods, (3) fabrication process and circuit design, (4) advanced-type memories, and (5) applications and future prospects, and each part is further devided in several chapters. Because of the wide range of the discussed topics, each chapter in this book was written by one of the best authors knowing the specific topic very well. Thus, this is a good introduction book of FeRAM for graduate students and new comers to this field, as well as it helps specialists to understand FeRAMs more deeply
Physical Description:1 Online-Ressource (XIII, 291 p)
ISBN:9783540451631
9783540407188
ISSN:0303-4216
DOI:10.1007/b12953

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