Lecture Notes on Principles of Plasma Processing:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston, MA
Springer US
2003
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry |
| Beschreibung: | 1 Online-Ressource (XI, 208 p) |
| ISBN: | 9781461501817 9780306474972 |
| DOI: | 10.1007/978-1-4615-0181-7 |
Internformat
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| 500 | |a Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry | ||
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Datensatz im Suchindex
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| author | Chen, Francis F. 1929- |
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| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 539 - Modern physics |
| dewey-raw | 539.7092 |
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| dewey-tens | 530 - Physics |
| discipline | Physik |
| doi_str_mv | 10.1007/978-1-4615-0181-7 |
| format | Electronic eBook |
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| isbn | 9781461501817 9780306474972 |
| language | English |
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| spelling | Chen, Francis F. 1929- Verfasser (DE-588)17201932X aut Lecture Notes on Principles of Plasma Processing by Francis F. Chen, Jane P. Chang Boston, MA Springer US 2003 1 Online-Ressource (XI, 208 p) txt rdacontent c rdamedia cr rdacarrier Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry Physics Chemical engineering Nuclear physics Optical materials Nuclear Physics, Heavy Ions, Hadrons Optical and Electronic Materials Industrial Chemistry/Chemical Engineering Plasmaphysik (DE-588)4046259-6 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 s 1\p DE-604 Plasmaphysik (DE-588)4046259-6 s 2\p DE-604 Chang, Jane P. Sonstige oth https://doi.org/10.1007/978-1-4615-0181-7 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Chen, Francis F. 1929- Lecture Notes on Principles of Plasma Processing Physics Chemical engineering Nuclear physics Optical materials Nuclear Physics, Heavy Ions, Hadrons Optical and Electronic Materials Industrial Chemistry/Chemical Engineering Plasmaphysik (DE-588)4046259-6 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4046259-6 (DE-588)4140353-8 |
| title | Lecture Notes on Principles of Plasma Processing |
| title_auth | Lecture Notes on Principles of Plasma Processing |
| title_exact_search | Lecture Notes on Principles of Plasma Processing |
| title_full | Lecture Notes on Principles of Plasma Processing by Francis F. Chen, Jane P. Chang |
| title_fullStr | Lecture Notes on Principles of Plasma Processing by Francis F. Chen, Jane P. Chang |
| title_full_unstemmed | Lecture Notes on Principles of Plasma Processing by Francis F. Chen, Jane P. Chang |
| title_short | Lecture Notes on Principles of Plasma Processing |
| title_sort | lecture notes on principles of plasma processing |
| topic | Physics Chemical engineering Nuclear physics Optical materials Nuclear Physics, Heavy Ions, Hadrons Optical and Electronic Materials Industrial Chemistry/Chemical Engineering Plasmaphysik (DE-588)4046259-6 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Physics Chemical engineering Nuclear physics Optical materials Nuclear Physics, Heavy Ions, Hadrons Optical and Electronic Materials Industrial Chemistry/Chemical Engineering Plasmaphysik Plasmatechnik |
| url | https://doi.org/10.1007/978-1-4615-0181-7 |
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