Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin Films
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Boston, MA
Springer US
2004
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Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films |
Beschreibung: | 1 Online-Ressource (XVII, 102 p) |
ISBN: | 9781475739015 9781441954138 |
DOI: | 10.1007/978-1-4757-3901-5 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV042412361 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 150316s2004 |||| o||u| ||||||eng d | ||
020 | |a 9781475739015 |c Online |9 978-1-4757-3901-5 | ||
020 | |a 9781441954138 |c Print |9 978-1-4419-5413-8 | ||
024 | 7 | |a 10.1007/978-1-4757-3901-5 |2 doi | |
035 | |a (OCoLC)863978628 | ||
035 | |a (DE-599)BVBBV042412361 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-91 |a DE-83 | ||
082 | 0 | |a 530.417 |2 23 | |
084 | |a PHY 000 |2 stub | ||
100 | 1 | |a Fortin, Jeffrey B. |e Verfasser |4 aut | |
245 | 1 | 0 | |a Chemical Vapor Deposition Polymerization |b The Growth and Properties of Parylene Thin Films |c by Jeffrey B. Fortin, Toh-Ming Lu |
264 | 1 | |a Boston, MA |b Springer US |c 2004 | |
300 | |a 1 Online-Ressource (XVII, 102 p) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films | ||
650 | 4 | |a Physics | |
650 | 4 | |a Chemical engineering | |
650 | 4 | |a Surfaces (Physics) | |
650 | 4 | |a Surface and Interface Science, Thin Films | |
650 | 4 | |a Industrial Chemistry/Chemical Engineering | |
650 | 4 | |a Characterization and Evaluation of Materials | |
650 | 0 | 7 | |a Parylene |0 (DE-588)4350768-2 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Polymerisation |0 (DE-588)4046704-1 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Parylene |0 (DE-588)4350768-2 |D s |
689 | 0 | 1 | |a Polymerisation |0 (DE-588)4046704-1 |D s |
689 | 0 | 2 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
700 | 1 | |a Lu, Toh-Ming |e Sonstige |4 oth | |
856 | 4 | 0 | |u https://doi.org/10.1007/978-1-4757-3901-5 |x Verlag |3 Volltext |
912 | |a ZDB-2-PHA |a ZDB-2-BAE | ||
940 | 1 | |q ZDB-2-PHA_Archive | |
999 | |a oai:aleph.bib-bvb.de:BVB01-027847854 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk |
Datensatz im Suchindex
_version_ | 1804153075010633728 |
---|---|
any_adam_object | |
author | Fortin, Jeffrey B. |
author_facet | Fortin, Jeffrey B. |
author_role | aut |
author_sort | Fortin, Jeffrey B. |
author_variant | j b f jb jbf |
building | Verbundindex |
bvnumber | BV042412361 |
classification_tum | PHY 000 |
collection | ZDB-2-PHA ZDB-2-BAE |
ctrlnum | (OCoLC)863978628 (DE-599)BVBBV042412361 |
dewey-full | 530.417 |
dewey-hundreds | 500 - Natural sciences and mathematics |
dewey-ones | 530 - Physics |
dewey-raw | 530.417 |
dewey-search | 530.417 |
dewey-sort | 3530.417 |
dewey-tens | 530 - Physics |
discipline | Physik |
doi_str_mv | 10.1007/978-1-4757-3901-5 |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02840nmm a2200529zc 4500</leader><controlfield tag="001">BV042412361</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s2004 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781475739015</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-4757-3901-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781441954138</subfield><subfield code="c">Print</subfield><subfield code="9">978-1-4419-5413-8</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-1-4757-3901-5</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863978628</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042412361</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">530.417</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Fortin, Jeffrey B.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Chemical Vapor Deposition Polymerization</subfield><subfield code="b">The Growth and Properties of Parylene Thin Films</subfield><subfield code="c">by Jeffrey B. Fortin, Toh-Ming Lu</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston, MA</subfield><subfield code="b">Springer US</subfield><subfield code="c">2004</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XVII, 102 p)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Surfaces (Physics)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Surface and Interface Science, Thin Films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Industrial Chemistry/Chemical Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Characterization and Evaluation of Materials</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Parylene</subfield><subfield code="0">(DE-588)4350768-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Polymerisation</subfield><subfield code="0">(DE-588)4046704-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Parylene</subfield><subfield code="0">(DE-588)4350768-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Polymerisation</subfield><subfield code="0">(DE-588)4046704-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Lu, Toh-Ming</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-1-4757-3901-5</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027847854</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
id | DE-604.BV042412361 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:20:50Z |
institution | BVB |
isbn | 9781475739015 9781441954138 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027847854 |
oclc_num | 863978628 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-83 |
owner_facet | DE-91 DE-BY-TUM DE-83 |
physical | 1 Online-Ressource (XVII, 102 p) |
psigel | ZDB-2-PHA ZDB-2-BAE ZDB-2-PHA_Archive |
publishDate | 2004 |
publishDateSearch | 2004 |
publishDateSort | 2004 |
publisher | Springer US |
record_format | marc |
spelling | Fortin, Jeffrey B. Verfasser aut Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films by Jeffrey B. Fortin, Toh-Ming Lu Boston, MA Springer US 2004 1 Online-Ressource (XVII, 102 p) txt rdacontent c rdamedia cr rdacarrier Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films Physics Chemical engineering Surfaces (Physics) Surface and Interface Science, Thin Films Industrial Chemistry/Chemical Engineering Characterization and Evaluation of Materials Parylene (DE-588)4350768-2 gnd rswk-swf Polymerisation (DE-588)4046704-1 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Parylene (DE-588)4350768-2 s Polymerisation (DE-588)4046704-1 s CVD-Verfahren (DE-588)4009846-1 s 1\p DE-604 Lu, Toh-Ming Sonstige oth https://doi.org/10.1007/978-1-4757-3901-5 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Fortin, Jeffrey B. Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films Physics Chemical engineering Surfaces (Physics) Surface and Interface Science, Thin Films Industrial Chemistry/Chemical Engineering Characterization and Evaluation of Materials Parylene (DE-588)4350768-2 gnd Polymerisation (DE-588)4046704-1 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
subject_GND | (DE-588)4350768-2 (DE-588)4046704-1 (DE-588)4009846-1 |
title | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films |
title_auth | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films |
title_exact_search | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films |
title_full | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films by Jeffrey B. Fortin, Toh-Ming Lu |
title_fullStr | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films by Jeffrey B. Fortin, Toh-Ming Lu |
title_full_unstemmed | Chemical Vapor Deposition Polymerization The Growth and Properties of Parylene Thin Films by Jeffrey B. Fortin, Toh-Ming Lu |
title_short | Chemical Vapor Deposition Polymerization |
title_sort | chemical vapor deposition polymerization the growth and properties of parylene thin films |
title_sub | The Growth and Properties of Parylene Thin Films |
topic | Physics Chemical engineering Surfaces (Physics) Surface and Interface Science, Thin Films Industrial Chemistry/Chemical Engineering Characterization and Evaluation of Materials Parylene (DE-588)4350768-2 gnd Polymerisation (DE-588)4046704-1 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
topic_facet | Physics Chemical engineering Surfaces (Physics) Surface and Interface Science, Thin Films Industrial Chemistry/Chemical Engineering Characterization and Evaluation of Materials Parylene Polymerisation CVD-Verfahren |
url | https://doi.org/10.1007/978-1-4757-3901-5 |
work_keys_str_mv | AT fortinjeffreyb chemicalvapordepositionpolymerizationthegrowthandpropertiesofparylenethinfilms AT lutohming chemicalvapordepositionpolymerizationthegrowthandpropertiesofparylenethinfilms |