Fundamental Electron Interactions with Plasma Processing Gases:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Boston, MA
Springer US
2004
|
| Schriftenreihe: | Physics of Atoms and Molecules
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6 |
| Beschreibung: | 1 Online-Ressource (XV, 781 p) |
| ISBN: | 9781441989710 9781461347415 |
| DOI: | 10.1007/978-1-4419-8971-0 |
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Datensatz im Suchindex
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| discipline | Physik |
| doi_str_mv | 10.1007/978-1-4419-8971-0 |
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| spelling | Christophoru, Lukas G. 1937- Verfasser (DE-588)1034845144 aut Fundamental Electron Interactions with Plasma Processing Gases by Loucas G. Christophorou, James K. Olthoff Boston, MA Springer US 2004 1 Online-Ressource (XV, 781 p) txt rdacontent c rdamedia cr rdacarrier Physics of Atoms and Molecules This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6 Physics Chemistry, Physical organic Nuclear physics Optical materials Atomic, Molecular, Optical and Plasma Physics Nuclear Physics, Heavy Ions, Hadrons Physical Chemistry Optical and Electronic Materials Wechselwirkung (DE-588)4064937-4 gnd rswk-swf Elektron (DE-588)4125978-6 gnd rswk-swf Molekül (DE-588)4039972-2 gnd rswk-swf Elektron (DE-588)4125978-6 s Molekül (DE-588)4039972-2 s Wechselwirkung (DE-588)4064937-4 s 1\p DE-604 Olthoff, James Kenneth 1958- Sonstige (DE-588)1053184492 oth https://doi.org/10.1007/978-1-4419-8971-0 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Christophoru, Lukas G. 1937- Fundamental Electron Interactions with Plasma Processing Gases Physics Chemistry, Physical organic Nuclear physics Optical materials Atomic, Molecular, Optical and Plasma Physics Nuclear Physics, Heavy Ions, Hadrons Physical Chemistry Optical and Electronic Materials Wechselwirkung (DE-588)4064937-4 gnd Elektron (DE-588)4125978-6 gnd Molekül (DE-588)4039972-2 gnd |
| subject_GND | (DE-588)4064937-4 (DE-588)4125978-6 (DE-588)4039972-2 |
| title | Fundamental Electron Interactions with Plasma Processing Gases |
| title_auth | Fundamental Electron Interactions with Plasma Processing Gases |
| title_exact_search | Fundamental Electron Interactions with Plasma Processing Gases |
| title_full | Fundamental Electron Interactions with Plasma Processing Gases by Loucas G. Christophorou, James K. Olthoff |
| title_fullStr | Fundamental Electron Interactions with Plasma Processing Gases by Loucas G. Christophorou, James K. Olthoff |
| title_full_unstemmed | Fundamental Electron Interactions with Plasma Processing Gases by Loucas G. Christophorou, James K. Olthoff |
| title_short | Fundamental Electron Interactions with Plasma Processing Gases |
| title_sort | fundamental electron interactions with plasma processing gases |
| topic | Physics Chemistry, Physical organic Nuclear physics Optical materials Atomic, Molecular, Optical and Plasma Physics Nuclear Physics, Heavy Ions, Hadrons Physical Chemistry Optical and Electronic Materials Wechselwirkung (DE-588)4064937-4 gnd Elektron (DE-588)4125978-6 gnd Molekül (DE-588)4039972-2 gnd |
| topic_facet | Physics Chemistry, Physical organic Nuclear physics Optical materials Atomic, Molecular, Optical and Plasma Physics Nuclear Physics, Heavy Ions, Hadrons Physical Chemistry Optical and Electronic Materials Wechselwirkung Elektron Molekül |
| url | https://doi.org/10.1007/978-1-4419-8971-0 |
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