Electron-beam technology in microelectronic fabrication:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York
Academic Press
1980
|
| Schlagworte: | |
| Online-Zugang: | FAW01 Volltext |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource (xi, 362 pages) |
| ISBN: | 012133550X 0323153410 9780121335502 9780323153416 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV042308601 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150129s1980 |||| o||u| ||||||eng d | ||
| 020 | |a 012133550X |9 0-12-133550-X | ||
| 020 | |a 0323153410 |c electronic bk. |9 0-323-15341-0 | ||
| 020 | |a 9780121335502 |9 978-0-12-133550-2 | ||
| 020 | |a 9780323153416 |c electronic bk. |9 978-0-323-15341-6 | ||
| 035 | |a (OCoLC)557491279 | ||
| 035 | |a (DE-599)BVBBV042308601 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 | ||
| 082 | 0 | |a 621.381/7 |2 19eng | |
| 245 | 1 | 0 | |a Electron-beam technology in microelectronic fabrication |c edited by George R. Brewer ; contributors, J.P. Ballantyne [and others] |
| 264 | 1 | |a New York |b Academic Press |c 1980 | |
| 300 | |a 1 Online-Ressource (xi, 362 pages) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 500 | |a Includes bibliographical references and index | ||
| 650 | 4 | |a Microélectronique | |
| 650 | 4 | |a Lithographie par faisceau d'électrons | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Digital |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Microelectronics |2 bisacsh | |
| 650 | 7 | |a Lithography, Electron beam |2 fast | |
| 650 | 7 | |a Microelectronics |2 fast | |
| 650 | 7 | |a Elektronenstrahllithographie |2 swd | |
| 650 | 7 | |a Mikroelektronik |2 swd | |
| 650 | 4 | |a Microelectronics | |
| 650 | 4 | |a Lithography, Electron beam | |
| 650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | 1 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 700 | 1 | |a Brewer, George Raymond |e Sonstige |4 oth | |
| 700 | 1 | |a Ballantyne, J. P. |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780121335502 |x Verlag |3 Volltext |
| 912 | |a ZDB-33-ESD | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027745593 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u http://www.sciencedirect.com/science/book/9780121335502 |l FAW01 |p ZDB-33-ESD |q FAW_PDA_ESD |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804152895172509696 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV042308601 |
| collection | ZDB-33-ESD |
| ctrlnum | (OCoLC)557491279 (DE-599)BVBBV042308601 |
| dewey-full | 621.381/7 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/7 |
| dewey-search | 621.381/7 |
| dewey-sort | 3621.381 17 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02242nmm a2200553zc 4500</leader><controlfield tag="001">BV042308601</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s1980 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">012133550X</subfield><subfield code="9">0-12-133550-X</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0323153410</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">0-323-15341-0</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780121335502</subfield><subfield code="9">978-0-12-133550-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780323153416</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-0-323-15341-6</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)557491279</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042308601</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/7</subfield><subfield code="2">19eng</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Electron-beam technology in microelectronic fabrication</subfield><subfield code="c">edited by George R. Brewer ; contributors, J.P. Ballantyne [and others]</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Academic Press</subfield><subfield code="c">1980</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xi, 362 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microélectronique</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithographie par faisceau d'électrons</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Digital</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Microelectronics</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Lithography, Electron beam</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Microelectronics</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Elektronenstrahllithographie</subfield><subfield code="2">swd</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="2">swd</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography, Electron beam</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Brewer, George Raymond</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Ballantyne, J. P.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780121335502</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027745593</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://www.sciencedirect.com/science/book/9780121335502</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-33-ESD</subfield><subfield code="q">FAW_PDA_ESD</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV042308601 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:17:58Z |
| institution | BVB |
| isbn | 012133550X 0323153410 9780121335502 9780323153416 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027745593 |
| oclc_num | 557491279 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xi, 362 pages) |
| psigel | ZDB-33-ESD ZDB-33-ESD FAW_PDA_ESD |
| publishDate | 1980 |
| publishDateSearch | 1980 |
| publishDateSort | 1980 |
| publisher | Academic Press |
| record_format | marc |
| spelling | Electron-beam technology in microelectronic fabrication edited by George R. Brewer ; contributors, J.P. Ballantyne [and others] New York Academic Press 1980 1 Online-Ressource (xi, 362 pages) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index Microélectronique Lithographie par faisceau d'électrons TECHNOLOGY & ENGINEERING / Electronics / Digital bisacsh TECHNOLOGY & ENGINEERING / Electronics / Microelectronics bisacsh Lithography, Electron beam fast Microelectronics fast Elektronenstrahllithographie swd Mikroelektronik swd Microelectronics Lithography, Electron beam Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 s Elektronenstrahllithografie (DE-588)4151897-4 s 1\p DE-604 Brewer, George Raymond Sonstige oth Ballantyne, J. P. Sonstige oth http://www.sciencedirect.com/science/book/9780121335502 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Electron-beam technology in microelectronic fabrication Microélectronique Lithographie par faisceau d'électrons TECHNOLOGY & ENGINEERING / Electronics / Digital bisacsh TECHNOLOGY & ENGINEERING / Electronics / Microelectronics bisacsh Lithography, Electron beam fast Microelectronics fast Elektronenstrahllithographie swd Mikroelektronik swd Microelectronics Lithography, Electron beam Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| subject_GND | (DE-588)4151897-4 (DE-588)4039207-7 |
| title | Electron-beam technology in microelectronic fabrication |
| title_auth | Electron-beam technology in microelectronic fabrication |
| title_exact_search | Electron-beam technology in microelectronic fabrication |
| title_full | Electron-beam technology in microelectronic fabrication edited by George R. Brewer ; contributors, J.P. Ballantyne [and others] |
| title_fullStr | Electron-beam technology in microelectronic fabrication edited by George R. Brewer ; contributors, J.P. Ballantyne [and others] |
| title_full_unstemmed | Electron-beam technology in microelectronic fabrication edited by George R. Brewer ; contributors, J.P. Ballantyne [and others] |
| title_short | Electron-beam technology in microelectronic fabrication |
| title_sort | electron beam technology in microelectronic fabrication |
| topic | Microélectronique Lithographie par faisceau d'électrons TECHNOLOGY & ENGINEERING / Electronics / Digital bisacsh TECHNOLOGY & ENGINEERING / Electronics / Microelectronics bisacsh Lithography, Electron beam fast Microelectronics fast Elektronenstrahllithographie swd Mikroelektronik swd Microelectronics Lithography, Electron beam Elektronenstrahllithografie (DE-588)4151897-4 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| topic_facet | Microélectronique Lithographie par faisceau d'électrons TECHNOLOGY & ENGINEERING / Electronics / Digital TECHNOLOGY & ENGINEERING / Electronics / Microelectronics Lithography, Electron beam Microelectronics Elektronenstrahllithographie Mikroelektronik Elektronenstrahllithografie |
| url | http://www.sciencedirect.com/science/book/9780121335502 |
| work_keys_str_mv | AT brewergeorgeraymond electronbeamtechnologyinmicroelectronicfabrication AT ballantynejp electronbeamtechnologyinmicroelectronicfabrication |