Plasma etching: an introduction
Saved in:
| Format: | Electronic eBook |
|---|---|
| Language: | English |
| Published: |
Boston
Academic Press
c1989
|
| Series: | Plasma--materials interactions
|
| Subjects: | |
| Online Access: | FAW01 Volltext |
| Item Description: | Includes bibliographical references and index Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods |
| Physical Description: | 1 Online-Ressource (xii, 476 p.) |
| ISBN: | 0080924468 0124693709 9780080924465 9780124693708 |
Staff View
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Record in the Search Index
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| building | Verbundindex |
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| dewey-full | 621.044 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.044 |
| dewey-search | 621.044 |
| dewey-sort | 3621.044 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| format | Electronic eBook |
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| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:17:59Z |
| institution | BVB |
| isbn | 0080924468 0124693709 9780080924465 9780124693708 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027745898 |
| oclc_num | 838102270 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xii, 476 p.) |
| psigel | ZDB-33-ESD ZDB-33-ESD FAW_PDA_ESD |
| publishDate | 1989 |
| publishDateSearch | 1989 |
| publishDateSort | 1989 |
| publisher | Academic Press |
| record_format | marc |
| series2 | Plasma--materials interactions |
| spelling | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm Boston Academic Press c1989 1 Online-Ressource (xii, 476 p.) txt rdacontent c rdamedia cr rdacarrier Plasma--materials interactions Includes bibliographical references and index Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 s 1\p DE-604 Manos, Dennis M. Sonstige oth Flamm, Daniel L. Sonstige oth http://www.sciencedirect.com/science/book/9780124693708 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Plasma etching an introduction Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd |
| subject_GND | (DE-588)4174821-9 |
| title | Plasma etching an introduction |
| title_auth | Plasma etching an introduction |
| title_exact_search | Plasma etching an introduction |
| title_full | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_fullStr | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_full_unstemmed | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_short | Plasma etching |
| title_sort | plasma etching an introduction |
| title_sub | an introduction |
| topic | Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd |
| topic_facet | Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical Plasma etching Plasmaätzen |
| url | http://www.sciencedirect.com/science/book/9780124693708 |
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