Handbook of VLSI microlithography: principles, technology, and applications
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, N.J.
Noyes Publications
c2001
|
| Ausgabe: | 2nd ed |
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource (xxi, 1001 p.) |
| ISBN: | 1591242754 9781591242758 9780815514442 0815514441 9780815517795 0815517793 9780815517801 |
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| 250 | |a 2nd ed | ||
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| 500 | |a Includes bibliographical references and index | ||
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Datensatz im Suchindex
| _version_ | 1804152909433143296 |
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| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV042315371 |
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| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | 2nd ed |
| format | Electronic eBook |
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| id | DE-604.BV042315371 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:18:12Z |
| institution | BVB |
| isbn | 1591242754 9781591242758 9780815514442 0815514441 9780815517795 0815517793 9780815517801 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027752362 |
| oclc_num | 49708527 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xxi, 1001 p.) |
| psigel | ZDB-33-ESD ZDB-33-EBS FAW_PDA_ESD FLA_PDA_ESD |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | Noyes Publications |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Handbook of VLSI microlithography principles, technology, and applications edited by John N. Helbert 2nd ed Park Ridge, N.J. Noyes Publications c2001 1 Online-Ressource (xxi, 1001 p.) txt rdacontent c rdamedia cr rdacarrier Materials science and process technology series This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production Includes bibliographical references and index TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Integrated circuits / Very large scale integration fast Microlithography fast Integrated circuits Very large scale integration Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf VLSI (DE-588)4117388-0 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s 1\p DE-604 Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 2\p DE-604 Elektronenstrahllithografie (DE-588)4151897-4 s 3\p DE-604 Helbert, John N. Sonstige oth http://www.sciencedirect.com/science/book/9780815514442 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Handbook of VLSI microlithography principles, technology, and applications TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Integrated circuits / Very large scale integration fast Microlithography fast Integrated circuits Very large scale integration Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd VLSI (DE-588)4117388-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4117388-0 (DE-588)4191584-7 (DE-588)4151897-4 |
| title | Handbook of VLSI microlithography principles, technology, and applications |
| title_auth | Handbook of VLSI microlithography principles, technology, and applications |
| title_exact_search | Handbook of VLSI microlithography principles, technology, and applications |
| title_full | Handbook of VLSI microlithography principles, technology, and applications edited by John N. Helbert |
| title_fullStr | Handbook of VLSI microlithography principles, technology, and applications edited by John N. Helbert |
| title_full_unstemmed | Handbook of VLSI microlithography principles, technology, and applications edited by John N. Helbert |
| title_short | Handbook of VLSI microlithography |
| title_sort | handbook of vlsi microlithography principles technology and applications |
| title_sub | principles, technology, and applications |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Integrated circuits / Very large scale integration fast Microlithography fast Integrated circuits Very large scale integration Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd VLSI (DE-588)4117388-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General Integrated circuits / Very large scale integration Microlithography Integrated circuits Very large scale integration Fotolithografie Halbleitertechnologie VLSI Lithografie Halbleitertechnologie Elektronenstrahllithografie |
| url | http://www.sciencedirect.com/science/book/9780815514442 |
| work_keys_str_mv | AT helbertjohnn handbookofvlsimicrolithographyprinciplestechnologyandapplications |