Advances in CMP/polishing technologies for the manufacture of electronic devices:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Oxford
William Andrew
2012
|
| Ausgabe: | 1st ed |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | Includes index CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community |
| Beschreibung: | 1 Online-Ressource (xii, 317 p.) |
| ISBN: | 9781437778595 1437778593 |
Internformat
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| 245 | 1 | 0 | |a Advances in CMP/polishing technologies for the manufacture of electronic devices |c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa |
| 250 | |a 1st ed | ||
| 264 | 1 | |a Oxford |b William Andrew |c 2012 | |
| 300 | |a 1 Online-Ressource (xii, 317 p.) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a Includes index | ||
| 500 | |a CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community | ||
| 650 | 7 | |a Electrolytic polishing |2 fast | |
| 650 | 7 | |a Grinding and polishing |2 fast | |
| 650 | 4 | |a Electrolytic polishing | |
| 650 | 4 | |a Grinding and polishing | |
| 700 | 1 | |a Doi, Toshiro |e Sonstige |4 oth | |
| 700 | 1 | |a Marinescu, Ioan D. |e Sonstige |4 oth | |
| 700 | 1 | |a Kurokawa, Syuhei |e Sonstige |4 oth | |
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Datensatz im Suchindex
| _version_ | 1804152908549193728 |
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| building | Verbundindex |
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| dewey-full | 671.7/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 671 - Metalworking & primary metal products |
| dewey-raw | 671.7/2 |
| dewey-search | 671.7/2 |
| dewey-sort | 3671.7 12 |
| dewey-tens | 670 - Manufacturing |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| edition | 1st ed |
| format | Electronic eBook |
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| id | DE-604.BV042314926 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:18:11Z |
| institution | BVB |
| isbn | 9781437778595 1437778593 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027751917 |
| oclc_num | 769153733 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xii, 317 p.) |
| psigel | ZDB-33-ESD ZDB-33-EBS FAW_PDA_ESD FLA_PDA_ESD |
| publishDate | 2012 |
| publishDateSearch | 2012 |
| publishDateSort | 2012 |
| publisher | William Andrew |
| record_format | marc |
| spelling | Advances in CMP/polishing technologies for the manufacture of electronic devices edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa 1st ed Oxford William Andrew 2012 1 Online-Ressource (xii, 317 p.) txt rdacontent c rdamedia cr rdacarrier Includes index CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community Electrolytic polishing fast Grinding and polishing fast Electrolytic polishing Grinding and polishing Doi, Toshiro Sonstige oth Marinescu, Ioan D. Sonstige oth Kurokawa, Syuhei Sonstige oth http://www.sciencedirect.com/science/book/9781437778595 Verlag Volltext |
| spellingShingle | Advances in CMP/polishing technologies for the manufacture of electronic devices Electrolytic polishing fast Grinding and polishing fast Electrolytic polishing Grinding and polishing |
| title | Advances in CMP/polishing technologies for the manufacture of electronic devices |
| title_auth | Advances in CMP/polishing technologies for the manufacture of electronic devices |
| title_exact_search | Advances in CMP/polishing technologies for the manufacture of electronic devices |
| title_full | Advances in CMP/polishing technologies for the manufacture of electronic devices edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa |
| title_fullStr | Advances in CMP/polishing technologies for the manufacture of electronic devices edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa |
| title_full_unstemmed | Advances in CMP/polishing technologies for the manufacture of electronic devices edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa |
| title_short | Advances in CMP/polishing technologies for the manufacture of electronic devices |
| title_sort | advances in cmp polishing technologies for the manufacture of electronic devices |
| topic | Electrolytic polishing fast Grinding and polishing fast Electrolytic polishing Grinding and polishing |
| topic_facet | Electrolytic polishing Grinding and polishing |
| url | http://www.sciencedirect.com/science/book/9781437778595 |
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