PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
San Diego
Academic Press
c1999
|
| Schriftenreihe: | Thin films (San Diego, Calif.)
v. 26 |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts Includes bibliographical references and indexes |
| Beschreibung: | 1 Online-Ressource (xiii, 419 p.) |
| ISBN: | 9780125330268 012533026X |
Internformat
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| 245 | 1 | 0 | |a PVD for microelectronics |b sputter deposition applied to semiconductor manufacturing |c Ronald A. Powell, Stephen M. Rossnagel |
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| 490 | 0 | |a Thin films (San Diego, Calif.) |v v. 26 | |
| 500 | |a GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts | ||
| 500 | |a Includes bibliographical references and indexes | ||
| 650 | 7 | |a Física geral |2 larpcal | |
| 650 | 7 | |a Thin film devices / Design and construction |2 fast | |
| 650 | 7 | |a Thin films |2 fast | |
| 650 | 7 | |a Vapor-plating |2 fast | |
| 650 | 4 | |a Thin film devices |x Design and construction | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 4 | |a Thin films | |
| 650 | 0 | 7 | |a PVD-Verfahren |0 (DE-588)4115673-0 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
| _version_ | 1804152912916512768 |
|---|---|
| any_adam_object | |
| author | Powell, Ronald A. |
| author_GND | (DE-588)1158086601 |
| author_facet | Powell, Ronald A. |
| author_role | aut |
| author_sort | Powell, Ronald A. |
| author_variant | r a p ra rap |
| building | Verbundindex |
| bvnumber | BV042316979 |
| collection | ZDB-33-ESD ZDB-33-EBS |
| ctrlnum | (OCoLC)162128950 (DE-599)BVBBV042316979 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV042316979 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:18:15Z |
| institution | BVB |
| isbn | 9780125330268 012533026X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027753970 |
| oclc_num | 162128950 |
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| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xiii, 419 p.) |
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| publishDate | 1999 |
| publishDateSearch | 1999 |
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| publisher | Academic Press |
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| series2 | Thin films (San Diego, Calif.) |
| spelling | Powell, Ronald A. Verfasser aut PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel San Diego Academic Press c1999 1 Online-Ressource (xiii, 419 p.) txt rdacontent c rdamedia cr rdacarrier Thin films (San Diego, Calif.) v. 26 GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts Includes bibliographical references and indexes Física geral larpcal Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf PVD-Verfahren (DE-588)4115673-0 s Mikroelektronik (DE-588)4039207-7 s 1\p DE-604 Rossnagel, Stephen M. Sonstige (DE-588)1158086601 oth http://www.sciencedirect.com/science/book/9780125330268 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Powell, Ronald A. PVD for microelectronics sputter deposition applied to semiconductor manufacturing Física geral larpcal Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| subject_GND | (DE-588)4115673-0 (DE-588)4039207-7 |
| title | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_auth | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_exact_search | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_full | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_fullStr | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_full_unstemmed | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_short | PVD for microelectronics |
| title_sort | pvd for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_sub | sputter deposition applied to semiconductor manufacturing |
| topic | Física geral larpcal Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| topic_facet | Física geral Thin film devices / Design and construction Thin films Vapor-plating Thin film devices Design and construction PVD-Verfahren Mikroelektronik |
| url | http://www.sciencedirect.com/science/book/9780125330268 |
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