Plasma Technology: Fundamentals and Applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston, MA
Springer US
1992
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A. |
| Beschreibung: | 1 Online-Ressource (VIII, 224 p) |
| ISBN: | 9781461534006 9781461365020 |
| DOI: | 10.1007/978-1-4615-3400-6 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV042411619 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150316s1992 |||| o||u| ||||||eng d | ||
| 020 | |a 9781461534006 |c Online |9 978-1-4615-3400-6 | ||
| 020 | |a 9781461365020 |c Print |9 978-1-4613-6502-0 | ||
| 024 | 7 | |a 10.1007/978-1-4615-3400-6 |2 doi | |
| 035 | |a (OCoLC)863734683 | ||
| 035 | |a (DE-599)BVBBV042411619 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-83 | ||
| 082 | 0 | |a 539 |2 23 | |
| 084 | |a PHY 000 |2 stub | ||
| 100 | 1 | |a Capitelli, Mario |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma Technology |b Fundamentals and Applications |c edited by Mario Capitelli, Claudine Gorse |
| 264 | 1 | |a Boston, MA |b Springer US |c 1992 | |
| 300 | |a 1 Online-Ressource (VIII, 224 p) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A. | ||
| 650 | 4 | |a Physics | |
| 650 | 4 | |a Nuclear physics | |
| 650 | 4 | |a Computer engineering | |
| 650 | 4 | |a Atomic, Molecular, Optical and Plasma Physics | |
| 650 | 4 | |a Electrical Engineering | |
| 650 | 4 | |a Nuclear Physics, Heavy Ions, Hadrons | |
| 650 | 4 | |a Classical Continuum Physics | |
| 650 | 0 | 7 | |a Plasmatechnik |0 (DE-588)4140353-8 |2 gnd |9 rswk-swf |
| 655 | 7 | |8 1\p |0 (DE-588)1071861417 |a Konferenzschrift |y 1991 |z Barga- Il Ciocco |2 gnd-content | |
| 689 | 0 | 0 | |a Plasmatechnik |0 (DE-588)4140353-8 |D s |
| 689 | 0 | |8 2\p |5 DE-604 | |
| 700 | 1 | |a Gorse, Claudine |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u https://doi.org/10.1007/978-1-4615-3400-6 |x Verlag |3 Volltext |
| 912 | |a ZDB-2-PHA |a ZDB-2-BAE | ||
| 940 | 1 | |q ZDB-2-PHA_Archive | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027847112 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804153073277337600 |
|---|---|
| any_adam_object | |
| author | Capitelli, Mario |
| author_facet | Capitelli, Mario |
| author_role | aut |
| author_sort | Capitelli, Mario |
| author_variant | m c mc |
| building | Verbundindex |
| bvnumber | BV042411619 |
| classification_tum | PHY 000 |
| collection | ZDB-2-PHA ZDB-2-BAE |
| ctrlnum | (OCoLC)863734683 (DE-599)BVBBV042411619 |
| dewey-full | 539 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 539 - Modern physics |
| dewey-raw | 539 |
| dewey-search | 539 |
| dewey-sort | 3539 |
| dewey-tens | 530 - Physics |
| discipline | Physik |
| doi_str_mv | 10.1007/978-1-4615-3400-6 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03417nmm a2200517zc 4500</leader><controlfield tag="001">BV042411619</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s1992 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461534006</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-4615-3400-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461365020</subfield><subfield code="c">Print</subfield><subfield code="9">978-1-4613-6502-0</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-1-4615-3400-6</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863734683</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042411619</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">539</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Capitelli, Mario</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma Technology</subfield><subfield code="b">Fundamentals and Applications</subfield><subfield code="c">edited by Mario Capitelli, Claudine Gorse</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston, MA</subfield><subfield code="b">Springer US</subfield><subfield code="c">1992</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (VIII, 224 p)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nuclear physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Computer engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Atomic, Molecular, Optical and Plasma Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electrical Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nuclear Physics, Heavy Ions, Hadrons</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Classical Continuum Physics</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1991</subfield><subfield code="z">Barga- Il Ciocco</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Gorse, Claudine</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-1-4615-3400-6</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027847112</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
| genre | 1\p (DE-588)1071861417 Konferenzschrift 1991 Barga- Il Ciocco gnd-content |
| genre_facet | Konferenzschrift 1991 Barga- Il Ciocco |
| id | DE-604.BV042411619 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:20:48Z |
| institution | BVB |
| isbn | 9781461534006 9781461365020 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027847112 |
| oclc_num | 863734683 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | 1 Online-Ressource (VIII, 224 p) |
| psigel | ZDB-2-PHA ZDB-2-BAE ZDB-2-PHA_Archive |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | Springer US |
| record_format | marc |
| spelling | Capitelli, Mario Verfasser aut Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse Boston, MA Springer US 1992 1 Online-Ressource (VIII, 224 p) txt rdacontent c rdamedia cr rdacarrier The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A. Physics Nuclear physics Computer engineering Atomic, Molecular, Optical and Plasma Physics Electrical Engineering Nuclear Physics, Heavy Ions, Hadrons Classical Continuum Physics Plasmatechnik (DE-588)4140353-8 gnd rswk-swf 1\p (DE-588)1071861417 Konferenzschrift 1991 Barga- Il Ciocco gnd-content Plasmatechnik (DE-588)4140353-8 s 2\p DE-604 Gorse, Claudine Sonstige oth https://doi.org/10.1007/978-1-4615-3400-6 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Capitelli, Mario Plasma Technology Fundamentals and Applications Physics Nuclear physics Computer engineering Atomic, Molecular, Optical and Plasma Physics Electrical Engineering Nuclear Physics, Heavy Ions, Hadrons Classical Continuum Physics Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4140353-8 (DE-588)1071861417 |
| title | Plasma Technology Fundamentals and Applications |
| title_auth | Plasma Technology Fundamentals and Applications |
| title_exact_search | Plasma Technology Fundamentals and Applications |
| title_full | Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse |
| title_fullStr | Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse |
| title_full_unstemmed | Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse |
| title_short | Plasma Technology |
| title_sort | plasma technology fundamentals and applications |
| title_sub | Fundamentals and Applications |
| topic | Physics Nuclear physics Computer engineering Atomic, Molecular, Optical and Plasma Physics Electrical Engineering Nuclear Physics, Heavy Ions, Hadrons Classical Continuum Physics Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Physics Nuclear physics Computer engineering Atomic, Molecular, Optical and Plasma Physics Electrical Engineering Nuclear Physics, Heavy Ions, Hadrons Classical Continuum Physics Plasmatechnik Konferenzschrift 1991 Barga- Il Ciocco |
| url | https://doi.org/10.1007/978-1-4615-3400-6 |
| work_keys_str_mv | AT capitellimario plasmatechnologyfundamentalsandapplications AT gorseclaudine plasmatechnologyfundamentalsandapplications |