Ion implantation technology-92: proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Amsterdam
North-Holland
1993
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| Schlagworte: | |
| Online-Zugang: | FAW01 Volltext |
| Beschreibung: | Includes bibliographical references and index Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models |
| Beschreibung: | 1 Online-Ressource (xvii, 697 p.) |
| ISBN: | 0444599800 0444899944 9780444599803 9780444899941 |
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| 245 | 1 | 0 | |a Ion implantation technology-92 |b proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 |c editors, D.F. Downey ... [et al.] |
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| 500 | |a Includes bibliographical references and index | ||
| 500 | |a Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models | ||
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| 650 | 7 | |a Semiconductor doping |2 fast | |
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| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| spelling | International Conference on Ion Implantation Technology < 1992, Gainesville, Fla.> Verfasser aut Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 editors, D.F. Downey ... [et al.] Amsterdam North-Holland 1993 1 Online-Ressource (xvii, 697 p.) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models Conference proceedings fast TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Ion implantation fast Semiconductor doping fast Semiconductors fast Semiconductors Congresses Ion implantation Congresses Semiconductor doping Congresses (DE-588)1071861417 Konferenzschrift gnd-content Downey, D. F. Sonstige oth http://www.sciencedirect.com/science/book/9780444899941 Verlag Volltext |
| spellingShingle | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 Conference proceedings fast TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Ion implantation fast Semiconductor doping fast Semiconductors fast Semiconductors Congresses Ion implantation Congresses Semiconductor doping Congresses |
| subject_GND | (DE-588)1071861417 |
| title | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 |
| title_auth | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 |
| title_exact_search | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 |
| title_full | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 editors, D.F. Downey ... [et al.] |
| title_fullStr | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 editors, D.F. Downey ... [et al.] |
| title_full_unstemmed | Ion implantation technology-92 proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 editors, D.F. Downey ... [et al.] |
| title_short | Ion implantation technology-92 |
| title_sort | ion implantation technology 92 proceedings of the ninth international conference on ion implantation technology gainesvile fl usa september 20 24 1992 |
| title_sub | proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 |
| topic | Conference proceedings fast TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Ion implantation fast Semiconductor doping fast Semiconductors fast Semiconductors Congresses Ion implantation Congresses Semiconductor doping Congresses |
| topic_facet | Conference proceedings TECHNOLOGY & ENGINEERING / Electronics / Semiconductors TECHNOLOGY & ENGINEERING / Electronics / Solid State Ion implantation Semiconductor doping Semiconductors Semiconductors Congresses Ion implantation Congresses Semiconductor doping Congresses Konferenzschrift |
| url | http://www.sciencedirect.com/science/book/9780444899941 |
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