Handbook of chemical vapor depostion [i.e. deposition] (CVD): principles, technology, and applications
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Norwich, N.Y.
Noyes Publications/William Andrew Pub.
c1999
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| Ausgabe: | 2nd ed |
| Schriftenreihe: | Materials science and process technology series
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| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992 Paralleltitel: Handbook of chemical vapor deposition Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications Includes bibliographical references and index |
| Beschreibung: | 1 Online-Ressource (xxiv, 482 p.) |
| ISBN: | 9780815514329 0815514328 |
Internformat
MARC
| LEADER | 00000nmm a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV042304519 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 150129s1999 |||| o||u| ||||||eng d | ||
| 020 | |a 9780815514329 |9 978-0-8155-1432-9 | ||
| 020 | |a 0815514328 |9 0-8155-1432-8 | ||
| 035 | |a (OCoLC)281602520 | ||
| 035 | |a (DE-599)BVBBV042304519 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 | ||
| 082 | 0 | |a 671.7/35 |2 22 | |
| 100 | 1 | |a Pierson, Hugh O. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Handbook of chemical vapor depostion [i.e. deposition] (CVD) |b principles, technology, and applications |c by Hugh O. Pierson |
| 246 | 1 | 3 | |a Handbook of chemical vapor deposition |
| 250 | |a 2nd ed | ||
| 264 | 1 | |a Norwich, N.Y. |b Noyes Publications/William Andrew Pub. |c c1999 | |
| 300 | |a 1 Online-Ressource (xxiv, 482 p.) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Materials science and process technology series | |
| 500 | |a Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992 | ||
| 500 | |a Paralleltitel: Handbook of chemical vapor deposition | ||
| 500 | |a Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications | ||
| 500 | |a Includes bibliographical references and index | ||
| 650 | 7 | |a Handbooks, manuals, etc |2 fast | |
| 650 | 4 | |a Dépôt chimique en phase vapeur / Guides, manuels, etc | |
| 650 | 4 | |a Dépôt en phase vapeur / Guides, manuels, etc | |
| 650 | 7 | |a Chemical vapor deposition |2 fast | |
| 650 | 7 | |a Vapor-plating |2 fast | |
| 650 | 4 | |a Chemical vapor deposition |v Handbooks, manuals, etc | |
| 650 | 4 | |a Vapor-plating |v Handbooks, manuals, etc | |
| 700 | 1 | |a Pierson, Hugh O. |e Sonstige |4 oth | |
| 856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780815514329 |x Verlag |3 Volltext |
| 912 | |a ZDB-33-ESD |a ZDB-33-EBS | ||
| 940 | 1 | |q FAW_PDA_ESD | |
| 940 | 1 | |q FLA_PDA_ESD | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027741511 | ||
Datensatz im Suchindex
| _version_ | 1804152886609838080 |
|---|---|
| any_adam_object | |
| author | Pierson, Hugh O. |
| author_facet | Pierson, Hugh O. |
| author_role | aut |
| author_sort | Pierson, Hugh O. |
| author_variant | h o p ho hop |
| building | Verbundindex |
| bvnumber | BV042304519 |
| collection | ZDB-33-ESD ZDB-33-EBS |
| ctrlnum | (OCoLC)281602520 (DE-599)BVBBV042304519 |
| dewey-full | 671.7/35 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 671 - Metalworking & primary metal products |
| dewey-raw | 671.7/35 |
| dewey-search | 671.7/35 |
| dewey-sort | 3671.7 235 |
| dewey-tens | 670 - Manufacturing |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| edition | 2nd ed |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02648nmm a2200505zc 4500</leader><controlfield tag="001">BV042304519</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s1999 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780815514329</subfield><subfield code="9">978-0-8155-1432-9</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0815514328</subfield><subfield code="9">0-8155-1432-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)281602520</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042304519</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">671.7/35</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Pierson, Hugh O.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Handbook of chemical vapor depostion [i.e. deposition] (CVD)</subfield><subfield code="b">principles, technology, and applications</subfield><subfield code="c">by Hugh O. Pierson</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Handbook of chemical vapor deposition</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2nd ed</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Norwich, N.Y.</subfield><subfield code="b">Noyes Publications/William Andrew Pub.</subfield><subfield code="c">c1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xxiv, 482 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials science and process technology series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Paralleltitel: Handbook of chemical vapor deposition</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Handbooks, manuals, etc</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dépôt chimique en phase vapeur / Guides, manuels, etc</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dépôt en phase vapeur / Guides, manuels, etc</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Chemical vapor deposition</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Vapor-plating</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical vapor deposition</subfield><subfield code="v">Handbooks, manuals, etc</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield><subfield code="v">Handbooks, manuals, etc</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Pierson, Hugh O.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780815514329</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield><subfield code="a">ZDB-33-EBS</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FAW_PDA_ESD</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FLA_PDA_ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027741511</subfield></datafield></record></collection> |
| id | DE-604.BV042304519 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:17:50Z |
| institution | BVB |
| isbn | 9780815514329 0815514328 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027741511 |
| oclc_num | 281602520 |
| open_access_boolean | |
| owner | DE-1046 |
| owner_facet | DE-1046 |
| physical | 1 Online-Ressource (xxiv, 482 p.) |
| psigel | ZDB-33-ESD ZDB-33-EBS FAW_PDA_ESD FLA_PDA_ESD |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Noyes Publications/William Andrew Pub. |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Pierson, Hugh O. Verfasser aut Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications by Hugh O. Pierson Handbook of chemical vapor deposition 2nd ed Norwich, N.Y. Noyes Publications/William Andrew Pub. c1999 1 Online-Ressource (xxiv, 482 p.) txt rdacontent c rdamedia cr rdacarrier Materials science and process technology series Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992 Paralleltitel: Handbook of chemical vapor deposition Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications Includes bibliographical references and index Handbooks, manuals, etc fast Dépôt chimique en phase vapeur / Guides, manuels, etc Dépôt en phase vapeur / Guides, manuels, etc Chemical vapor deposition fast Vapor-plating fast Chemical vapor deposition Handbooks, manuals, etc Vapor-plating Handbooks, manuals, etc Pierson, Hugh O. Sonstige oth http://www.sciencedirect.com/science/book/9780815514329 Verlag Volltext |
| spellingShingle | Pierson, Hugh O. Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications Handbooks, manuals, etc fast Dépôt chimique en phase vapeur / Guides, manuels, etc Dépôt en phase vapeur / Guides, manuels, etc Chemical vapor deposition fast Vapor-plating fast Chemical vapor deposition Handbooks, manuals, etc Vapor-plating Handbooks, manuals, etc |
| title | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications |
| title_alt | Handbook of chemical vapor deposition |
| title_auth | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications |
| title_exact_search | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications |
| title_full | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications by Hugh O. Pierson |
| title_fullStr | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications by Hugh O. Pierson |
| title_full_unstemmed | Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications by Hugh O. Pierson |
| title_short | Handbook of chemical vapor depostion [i.e. deposition] (CVD) |
| title_sort | handbook of chemical vapor depostion i e deposition cvd principles technology and applications |
| title_sub | principles, technology, and applications |
| topic | Handbooks, manuals, etc fast Dépôt chimique en phase vapeur / Guides, manuels, etc Dépôt en phase vapeur / Guides, manuels, etc Chemical vapor deposition fast Vapor-plating fast Chemical vapor deposition Handbooks, manuals, etc Vapor-plating Handbooks, manuals, etc |
| topic_facet | Handbooks, manuals, etc Dépôt chimique en phase vapeur / Guides, manuels, etc Dépôt en phase vapeur / Guides, manuels, etc Chemical vapor deposition Vapor-plating Chemical vapor deposition Handbooks, manuals, etc Vapor-plating Handbooks, manuals, etc |
| url | http://www.sciencedirect.com/science/book/9780815514329 |
| work_keys_str_mv | AT piersonhugho handbookofchemicalvapordepostioniedepositioncvdprinciplestechnologyandapplications AT piersonhugho handbookofchemicalvapordeposition |