Impurity doping processes in silicon:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
[S.l.]
North Holland
1981
|
| Schriftenreihe: | Materials processing, theory and practices
v. 2 |
| Schlagworte: | |
| Online-Zugang: | FAW01 Volltext |
| Beschreibung: | This book introduces to non-experts several important processes of impurity doping in silicon and goes on to discuss the methods of determination of the concentration of dopants in silicon. The conventional method used is the discussion process, but, since it has been sufficiently covered in many texts, this work describes the double-diffusion method |
| Beschreibung: | 1 Online-Ressource (1 online resource) |
| ISBN: | 0444860959 9780444860958 |
Internformat
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| 300 | |a 1 Online-Ressource (1 online resource) | ||
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| 337 | |b c |2 rdamedia | ||
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| 490 | 0 | |a Materials processing, theory and practices |v v. 2 | |
| 500 | |a This book introduces to non-experts several important processes of impurity doping in silicon and goes on to discuss the methods of determination of the concentration of dopants in silicon. The conventional method used is the discussion process, but, since it has been sufficiently covered in many texts, this work describes the double-diffusion method | ||
| 650 | 7 | |a Semiconductor doping |2 fast | |
| 650 | 4 | |a Semiconductor doping | |
| 650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dotierung |0 (DE-588)4130672-7 |2 gnd |9 rswk-swf |
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| 689 | 0 | |8 2\p |5 DE-604 | |
| 700 | 1 | |a Wang, Franklin F. Y. |e Sonstige |4 oth | |
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Datensatz im Suchindex
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| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:18:03Z |
| institution | BVB |
| isbn | 0444860959 9780444860958 |
| language | English |
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| publishDate | 1981 |
| publishDateSearch | 1981 |
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| publisher | North Holland |
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| series2 | Materials processing, theory and practices |
| spelling | Impurity doping processes in silicon edited by F.F.Y. Wang [S.l.] North Holland 1981 1 Online-Ressource (1 online resource) txt rdacontent c rdamedia cr rdacarrier Materials processing, theory and practices v. 2 This book introduces to non-experts several important processes of impurity doping in silicon and goes on to discuss the methods of determination of the concentration of dopants in silicon. The conventional method used is the discussion process, but, since it has been sufficiently covered in many texts, this work describes the double-diffusion method Semiconductor doping fast Semiconductor doping Silicium (DE-588)4077445-4 gnd rswk-swf Dotierung (DE-588)4130672-7 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Dotierung (DE-588)4130672-7 s Silicium (DE-588)4077445-4 s 2\p DE-604 Wang, Franklin F. Y. Sonstige oth http://www.sciencedirect.com/science/book/9780444860958 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Impurity doping processes in silicon Semiconductor doping fast Semiconductor doping Silicium (DE-588)4077445-4 gnd Dotierung (DE-588)4130672-7 gnd |
| subject_GND | (DE-588)4077445-4 (DE-588)4130672-7 (DE-588)4143413-4 |
| title | Impurity doping processes in silicon |
| title_auth | Impurity doping processes in silicon |
| title_exact_search | Impurity doping processes in silicon |
| title_full | Impurity doping processes in silicon edited by F.F.Y. Wang |
| title_fullStr | Impurity doping processes in silicon edited by F.F.Y. Wang |
| title_full_unstemmed | Impurity doping processes in silicon edited by F.F.Y. Wang |
| title_short | Impurity doping processes in silicon |
| title_sort | impurity doping processes in silicon |
| topic | Semiconductor doping fast Semiconductor doping Silicium (DE-588)4077445-4 gnd Dotierung (DE-588)4130672-7 gnd |
| topic_facet | Semiconductor doping Silicium Dotierung Aufsatzsammlung |
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