Plasma etching: an introduction
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boston
Academic Press
c1989
|
| Schriftenreihe: | Plasma--materials interactions
|
| Schlagworte: | |
| Online-Zugang: | FAW01 Volltext |
| Beschreibung: | Includes bibliographical references and index Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods |
| Beschreibung: | 1 Online-Ressource (xii, 476 p.) |
| ISBN: | 0080924468 0124693709 9780080924465 9780124693708 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV042308906 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150129s1989 |||| o||u| ||||||eng d | ||
| 020 | |a 0080924468 |c electronic bk. |9 0-08-092446-8 | ||
| 020 | |a 0124693709 |9 0-12-469370-9 | ||
| 020 | |a 9780080924465 |c electronic bk. |9 978-0-08-092446-5 | ||
| 020 | |a 9780124693708 |9 978-0-12-469370-8 | ||
| 035 | |a (OCoLC)838102270 | ||
| 035 | |a (DE-599)BVBBV042308906 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 | ||
| 082 | 0 | |a 621.044 |2 22 | |
| 245 | 1 | 0 | |a Plasma etching |b an introduction |c edited by Dennis M. Manos, Daniel L. Flamm |
| 264 | 1 | |a Boston |b Academic Press |c c1989 | |
| 300 | |a 1 Online-Ressource (xii, 476 p.) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Plasma--materials interactions | |
| 500 | |a Includes bibliographical references and index | ||
| 500 | |a Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods | ||
| 650 | 4 | |a Gravure par plasma | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Mechanical |2 bisacsh | |
| 650 | 7 | |a Plasma etching |2 fast | |
| 650 | 4 | |a Plasma etching | |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 700 | 1 | |a Manos, Dennis M. |e Sonstige |4 oth | |
| 700 | 1 | |a Flamm, Daniel L. |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780124693708 |x Verlag |3 Volltext |
| 912 | |a ZDB-33-ESD | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027745898 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u http://www.sciencedirect.com/science/book/9780124693708 |l FAW01 |p ZDB-33-ESD |q FAW_PDA_ESD |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804152895738740736 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV042308906 |
| collection | ZDB-33-ESD |
| ctrlnum | (OCoLC)838102270 (DE-599)BVBBV042308906 |
| dewey-full | 621.044 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.044 |
| dewey-search | 621.044 |
| dewey-sort | 3621.044 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02151nmm a2200481zc 4500</leader><controlfield tag="001">BV042308906</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s1989 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0080924468</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">0-08-092446-8</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0124693709</subfield><subfield code="9">0-12-469370-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780080924465</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-0-08-092446-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780124693708</subfield><subfield code="9">978-0-12-469370-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)838102270</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042308906</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.044</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma etching</subfield><subfield code="b">an introduction</subfield><subfield code="c">edited by Dennis M. Manos, Daniel L. Flamm</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston</subfield><subfield code="b">Academic Press</subfield><subfield code="c">c1989</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xii, 476 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Plasma--materials interactions</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Gravure par plasma</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Mechanical</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Manos, Dennis M.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Flamm, Daniel L.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780124693708</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027745898</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/book/9780124693708</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FAW_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV042308906 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:17:59Z |
| institution | BVB |
| isbn | 0080924468 0124693709 9780080924465 9780124693708 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027745898 |
| oclc_num | 838102270 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xii, 476 p.) |
| psigel | ZDB-33-ESD ZDB-33-ESD FAW_PDA_ESD |
| publishDate | 1989 |
| publishDateSearch | 1989 |
| publishDateSort | 1989 |
| publisher | Academic Press |
| record_format | marc |
| series2 | Plasma--materials interactions |
| spelling | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm Boston Academic Press c1989 1 Online-Ressource (xii, 476 p.) txt rdacontent c rdamedia cr rdacarrier Plasma--materials interactions Includes bibliographical references and index Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 s 1\p DE-604 Manos, Dennis M. Sonstige oth Flamm, Daniel L. Sonstige oth http://www.sciencedirect.com/science/book/9780124693708 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Plasma etching an introduction Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd |
| subject_GND | (DE-588)4174821-9 |
| title | Plasma etching an introduction |
| title_auth | Plasma etching an introduction |
| title_exact_search | Plasma etching an introduction |
| title_full | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_fullStr | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_full_unstemmed | Plasma etching an introduction edited by Dennis M. Manos, Daniel L. Flamm |
| title_short | Plasma etching |
| title_sort | plasma etching an introduction |
| title_sub | an introduction |
| topic | Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical bisacsh Plasma etching fast Plasma etching Plasmaätzen (DE-588)4174821-9 gnd |
| topic_facet | Gravure par plasma TECHNOLOGY & ENGINEERING / Mechanical Plasma etching Plasmaätzen |
| url | http://www.sciencedirect.com/science/book/9780124693708 |
| work_keys_str_mv | AT manosdennism plasmaetchinganintroduction AT flammdaniell plasmaetchinganintroduction |