High-Resolution X-Ray Scattering: From Thin Films to Lateral Nanostructures
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
New York, NY
Springer New York
2004
|
| Ausgabe: | Second Edition |
| Schriftenreihe: | Advanced Texts in Physics
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers |
| Beschreibung: | 1 Online-Ressource (XVI, 408 p) |
| ISBN: | 9781475740509 9781441923073 |
| ISSN: | 1439-2674 |
| DOI: | 10.1007/978-1-4757-4050-9 |
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| discipline | Physik |
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| spelling | Pietsch, Ullrich Verfasser aut High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures by Ullrich Pietsch, Václav Holý, Tilo Baumbach Second Edition New York, NY Springer New York 2004 1 Online-Ressource (XVI, 408 p) txt rdacontent c rdamedia cr rdacarrier Advanced Texts in Physics 1439-2674 During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers Optical materials Nanotechnology Surfaces (Physics) Materials Science Surfaces and Interfaces, Thin Films Optical and Electronic Materials Optics, Optoelectronics, Plasmonics and Optical Devices Mehrschichtsystem (DE-588)4244347-7 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Röntgenstreuung (DE-588)4178324-4 gnd rswk-swf Röntgenstreuung (DE-588)4178324-4 s Dünne Schicht (DE-588)4136925-7 s Mehrschichtsystem (DE-588)4244347-7 s 1\p DE-604 Holý, Václav Sonstige oth Baumbach, Tilo Sonstige oth https://doi.org/10.1007/978-1-4757-4050-9 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Pietsch, Ullrich High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures Optical materials Nanotechnology Surfaces (Physics) Materials Science Surfaces and Interfaces, Thin Films Optical and Electronic Materials Optics, Optoelectronics, Plasmonics and Optical Devices Mehrschichtsystem (DE-588)4244347-7 gnd Dünne Schicht (DE-588)4136925-7 gnd Röntgenstreuung (DE-588)4178324-4 gnd |
| subject_GND | (DE-588)4244347-7 (DE-588)4136925-7 (DE-588)4178324-4 |
| title | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures |
| title_auth | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures |
| title_exact_search | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures |
| title_full | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures by Ullrich Pietsch, Václav Holý, Tilo Baumbach |
| title_fullStr | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures by Ullrich Pietsch, Václav Holý, Tilo Baumbach |
| title_full_unstemmed | High-Resolution X-Ray Scattering From Thin Films to Lateral Nanostructures by Ullrich Pietsch, Václav Holý, Tilo Baumbach |
| title_short | High-Resolution X-Ray Scattering |
| title_sort | high resolution x ray scattering from thin films to lateral nanostructures |
| title_sub | From Thin Films to Lateral Nanostructures |
| topic | Optical materials Nanotechnology Surfaces (Physics) Materials Science Surfaces and Interfaces, Thin Films Optical and Electronic Materials Optics, Optoelectronics, Plasmonics and Optical Devices Mehrschichtsystem (DE-588)4244347-7 gnd Dünne Schicht (DE-588)4136925-7 gnd Röntgenstreuung (DE-588)4178324-4 gnd |
| topic_facet | Optical materials Nanotechnology Surfaces (Physics) Materials Science Surfaces and Interfaces, Thin Films Optical and Electronic Materials Optics, Optoelectronics, Plasmonics and Optical Devices Mehrschichtsystem Dünne Schicht Röntgenstreuung |
| url | https://doi.org/10.1007/978-1-4757-4050-9 |
| work_keys_str_mv | AT pietschullrich highresolutionxrayscatteringfromthinfilmstolateralnanostructures AT holyvaclav highresolutionxrayscatteringfromthinfilmstolateralnanostructures AT baumbachtilo highresolutionxrayscatteringfromthinfilmstolateralnanostructures |