Optical diagnostics for thin film processing:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
San Diego, CA
Academic Press
c1996
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource (xxix, 783 p.) |
| ISBN: | 9780123420701 0123420709 9780080538082 0080538088 1281033022 9781281033024 |
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| 500 | |a This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic | ||
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| 650 | 4 | |a Spectrum analysis |x Industrial applications | |
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Datensatz im Suchindex
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| author | Herman, Irving P. |
| author_facet | Herman, Irving P. |
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| author_sort | Herman, Irving P. |
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| bvnumber | BV042316983 |
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| dewey-full | 621.3815/2/0287 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2/0287 |
| dewey-search | 621.3815/2/0287 |
| dewey-sort | 3621.3815 12 3287 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| language | English |
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| spelling | Herman, Irving P. Verfasser aut Optical diagnostics for thin film processing Irving P. Herman San Diego, CA Academic Press c1996 1 Online-Ressource (xxix, 783 p.) txt rdacontent c rdamedia cr rdacarrier This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. Key Features * The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing * Useful as an introduction to the subject or as a resource handbook * Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing * Examples emphasize applications in microelectronics and optoelectronics * Introductory chapter serves as a guide to all optical diagnostics and their applications * Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic Includes bibliographical references and index Thin films TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Optische Eigenschaft (DE-588)4123887-4 gnd rswk-swf Electronic books Dünne Schicht (DE-588)4136925-7 s Optische Eigenschaft (DE-588)4123887-4 s 1\p DE-604 http://www.sciencedirect.com/science/book/9780123420701 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Herman, Irving P. Optical diagnostics for thin film processing Thin films TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd Optische Eigenschaft (DE-588)4123887-4 gnd |
| subject_GND | (DE-588)4136925-7 (DE-588)4123887-4 |
| title | Optical diagnostics for thin film processing |
| title_auth | Optical diagnostics for thin film processing |
| title_exact_search | Optical diagnostics for thin film processing |
| title_full | Optical diagnostics for thin film processing Irving P. Herman |
| title_fullStr | Optical diagnostics for thin film processing Irving P. Herman |
| title_full_unstemmed | Optical diagnostics for thin film processing Irving P. Herman |
| title_short | Optical diagnostics for thin film processing |
| title_sort | optical diagnostics for thin film processing |
| topic | Thin films TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht (DE-588)4136925-7 gnd Optische Eigenschaft (DE-588)4123887-4 gnd |
| topic_facet | Thin films TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Thin films Surfaces Spectrum analysis Industrial applications Dünne Schicht Optische Eigenschaft |
| url | http://www.sciencedirect.com/science/book/9780123420701 |
| work_keys_str_mv | AT hermanirvingp opticaldiagnosticsforthinfilmprocessing |