Vacuum technology, thin films, and sputtering: an introduction
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
New York
Academic Press
1983
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Schlagworte: | |
Online-Zugang: | FAW01 Volltext |
Beschreibung: | Includes index Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee |
Beschreibung: | 1 Online-Ressource (viii, 151 pages) |
ISBN: | 0126747806 0323139159 9780126747805 9780323139151 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV042312208 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 150129s1983 |||| o||u| ||||||eng d | ||
020 | |a 0126747806 |9 0-12-674780-6 | ||
020 | |a 0323139159 |c electronic bk. |9 0-323-13915-9 | ||
020 | |a 9780126747805 |9 978-0-12-674780-5 | ||
020 | |a 9780323139151 |c electronic bk. |9 978-0-323-13915-1 | ||
035 | |a (OCoLC)562138841 | ||
035 | |a (DE-599)BVBBV042312208 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-1046 | ||
082 | 0 | |a 621.5/5 |2 19eng | |
100 | 1 | |a Stuart, R. V. |e Verfasser |4 aut | |
245 | 1 | 0 | |a Vacuum technology, thin films, and sputtering |b an introduction |c R.V. Stuart |
264 | 1 | |a New York |b Academic Press |c 1983 | |
300 | |a 1 Online-Ressource (viii, 151 pages) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a Includes index | ||
500 | |a Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee | ||
650 | 4 | |a Physics / Vacuum technology | |
650 | 4 | |a Vide (Technologie) | |
650 | 4 | |a Couches minces | |
650 | 4 | |a Pulvérisation cathodique / Applications industrielles | |
650 | 7 | |a Vacuümtechniek |2 gtt | |
650 | 7 | |a Verstuiven |2 gtt | |
650 | 7 | |a Dunne films |2 gtt | |
650 | 7 | |a Tecnologia De Valvulas Eletronicas |2 larpcal | |
650 | 7 | |a Refrigeracao E Ar Comprimido |2 larpcal | |
650 | 7 | |a TECHNOLOGY & ENGINEERING / Mechanical |2 bisacsh | |
650 | 7 | |a Cathode sputtering (Plating process) |2 fast | |
650 | 7 | |a Thin films |2 fast | |
650 | 7 | |a Vacuum technology |2 fast | |
650 | 4 | |a Vacuum technology | |
650 | 4 | |a Thin films | |
650 | 4 | |a Cathode sputtering (Plating process) | |
650 | 0 | 7 | |a Vakuumtechnik |0 (DE-588)4062270-8 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Zerstäubung |0 (DE-588)4067687-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Sputtern |0 (DE-588)4182614-0 |D s |
689 | 0 | |8 1\p |5 DE-604 | |
689 | 1 | 0 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
689 | 1 | |8 2\p |5 DE-604 | |
689 | 2 | 0 | |a Vakuumtechnik |0 (DE-588)4062270-8 |D s |
689 | 2 | |8 3\p |5 DE-604 | |
689 | 3 | 0 | |a Zerstäubung |0 (DE-588)4067687-0 |D s |
689 | 3 | |8 4\p |5 DE-604 | |
856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780126747805 |x Verlag |3 Volltext |
912 | |a ZDB-33-ESD | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-027749199 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 3\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 4\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
966 | e | |u http://www.sciencedirect.com/science/book/9780126747805 |l FAW01 |p ZDB-33-ESD |q FAW_PDA_ESD |x Verlag |3 Volltext |
Datensatz im Suchindex
_version_ | 1804152902672973824 |
---|---|
any_adam_object | |
author | Stuart, R. V. |
author_facet | Stuart, R. V. |
author_role | aut |
author_sort | Stuart, R. V. |
author_variant | r v s rv rvs |
building | Verbundindex |
bvnumber | BV042312208 |
collection | ZDB-33-ESD |
ctrlnum | (OCoLC)562138841 (DE-599)BVBBV042312208 |
dewey-full | 621.5/5 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.5/5 |
dewey-search | 621.5/5 |
dewey-sort | 3621.5 15 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Maschinenbau / Maschinenwesen |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03324nmm a2200745zc 4500</leader><controlfield tag="001">BV042312208</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s1983 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0126747806</subfield><subfield code="9">0-12-674780-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0323139159</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">0-323-13915-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780126747805</subfield><subfield code="9">978-0-12-674780-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780323139151</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-0-323-13915-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)562138841</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042312208</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.5/5</subfield><subfield code="2">19eng</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Stuart, R. V.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Vacuum technology, thin films, and sputtering</subfield><subfield code="b">an introduction</subfield><subfield code="c">R.V. Stuart</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Academic Press</subfield><subfield code="c">1983</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (viii, 151 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics / Vacuum technology</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vide (Technologie)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Couches minces</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Pulvérisation cathodique / Applications industrielles</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Vacuümtechniek</subfield><subfield code="2">gtt</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Verstuiven</subfield><subfield code="2">gtt</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Dunne films</subfield><subfield code="2">gtt</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Tecnologia De Valvulas Eletronicas</subfield><subfield code="2">larpcal</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Refrigeracao E Ar Comprimido</subfield><subfield code="2">larpcal</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mechanical</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Cathode sputtering (Plating process)</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Thin films</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Vacuum technology</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vacuum technology</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Cathode sputtering (Plating process)</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Vakuumtechnik</subfield><subfield code="0">(DE-588)4062270-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Zerstäubung</subfield><subfield code="0">(DE-588)4067687-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Vakuumtechnik</subfield><subfield code="0">(DE-588)4062270-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="8">3\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Zerstäubung</subfield><subfield code="0">(DE-588)4067687-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="8">4\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780126747805</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027749199</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">3\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">4\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/book/9780126747805</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FAW_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
id | DE-604.BV042312208 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:18:06Z |
institution | BVB |
isbn | 0126747806 0323139159 9780126747805 9780323139151 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027749199 |
oclc_num | 562138841 |
open_access_boolean | |
owner | DE-1046 |
owner_facet | DE-1046 |
physical | 1 Online-Ressource (viii, 151 pages) |
psigel | ZDB-33-ESD ZDB-33-ESD FAW_PDA_ESD |
publishDate | 1983 |
publishDateSearch | 1983 |
publishDateSort | 1983 |
publisher | Academic Press |
record_format | marc |
spelling | Stuart, R. V. Verfasser aut Vacuum technology, thin films, and sputtering an introduction R.V. Stuart New York Academic Press 1983 1 Online-Ressource (viii, 151 pages) txt rdacontent c rdamedia cr rdacarrier Includes index Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee Physics / Vacuum technology Vide (Technologie) Couches minces Pulvérisation cathodique / Applications industrielles Vacuümtechniek gtt Verstuiven gtt Dunne films gtt Tecnologia De Valvulas Eletronicas larpcal Refrigeracao E Ar Comprimido larpcal TECHNOLOGY & ENGINEERING / Mechanical bisacsh Cathode sputtering (Plating process) fast Thin films fast Vacuum technology fast Vacuum technology Thin films Cathode sputtering (Plating process) Vakuumtechnik (DE-588)4062270-8 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Zerstäubung (DE-588)4067687-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Sputtern (DE-588)4182614-0 s 1\p DE-604 Dünnschichttechnik (DE-588)4136339-5 s 2\p DE-604 Vakuumtechnik (DE-588)4062270-8 s 3\p DE-604 Zerstäubung (DE-588)4067687-0 s 4\p DE-604 http://www.sciencedirect.com/science/book/9780126747805 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Stuart, R. V. Vacuum technology, thin films, and sputtering an introduction Physics / Vacuum technology Vide (Technologie) Couches minces Pulvérisation cathodique / Applications industrielles Vacuümtechniek gtt Verstuiven gtt Dunne films gtt Tecnologia De Valvulas Eletronicas larpcal Refrigeracao E Ar Comprimido larpcal TECHNOLOGY & ENGINEERING / Mechanical bisacsh Cathode sputtering (Plating process) fast Thin films fast Vacuum technology fast Vacuum technology Thin films Cathode sputtering (Plating process) Vakuumtechnik (DE-588)4062270-8 gnd Sputtern (DE-588)4182614-0 gnd Zerstäubung (DE-588)4067687-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd |
subject_GND | (DE-588)4062270-8 (DE-588)4182614-0 (DE-588)4067687-0 (DE-588)4136339-5 |
title | Vacuum technology, thin films, and sputtering an introduction |
title_auth | Vacuum technology, thin films, and sputtering an introduction |
title_exact_search | Vacuum technology, thin films, and sputtering an introduction |
title_full | Vacuum technology, thin films, and sputtering an introduction R.V. Stuart |
title_fullStr | Vacuum technology, thin films, and sputtering an introduction R.V. Stuart |
title_full_unstemmed | Vacuum technology, thin films, and sputtering an introduction R.V. Stuart |
title_short | Vacuum technology, thin films, and sputtering |
title_sort | vacuum technology thin films and sputtering an introduction |
title_sub | an introduction |
topic | Physics / Vacuum technology Vide (Technologie) Couches minces Pulvérisation cathodique / Applications industrielles Vacuümtechniek gtt Verstuiven gtt Dunne films gtt Tecnologia De Valvulas Eletronicas larpcal Refrigeracao E Ar Comprimido larpcal TECHNOLOGY & ENGINEERING / Mechanical bisacsh Cathode sputtering (Plating process) fast Thin films fast Vacuum technology fast Vacuum technology Thin films Cathode sputtering (Plating process) Vakuumtechnik (DE-588)4062270-8 gnd Sputtern (DE-588)4182614-0 gnd Zerstäubung (DE-588)4067687-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd |
topic_facet | Physics / Vacuum technology Vide (Technologie) Couches minces Pulvérisation cathodique / Applications industrielles Vacuümtechniek Verstuiven Dunne films Tecnologia De Valvulas Eletronicas Refrigeracao E Ar Comprimido TECHNOLOGY & ENGINEERING / Mechanical Cathode sputtering (Plating process) Thin films Vacuum technology Vakuumtechnik Sputtern Zerstäubung Dünnschichttechnik |
url | http://www.sciencedirect.com/science/book/9780126747805 |
work_keys_str_mv | AT stuartrv vacuumtechnologythinfilmsandsputteringanintroduction |