Thin film materials technology: sputtering of compound materials
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Norwich, NY
William Andrew Pub.
c2004
|
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering Includes bibliographical references and index |
Beschreibung: | 1 Online-Ressource (xiv, 518 p.) |
ISBN: | 9780815514831 0815514832 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV042317143 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 150129s2004 |||| o||u| ||||||eng d | ||
020 | |a 9780815514831 |9 978-0-8155-1483-1 | ||
020 | |a 0815514832 |9 0-8155-1483-2 | ||
035 | |a (OCoLC)56811636 | ||
035 | |a (DE-599)BVBBV042317143 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-1046 | ||
082 | 0 | |a 621.3815/2 |2 22 | |
100 | 1 | |a Wasa, Kiyotaka |e Verfasser |4 aut | |
245 | 1 | 0 | |a Thin film materials technology |b sputtering of compound materials |c by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi |
264 | 1 | |a Norwich, NY |b William Andrew Pub. |c c2004 | |
300 | |a 1 Online-Ressource (xiv, 518 p.) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering | ||
500 | |a Includes bibliographical references and index | ||
650 | 7 | |a Cathode sputtering (Plating process) |2 fast | |
650 | 7 | |a Thin films |2 fast | |
650 | 4 | |a Cathode sputtering (Plating process) | |
650 | 4 | |a Thin films | |
650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
689 | 0 | 1 | |a Sputtern |0 (DE-588)4182614-0 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
700 | 1 | |a Kitabatake, Makoto |e Sonstige |4 oth | |
700 | 1 | |a Adachi, Hideaki |e Sonstige |4 oth | |
856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780815514831 |x Verlag |3 Volltext |
912 | |a ZDB-33-ESD |a ZDB-33-EBS | ||
940 | 1 | |q FAW_PDA_ESD | |
940 | 1 | |q FLA_PDA_ESD | |
999 | |a oai:aleph.bib-bvb.de:BVB01-027754134 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk |
Datensatz im Suchindex
_version_ | 1804152913278271488 |
---|---|
any_adam_object | |
author | Wasa, Kiyotaka |
author_facet | Wasa, Kiyotaka |
author_role | aut |
author_sort | Wasa, Kiyotaka |
author_variant | k w kw |
building | Verbundindex |
bvnumber | BV042317143 |
collection | ZDB-33-ESD ZDB-33-EBS |
ctrlnum | (OCoLC)56811636 (DE-599)BVBBV042317143 |
dewey-full | 621.3815/2 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/2 |
dewey-search | 621.3815/2 |
dewey-sort | 3621.3815 12 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02445nmm a2200493zc 4500</leader><controlfield tag="001">BV042317143</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s2004 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780815514831</subfield><subfield code="9">978-0-8155-1483-1</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0815514832</subfield><subfield code="9">0-8155-1483-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)56811636</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042317143</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Wasa, Kiyotaka</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Thin film materials technology</subfield><subfield code="b">sputtering of compound materials</subfield><subfield code="c">by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Norwich, NY</subfield><subfield code="b">William Andrew Pub.</subfield><subfield code="c">c2004</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xiv, 518 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Cathode sputtering (Plating process)</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin films</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Cathode sputtering (Plating process)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kitabatake, Makoto</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Adachi, Hideaki</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780815514831</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield><subfield code="a">ZDB-33-EBS</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FAW_PDA_ESD</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FLA_PDA_ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027754134</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield></record></collection> |
id | DE-604.BV042317143 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:18:16Z |
institution | BVB |
isbn | 9780815514831 0815514832 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027754134 |
oclc_num | 56811636 |
open_access_boolean | |
owner | DE-1046 |
owner_facet | DE-1046 |
physical | 1 Online-Ressource (xiv, 518 p.) |
psigel | ZDB-33-ESD ZDB-33-EBS FAW_PDA_ESD FLA_PDA_ESD |
publishDate | 2004 |
publishDateSearch | 2004 |
publishDateSort | 2004 |
publisher | William Andrew Pub. |
record_format | marc |
spelling | Wasa, Kiyotaka Verfasser aut Thin film materials technology sputtering of compound materials by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi Norwich, NY William Andrew Pub. c2004 1 Online-Ressource (xiv, 518 p.) txt rdacontent c rdamedia cr rdacarrier An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering Includes bibliographical references and index Cathode sputtering (Plating process) fast Thin films fast Cathode sputtering (Plating process) Thin films Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 s Sputtern (DE-588)4182614-0 s 1\p DE-604 Kitabatake, Makoto Sonstige oth Adachi, Hideaki Sonstige oth http://www.sciencedirect.com/science/book/9780815514831 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Wasa, Kiyotaka Thin film materials technology sputtering of compound materials Cathode sputtering (Plating process) fast Thin films fast Cathode sputtering (Plating process) Thin films Dünnschichttechnik (DE-588)4136339-5 gnd Sputtern (DE-588)4182614-0 gnd |
subject_GND | (DE-588)4136339-5 (DE-588)4182614-0 |
title | Thin film materials technology sputtering of compound materials |
title_auth | Thin film materials technology sputtering of compound materials |
title_exact_search | Thin film materials technology sputtering of compound materials |
title_full | Thin film materials technology sputtering of compound materials by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi |
title_fullStr | Thin film materials technology sputtering of compound materials by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi |
title_full_unstemmed | Thin film materials technology sputtering of compound materials by Kiyotaka Wasa, Makoto Kitabatake, Hideaki Adachi |
title_short | Thin film materials technology |
title_sort | thin film materials technology sputtering of compound materials |
title_sub | sputtering of compound materials |
topic | Cathode sputtering (Plating process) fast Thin films fast Cathode sputtering (Plating process) Thin films Dünnschichttechnik (DE-588)4136339-5 gnd Sputtern (DE-588)4182614-0 gnd |
topic_facet | Cathode sputtering (Plating process) Thin films Dünnschichttechnik Sputtern |
url | http://www.sciencedirect.com/science/book/9780815514831 |
work_keys_str_mv | AT wasakiyotaka thinfilmmaterialstechnologysputteringofcompoundmaterials AT kitabatakemakoto thinfilmmaterialstechnologysputteringofcompoundmaterials AT adachihideaki thinfilmmaterialstechnologysputteringofcompoundmaterials |