Electron and ion optics:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston, MA
Springer US
1988
|
| Schriftenreihe: | Microdevices, Physics and Fabrication Technologies
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so |
| Beschreibung: | 1 Online-Ressource |
| ISBN: | 9781461309239 9781461282471 |
| DOI: | 10.1007/978-1-4613-0923-9 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV042411251 | ||
| 003 | DE-604 | ||
| 005 | 20210601 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150316s1988 |||| o||u| ||||||eng d | ||
| 020 | |a 9781461309239 |c Online |9 978-1-4613-0923-9 | ||
| 020 | |a 9781461282471 |c Print |9 978-1-4612-8247-1 | ||
| 024 | 7 | |a 10.1007/978-1-4613-0923-9 |2 doi | |
| 035 | |a (OCoLC)863786201 | ||
| 035 | |a (DE-599)BVBBV042411251 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-83 | ||
| 082 | 0 | |a 621.3 |2 23 | |
| 084 | |a UH 6200 |0 (DE-625)145743: |2 rvk | ||
| 084 | |a UH 6300 |0 (DE-625)159498: |2 rvk | ||
| 084 | |a PHY 000 |2 stub | ||
| 100 | 1 | |a Szilágyi, Miklós |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Electron and ion optics |c Miklós Szilágyi |
| 264 | 1 | |a Boston, MA |b Springer US |c 1988 | |
| 300 | |a 1 Online-Ressource | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Microdevices, Physics and Fabrication Technologies | |
| 500 | |a The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so | ||
| 650 | 4 | |a Engineering | |
| 650 | 4 | |a Computer engineering | |
| 650 | 4 | |a Optical materials | |
| 650 | 4 | |a Electrical Engineering | |
| 650 | 4 | |a Optical and Electronic Materials | |
| 650 | 4 | |a Ingenieurwissenschaften | |
| 650 | 0 | 7 | |a Ionenoptik |0 (DE-588)4162327-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Elektronenoptik |0 (DE-588)4151879-2 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Elektronenoptik |0 (DE-588)4151879-2 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Ionenoptik |0 (DE-588)4162327-7 |D s |
| 689 | 1 | |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 0-306-42717-6 |
| 856 | 4 | 0 | |u https://doi.org/10.1007/978-1-4613-0923-9 |x Verlag |3 Volltext |
| 912 | |a ZDB-2-PHA |a ZDB-2-BAE | ||
| 940 | 1 | |q ZDB-2-PHA_Archive | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027846744 | ||
Datensatz im Suchindex
| _version_ | 1804153072436379648 |
|---|---|
| any_adam_object | |
| author | Szilágyi, Miklós |
| author_facet | Szilágyi, Miklós |
| author_role | aut |
| author_sort | Szilágyi, Miklós |
| author_variant | m s ms |
| building | Verbundindex |
| bvnumber | BV042411251 |
| classification_rvk | UH 6200 UH 6300 |
| classification_tum | PHY 000 |
| collection | ZDB-2-PHA ZDB-2-BAE |
| ctrlnum | (OCoLC)863786201 (DE-599)BVBBV042411251 |
| dewey-full | 621.3 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3 |
| dewey-search | 621.3 |
| dewey-sort | 3621.3 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1007/978-1-4613-0923-9 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03141nmm a2200541zc 4500</leader><controlfield tag="001">BV042411251</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20210601 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s1988 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461309239</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-4613-0923-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461282471</subfield><subfield code="c">Print</subfield><subfield code="9">978-1-4612-8247-1</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-1-4613-0923-9</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863786201</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042411251</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UH 6200</subfield><subfield code="0">(DE-625)145743:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UH 6300</subfield><subfield code="0">(DE-625)159498:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Szilágyi, Miklós</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Electron and ion optics</subfield><subfield code="c">Miklós Szilágyi</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston, MA</subfield><subfield code="b">Springer US</subfield><subfield code="c">1988</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Microdevices, Physics and Fabrication Technologies</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Computer engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electrical Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical and Electronic Materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ingenieurwissenschaften</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ionenoptik</subfield><subfield code="0">(DE-588)4162327-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenoptik</subfield><subfield code="0">(DE-588)4151879-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Elektronenoptik</subfield><subfield code="0">(DE-588)4151879-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Ionenoptik</subfield><subfield code="0">(DE-588)4162327-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">0-306-42717-6</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-1-4613-0923-9</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027846744</subfield></datafield></record></collection> |
| id | DE-604.BV042411251 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:20:47Z |
| institution | BVB |
| isbn | 9781461309239 9781461282471 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027846744 |
| oclc_num | 863786201 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | 1 Online-Ressource |
| psigel | ZDB-2-PHA ZDB-2-BAE ZDB-2-PHA_Archive |
| publishDate | 1988 |
| publishDateSearch | 1988 |
| publishDateSort | 1988 |
| publisher | Springer US |
| record_format | marc |
| series2 | Microdevices, Physics and Fabrication Technologies |
| spelling | Szilágyi, Miklós Verfasser aut Electron and ion optics Miklós Szilágyi Boston, MA Springer US 1988 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier Microdevices, Physics and Fabrication Technologies The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so Engineering Computer engineering Optical materials Electrical Engineering Optical and Electronic Materials Ingenieurwissenschaften Ionenoptik (DE-588)4162327-7 gnd rswk-swf Elektronenoptik (DE-588)4151879-2 gnd rswk-swf Elektronenoptik (DE-588)4151879-2 s DE-604 Ionenoptik (DE-588)4162327-7 s Erscheint auch als Druck-Ausgabe 0-306-42717-6 https://doi.org/10.1007/978-1-4613-0923-9 Verlag Volltext |
| spellingShingle | Szilágyi, Miklós Electron and ion optics Engineering Computer engineering Optical materials Electrical Engineering Optical and Electronic Materials Ingenieurwissenschaften Ionenoptik (DE-588)4162327-7 gnd Elektronenoptik (DE-588)4151879-2 gnd |
| subject_GND | (DE-588)4162327-7 (DE-588)4151879-2 |
| title | Electron and ion optics |
| title_auth | Electron and ion optics |
| title_exact_search | Electron and ion optics |
| title_full | Electron and ion optics Miklós Szilágyi |
| title_fullStr | Electron and ion optics Miklós Szilágyi |
| title_full_unstemmed | Electron and ion optics Miklós Szilágyi |
| title_short | Electron and ion optics |
| title_sort | electron and ion optics |
| topic | Engineering Computer engineering Optical materials Electrical Engineering Optical and Electronic Materials Ingenieurwissenschaften Ionenoptik (DE-588)4162327-7 gnd Elektronenoptik (DE-588)4151879-2 gnd |
| topic_facet | Engineering Computer engineering Optical materials Electrical Engineering Optical and Electronic Materials Ingenieurwissenschaften Ionenoptik Elektronenoptik |
| url | https://doi.org/10.1007/978-1-4613-0923-9 |
| work_keys_str_mv | AT szilagyimiklos electronandionoptics |